JPWO2009035075A1 - 磁気記録媒体 - Google Patents
磁気記録媒体 Download PDFInfo
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- JPWO2009035075A1 JPWO2009035075A1 JP2009532237A JP2009532237A JPWO2009035075A1 JP WO2009035075 A1 JPWO2009035075 A1 JP WO2009035075A1 JP 2009532237 A JP2009532237 A JP 2009532237A JP 2009532237 A JP2009532237 A JP 2009532237A JP WO2009035075 A1 JPWO2009035075 A1 JP WO2009035075A1
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- 230000005291 magnetic effect Effects 0.000 title claims abstract description 140
- 239000000314 lubricant Substances 0.000 claims abstract description 119
- 239000010410 layer Substances 0.000 claims abstract description 101
- 125000000524 functional group Chemical group 0.000 claims abstract description 35
- 230000001050 lubricating effect Effects 0.000 claims abstract description 27
- 239000011241 protective layer Substances 0.000 claims abstract description 27
- 125000001424 substituent group Chemical group 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 125000000962 organic group Chemical group 0.000 claims abstract description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 8
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 8
- 229920006395 saturated elastomer Polymers 0.000 claims description 7
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 125000003172 aldehyde group Chemical group 0.000 claims description 4
- 125000000623 heterocyclic group Chemical group 0.000 claims description 4
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 4
- XFXPMWWXUTWYJX-UHFFFAOYSA-N isonitrile group Chemical group N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims description 4
- 125000002560 nitrile group Chemical group 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 4
- 150000003335 secondary amines Chemical group 0.000 claims description 4
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims description 4
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N phosphine group Chemical group P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 3
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical group OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 claims description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 2
- 239000000126 substance Substances 0.000 abstract 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 17
- 229910052799 carbon Inorganic materials 0.000 description 17
- 239000000463 material Substances 0.000 description 13
- 239000000956 alloy Substances 0.000 description 11
- 229910045601 alloy Inorganic materials 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- 239000000047 product Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 238000001755 magnetron sputter deposition Methods 0.000 description 6
- 238000005461 lubrication Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 4
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 4
- 239000000356 contaminant Substances 0.000 description 4
- 238000007598 dipping method Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- RIQRGMUSBYGDBL-UHFFFAOYSA-N 1,1,1,2,2,3,4,5,5,5-decafluoropentane Chemical compound FC(F)(F)C(F)C(F)C(F)(F)C(F)(F)F RIQRGMUSBYGDBL-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 230000004580 weight loss Effects 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 229910003481 amorphous carbon Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- LOZAIRWAADCOHQ-UHFFFAOYSA-N triphosphazene Chemical group PNP=NP LOZAIRWAADCOHQ-UHFFFAOYSA-N 0.000 description 2
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical compound FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910019222 CoCrPt Inorganic materials 0.000 description 1
- 229910003321 CoFe Inorganic materials 0.000 description 1
- 229910019233 CoFeNi Inorganic materials 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910018979 CoPt Inorganic materials 0.000 description 1
- 229910019001 CoSi Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910001362 Ta alloys Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000005347 demagnetization Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000008863 intramolecular interaction Effects 0.000 description 1
- 238000007885 magnetic separation Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000013080 microcrystalline material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000002743 phosphorus functional group Chemical group 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M107/00—Lubricating compositions characterised by the base-material being a macromolecular compound
- C10M107/38—Lubricating compositions characterised by the base-material being a macromolecular compound containing halogen
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/725—Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
- G11B5/7253—Fluorocarbon lubricant
- G11B5/7257—Perfluoropolyether lubricant
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2211/00—Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2211/04—Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions containing carbon, hydrogen, halogen, and oxygen
- C10M2211/042—Alcohols; Ethers; Aldehydes; Ketones
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2213/00—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
- C10M2213/04—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen
- C10M2213/043—Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen used as base material
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2020/00—Specified physical or chemical properties or characteristics, i.e. function, of component of lubricating compositions
- C10N2020/01—Physico-chemical properties
- C10N2020/04—Molecular weight; Molecular weight distribution
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2030/00—Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
- C10N2030/08—Resistance to extreme temperature
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/14—Electric or magnetic purposes
- C10N2040/18—Electric or magnetic purposes in connection with recordings on magnetic tape or disc
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2050/00—Form in which the lubricant is applied to the material being lubricated
- C10N2050/015—Dispersions of solid lubricants
- C10N2050/02—Dispersions of solid lubricants dissolved or suspended in a carrier which subsequently evaporates to leave a lubricant coating
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2050/00—Form in which the lubricant is applied to the material being lubricated
- C10N2050/023—Multi-layer lubricant coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Organic Chemistry (AREA)
- Magnetic Record Carriers (AREA)
- Lubricants (AREA)
Abstract
Description
米国特許5,959,058号明細書(特許文献6)に記載の方法従い、Fomblin−Z−DOL2000(100g)、カリウムtert−ブトキシド(23.95g)およびtert−ブタノール(150ml)からなる溶液を調製し、これを70℃に加熱したエピブロモヒドリン(100g)およびtert−ブタノール(100g)からなる溶液に、4時間かけて滴下し、さらに1時間同温度で保持した。
非磁性基板(材料AL合金からなる直径95mmの磁気ディスク用基板)の主面上に、スパッタ法を用いて、膜厚2nmのCrTiからなる下地層、膜厚50nmのCoZrNbからなる軟磁性層、膜厚5nmのCoNiFeSiからなるシード層、膜厚10nmのRuからなる中間層、膜厚16nmのCoCrPt−SiO2とCoCrPrBからなる磁性層を順次形成した。
3−1.ボンド率
上記手法により作製したサンプルについて、洗浄前と洗浄後の潤滑層の膜厚を測定し、ボンド率を算出した。結果を表1に示す。なお、潤滑層の膜厚は、フーリエ変換式赤外分光光度計(FT−IR)により測定した。
上記手順で作製した表1に示す初期膜厚量を有する各サンプルに対し、加熱減量評価を実施した。
Claims (10)
- 前記潤滑剤の置換基の複数の官能基は、同一または異なっており、ヒドロキシ基、カルボキシル基、アルデヒド基、1級および2級アミン基、ニトロ基、二トリル基、イソニトリル基、イソシアナート基、チオール基、スルホ基、リン酸基、亜リン酸基、1級および2級ホスフィン基、または複素環基から選択されることを特徴とする請求項1に記載の磁気記録媒体。
- 前記官能基間の距離が、5原子離れていることを特徴とする請求項1に記載の磁気記録媒体。
- 前記置換基R1、R2、R3およびR4は、前記複数の官能基間の構造が、飽和または不飽和の脂肪族炭化水素若しくはそのフッ素化誘導体、芳香族炭化水素若しくはそのフッ素化誘導体(これらは、エーテル性酸素および/または3級アミン性窒素を1以上含んでいてもよい)、またはこれらの組み合わせから選択されることを特徴とする請求項1から3のいずれか1項に記載の磁気記録媒体。
- 磁性層温度が150℃から200℃となる熱アシスト記録方式に使用される磁気記録媒体であって、前記磁気記録媒体が非磁性基板上に少なくとも磁性層、保護層および潤滑層からなり、前記潤滑層の潤滑剤揮発量が、初期膜厚量の10%未満であることを特徴とする磁気記録媒体。
- 前記潤滑層の初期膜厚量が1.2nm以下であることを特徴とする請求項5に記載の磁気記録媒体。
- 前記複数の官能基は、同一または異なっており、ヒドロキシ基、カルボキシル基、アルデヒド基、1級アミン基、2級アミン基、ニトロ基、二トリル基、イソニトリル基、イソシアナート基、チオール基、スルホ基、または複素環から選択されることを特徴とする請求項7に記載の磁気記録媒体。
- 前記官能基間の距離が、5原子離れていることを特徴とする請求項7に記載の磁気記録媒体。
- 前記置換基R1、R2、R3およびR4は、前記複数の官能基間の構造が、飽和または不飽和の脂肪族炭化水素若しくはそのフッ素化誘導体、芳香族炭化水素若しくはそのフッ素化誘導体(これらは、エーテル性酸素および/または3級アミン性窒素を1以上含んでいてもよい)、またはこれらの組み合わせから選択されることを特徴とする請求項7から9のいずれか1項に記載の磁気記録媒体。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007239490 | 2007-09-14 | ||
JP2007239491 | 2007-09-14 | ||
JP2007239490 | 2007-09-14 | ||
JP2007239491 | 2007-09-14 | ||
PCT/JP2008/066531 WO2009035075A1 (ja) | 2007-09-14 | 2008-09-12 | 磁気記録媒体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2009035075A1 true JPWO2009035075A1 (ja) | 2010-12-24 |
JP4632144B2 JP4632144B2 (ja) | 2011-02-16 |
Family
ID=40452081
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009532237A Active JP4632144B2 (ja) | 2007-09-14 | 2008-09-12 | 磁気記録媒体 |
Country Status (3)
Country | Link |
---|---|
US (1) | US10068603B2 (ja) |
JP (1) | JP4632144B2 (ja) |
WO (1) | WO2009035075A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114550755B (zh) * | 2016-02-22 | 2023-09-29 | 株式会社力森诺科 | 含氟醚化合物、磁记录介质用润滑剂及磁记录介质 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5726615B2 (ja) * | 2010-11-22 | 2015-06-03 | 山陽特殊製鋼株式会社 | 磁気記録媒体のシード層用合金およびスパッタリングターゲット材 |
US8663822B2 (en) | 2011-10-04 | 2014-03-04 | HGST Netherlands B.V. | Lubricant layer that provides a stable head-to-disk interface in humid conditions |
US9090717B2 (en) * | 2011-12-19 | 2015-07-28 | HGST Netherlands B.V. | UV cross-linking neat lubricant mixtures for magnetic recording media |
US11279664B2 (en) | 2016-03-10 | 2022-03-22 | Showa Denko K.K. | Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium |
JP6804893B2 (ja) | 2016-08-10 | 2020-12-23 | 昭和電工株式会社 | 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体 |
JP6967015B2 (ja) | 2016-12-20 | 2021-11-17 | 昭和電工株式会社 | 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体 |
US11639330B2 (en) | 2017-08-21 | 2023-05-02 | Showa Denko K.K. | Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium |
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