JPWO2005005798A1 - プラズマ発生電極及びプラズマ反応器 - Google Patents
プラズマ発生電極及びプラズマ反応器 Download PDFInfo
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- JPWO2005005798A1 JPWO2005005798A1 JP2005511519A JP2005511519A JPWO2005005798A1 JP WO2005005798 A1 JPWO2005005798 A1 JP WO2005005798A1 JP 2005511519 A JP2005511519 A JP 2005511519A JP 2005511519 A JP2005511519 A JP 2005511519A JP WO2005005798 A1 JPWO2005005798 A1 JP WO2005005798A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/92—Chemical or biological purification of waste gases of engine exhaust gases
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/54—Nitrogen compounds
- B01D53/56—Nitrogen oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/62—Carbon oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
- F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
- F01N3/0892—Electric or magnetic treatment, e.g. dissociation of noxious components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
- B01J2219/0813—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes employing four electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0824—Details relating to the shape of the electrodes
- B01J2219/0835—Details relating to the shape of the electrodes substantially flat
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0837—Details relating to the material of the electrodes
- B01J2219/0843—Ceramic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0875—Gas
Abstract
Description
abs(TE1−TE2)×600×B<a1…(1)
Claims (10)
- 互いに対向する二以上の電極と、前記電極のそれぞれを所定間隔に隔てて保持する保持部材とを備えてなり、前記電極相互間に電圧を印加することによってプラズマを発生させることが可能なプラズマ発生電極であって、
互いに対向する前記電極のうちの少なくとも一方が、誘電体となる板状のセラミック体と、前記セラミック体の内部に配設された導電膜とを有するとともに、
前記保持部材が、対向する前記電極のそれぞれの反対側の端部(固定端部)を片持ち梁の状態で固定して、全体として前記電極のそれぞれを、互い違いに向きの異なった片持ち梁の状態で、前記所定間隔に隔てて保持してなるプラズマ発生電極。 - 前記保持部材が、前記電極の前記固定端部とは反対側の自由端部と対向するそれぞれの表面に、前記自由端部が所定の隙間を持って挿入される、多数の第一の溝部を有してなる請求項1に記載のプラズマ発生電極。
- 前記保持部材が、互いに相補的な形状の、前記第一の溝部を櫛歯とする一体的な第一の櫛形部材と、第二の溝部を櫛歯とする一体的な第二の櫛形部材とから構成され、前記第一の櫛形部材の前記第一の溝部に前記電極の前記自由端部が挿入されてなるとともに、前記第二の櫛形部材の前記第二の溝部に前記電極の前記固定端部が片持ち梁の状態で固定されてなる請求項2に記載のプラズマ発生電極。
- 前記電極のそれぞれの前記固定端部が、前記第二の櫛形部材の前記第二の溝部に、接着材によって片持ち梁の状態で固定されてなる請求項3に記載のプラズマ発生電極。
- 前記電極の前記固定端部と電気的な接続を行うための接続端子をさらに備えてなる請求項1〜4のいずれかに記載のプラズマ発生電極。
- 前記接続端子の主成分が、0〜600℃における熱膨張係数が7×10−6(1/K)以下の金属である請求項5に記載のプラズマ発生電極。
- 前記接続端子が、溶接接合、ロウ付け接合又は拡散接合によって、前記電極の前記固定端部に接合されたものである請求項5又は6に記載のプラズマ発生電極。
- 前記接続端子が、前記電極の前記固定端部に施された導電層メッキから形成されたものである請求項5に記載のプラズマ発生電極。
- 請求項1〜8のいずれかに記載のプラズマ発生電極と、所定の成分を含むガスの流路を有するケース体とを備えてなり、前記ガスが前記ケース体の内部に導入されたときに、前記プラズマ発生電極によって発生させたプラズマにより前記ガスに含まれる前記所定の成分を反応させることが可能なプラズマ反応器。
- 前記ケース体の前記流路の、前記プラズマ発生電極より上流側に、隔壁によって区画された複数のセルを有するハニカム構造体をさらに備えてなる請求項9に記載のプラズマ反応器。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003195165 | 2003-07-10 | ||
JP2003195165 | 2003-07-10 | ||
PCT/JP2004/009647 WO2005005798A1 (ja) | 2003-07-10 | 2004-07-07 | プラズマ発生電極及びプラズマ反応器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2005005798A1 true JPWO2005005798A1 (ja) | 2007-09-20 |
JP4448097B2 JP4448097B2 (ja) | 2010-04-07 |
Family
ID=34055711
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005511519A Expired - Fee Related JP4448097B2 (ja) | 2003-07-10 | 2004-07-07 | プラズマ発生電極及びプラズマ反応器 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7727488B2 (ja) |
EP (1) | EP1645730B1 (ja) |
JP (1) | JP4448097B2 (ja) |
WO (1) | WO2005005798A1 (ja) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005027593A1 (ja) * | 2003-09-12 | 2005-03-24 | Ngk Insulators, Ltd. | プラズマ発生電極及びプラズマ反応器 |
JP2006261040A (ja) | 2005-03-18 | 2006-09-28 | Ngk Insulators Ltd | プラズマ反応器 |
JP4619969B2 (ja) * | 2006-03-22 | 2011-01-26 | 日本碍子株式会社 | プラズマ反応装置 |
KR100675752B1 (ko) * | 2006-09-14 | 2007-01-30 | (주) 씨엠테크 | 플라즈마 반응기 |
JP5046803B2 (ja) * | 2007-03-05 | 2012-10-10 | 京セラ株式会社 | プラズマ発生体、プラズマ発生装置、オゾン発生装置、排ガス処理装置 |
CN101284644B (zh) * | 2007-06-04 | 2011-05-04 | 周开根 | 水为原料的低温等离子体制氢设备 |
JP4818219B2 (ja) * | 2007-07-27 | 2011-11-16 | 京セラ株式会社 | 構造体およびこれを用いた装置 |
JP2009110752A (ja) * | 2007-10-29 | 2009-05-21 | Kyocera Corp | プラズマ発生体、プラズマ発生装置、オゾン発生装置、排ガス処理装置 |
JP2009184862A (ja) * | 2008-02-05 | 2009-08-20 | Ngk Insulators Ltd | プラズマリアクタ |
JP5528764B2 (ja) * | 2009-10-08 | 2014-06-25 | 安斎 聡 | プラズマ発生装置 |
DE102011104193A1 (de) * | 2011-06-15 | 2012-12-20 | Emitec Gesellschaft Für Emissionstechnologie Mbh | Vorrichtung mit einem elektrisch beheizbaren Wabenkörper und Verfahren zum Betreiben des Wabenkörpers |
CN102424357B (zh) * | 2011-09-27 | 2016-10-12 | 张立永 | 紫外线光堆 |
KR101428524B1 (ko) * | 2012-12-10 | 2014-08-11 | 한국기초과학지원연구원 | 분말 플라즈마 처리 장치 |
JP6656008B2 (ja) * | 2016-02-10 | 2020-03-04 | 日本特殊陶業株式会社 | プラズマリアクタ |
JP2017157363A (ja) * | 2016-03-01 | 2017-09-07 | 日本特殊陶業株式会社 | プラズマリアクタ |
EP3424589B1 (en) | 2016-03-01 | 2021-11-17 | NGK Spark Plug Co., Ltd. | Plasma reactor |
CN111151206B (zh) * | 2019-12-31 | 2022-06-17 | 苏州市奥普斯等离子体科技有限公司 | 一种处理液体的等离子体装置 |
WO2023276337A1 (ja) * | 2021-07-02 | 2023-01-05 | 日本特殊陶業株式会社 | オゾン発生体、オゾン発生ユニット及びオゾン発生器 |
JP7360422B2 (ja) | 2021-07-02 | 2023-10-12 | 日本特殊陶業株式会社 | オゾン発生体及びオゾン発生器 |
CN113747647B (zh) * | 2021-08-16 | 2023-03-14 | 西安交通大学 | 一种双栅格面式均匀离子体发生器件及其制备方法 |
WO2024057424A1 (ja) * | 2022-09-14 | 2024-03-21 | 東芝三菱電機産業システム株式会社 | 活性ガス生成装置 |
Family Cites Families (12)
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US4472174A (en) * | 1983-04-25 | 1984-09-18 | Raymond L. Chuan | Method and apparatus for providing and using RF generated plasma for particle charging in electrostatic precipitation |
JPH01163413A (ja) | 1987-12-19 | 1989-06-27 | Mazda Motor Corp | エンジンの排気浄化装置 |
US6596243B1 (en) * | 1996-06-20 | 2003-07-22 | Honda Giken Kogyo Kabushiki Kaisha | Catalyst element for purifying exhaust gases from internal combustion engine |
RU2127400C1 (ru) | 1998-03-18 | 1999-03-10 | Акционерное общество закрытого типа "Карбид" | Устройство для плазменной очистки газов, образующихся при сгорании топлива |
US6146599A (en) * | 1999-02-24 | 2000-11-14 | Seagate Technology Llc | Dielectric barrier discharge system and method for decomposing hazardous compounds in fluids |
JP2001164925A (ja) | 1999-12-10 | 2001-06-19 | Mitsubishi Motors Corp | プラズマ排気ガス処理システム |
US6576202B1 (en) * | 2000-04-21 | 2003-06-10 | Kin-Chung Ray Chiu | Highly efficient compact capacitance coupled plasma reactor/generator and method |
US6887440B2 (en) | 2000-11-16 | 2005-05-03 | Delphi Technologies, Inc. | Edge-connected non-thermal plasma exhaust after-treatment device |
US6800256B2 (en) * | 2000-12-18 | 2004-10-05 | Delphi Technologies, Inc. | Scaleable inter-digitized tine non-thermal plasma reactor |
JP2002256851A (ja) | 2001-03-01 | 2002-09-11 | Denso Corp | 内燃機関の排気浄化装置 |
JP3642032B2 (ja) * | 2001-03-02 | 2005-04-27 | トヨタ自動車株式会社 | 内燃機関の排気浄化装置 |
US6692704B2 (en) * | 2001-03-19 | 2004-02-17 | Delphi Technologies, Inc. | Non-thermal plasma reactor and method-structural conductor |
-
2004
- 2004-07-07 US US10/562,467 patent/US7727488B2/en not_active Expired - Fee Related
- 2004-07-07 WO PCT/JP2004/009647 patent/WO2005005798A1/ja active Application Filing
- 2004-07-07 JP JP2005511519A patent/JP4448097B2/ja not_active Expired - Fee Related
- 2004-07-07 EP EP04747116A patent/EP1645730B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7727488B2 (en) | 2010-06-01 |
US20060152133A1 (en) | 2006-07-13 |
EP1645730A4 (en) | 2008-04-02 |
EP1645730B1 (en) | 2012-02-15 |
EP1645730A1 (en) | 2006-04-12 |
WO2005005798A1 (ja) | 2005-01-20 |
JP4448097B2 (ja) | 2010-04-07 |
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