JP4746986B2 - プラズマ発生電極及びプラズマ発生装置、並びに排気ガス浄化装置 - Google Patents
プラズマ発生電極及びプラズマ発生装置、並びに排気ガス浄化装置 Download PDFInfo
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- JP4746986B2 JP4746986B2 JP2005507239A JP2005507239A JP4746986B2 JP 4746986 B2 JP4746986 B2 JP 4746986B2 JP 2005507239 A JP2005507239 A JP 2005507239A JP 2005507239 A JP2005507239 A JP 2005507239A JP 4746986 B2 JP4746986 B2 JP 4746986B2
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
- F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
- F01N3/0892—Electric or magnetic treatment, e.g. dissociation of noxious components
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N13/00—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00
- F01N13/009—Exhaust or silencing apparatus characterised by constructional features ; Exhaust or silencing apparatus, or parts thereof, having pertinent characteristics not provided for in, or of interest apart from, groups F01N1/00 - F01N5/00, F01N9/00, F01N11/00 having two or more separate purifying devices arranged in series
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32834—Exhausting
- H01J37/32844—Treating effluent gases
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N2240/00—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being
- F01N2240/28—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being a plasma reactor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/10—Treatment of gases
- H05H2245/15—Ambient air; Ozonisers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
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- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Analytical Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Exhaust Gas After Treatment (AREA)
- Treating Waste Gases (AREA)
Description
[図2]図2は、本発明(第一の発明)のプラズマ発生電極の一の実施の形態における、一方の電極を構成するセラミック成形体と導電膜との一例を模式的に示す平面図である。
[図3]図3は、本発明(第一の発明)のプラズマ発生電極の他の実施の形態を模式的に示す斜視図である。
[図4]図4は、本発明(第一の発明)のプラズマ発生電極の一の実施の形態における、一方の電極を構成するセラミック成形体と導電膜との他の例を模式的に示す平面図である。
[図5(a)]図5(a)は、本発明(第二の発明)のプラズマ発生装置の一の実施の形態を、被処理流体の流れ方向を含む平面で切断した断面図である。
[図5(b)]図5(b)は、図5(a)のA−A線における断面図である。
[図6]図6は、本発明(第三の発明)の排気ガス浄化装置の一の実施の形態を模式的に示す説明図である。
貫通孔を形成しなかったこと以外は、実施例1のプラズマ発生装置と同様に構成されたプラズマ発生装置を製造した。
比較例1のプラズマ発生装置の下流側に実施例6に用いた触媒と同様の触媒を配置して排気ガス浄化装置を製造し、そのNOx浄化性能を評価した。プラズマ発生条件及びガス条件は、比較例1と同じである。
Claims (7)
- 対向配置された少なくとも一対の電極を備え、これらの間に電圧を印加することによってプラズマを発生させることが可能なプラズマ発生電極であって、
前記一対の電極のうちの少なくとも一方が、誘電体となる板状のセラミック体と、前記セラミック体の内部に埋設された、その膜厚方向に貫通した前記膜厚方向に垂直な方向の平面で切断した断面の形状が一部に円弧を含む形状の貫通孔が複数形成された導電膜とを有し、
複数の前記貫通孔の、それぞれの直径が1〜10mmであり、
複数の前記貫通孔の、隣接するそれぞれの中心間の距離が1.5〜20mmであるプラズマ発生電極。 - 前記貫通孔の前記膜厚方向に垂直な方向の平面で切断した断面の形状が円形である請求項1に記載のプラズマ発生電極。
- 複数の前記貫通孔が、前記導電膜に規則的に配列するように形成されたものである請求項1又は2に記載のプラズマ発生電極。
- 前記導電膜が、前記セラミック成形体にスクリーン印刷、カレンダーロール、スプレー、化学蒸着、又は物理蒸着されて配設されたものである請求項1〜3のいずれかに記載のプラズマ発生電極。
- 前記導電膜の主成分が、タングステン、モリブデン、マンガン、クロム、チタン、ジルコニウム、ニッケル、鉄、銀、銅、白金、及びパラジウムからなる群から選ばれる少なくとも一種の金属である請求項1〜4のいずれかに記載のプラズマ発生電極。
- 請求項1〜5のいずれかに記載されたプラズマ発生電極を備えたプラズマ発生装置。
- 請求項6に記載のプラズマ発生装置と、触媒とを備え、前記プラズマ発生装置と前記触媒とが、内燃機関の排気系の内部に配設された排気ガス浄化装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005507239A JP4746986B2 (ja) | 2003-06-20 | 2004-06-18 | プラズマ発生電極及びプラズマ発生装置、並びに排気ガス浄化装置 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003177232 | 2003-06-20 | ||
JP2003177232 | 2003-06-20 | ||
JP2005507239A JP4746986B2 (ja) | 2003-06-20 | 2004-06-18 | プラズマ発生電極及びプラズマ発生装置、並びに排気ガス浄化装置 |
PCT/JP2004/008617 WO2004114728A1 (ja) | 2003-06-20 | 2004-06-18 | プラズマ発生電極及びプラズマ発生装置、並びに排気ガス浄化装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2004114728A1 JPWO2004114728A1 (ja) | 2006-08-03 |
JP4746986B2 true JP4746986B2 (ja) | 2011-08-10 |
Family
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Family Applications (1)
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---|---|---|---|
JP2005507239A Expired - Fee Related JP4746986B2 (ja) | 2003-06-20 | 2004-06-18 | プラズマ発生電極及びプラズマ発生装置、並びに排気ガス浄化装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7635824B2 (ja) |
EP (1) | EP1638376A4 (ja) |
JP (1) | JP4746986B2 (ja) |
WO (1) | WO2004114728A1 (ja) |
Families Citing this family (36)
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JP2006261040A (ja) * | 2005-03-18 | 2006-09-28 | Ngk Insulators Ltd | プラズマ反応器 |
JP2006278236A (ja) * | 2005-03-30 | 2006-10-12 | Ngk Insulators Ltd | プラズマ発生電極及びプラズマ反応器 |
JP4636930B2 (ja) * | 2005-04-28 | 2011-02-23 | ミドリ安全株式会社 | 触媒保持装置及びガス除去装置 |
US8268116B2 (en) | 2007-06-14 | 2012-09-18 | Lam Research Corporation | Methods of and apparatus for protecting a region of process exclusion adjacent to a region of process performance in a process chamber |
WO2008094009A1 (en) * | 2007-02-02 | 2008-08-07 | Bang Kwon Kang | Apparatus for uniformly generating atmospheric pressure plasma |
KR100844121B1 (ko) | 2007-07-20 | 2008-07-07 | (주)에스엔텍 | 대기압 플라즈마 장치, 이를 구비한 카메라 모듈의적외선필터 인라인 조립 장치, 이를 이용한 세정 방법 및이를 이용한 휴대폰 카메라 모듈의 적외선필터인라인 조립방법 |
JP5252931B2 (ja) * | 2008-01-16 | 2013-07-31 | 日本碍子株式会社 | セラミックプラズマ反応器、及びプラズマ反応装置 |
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JP2001164925A (ja) | 1999-12-10 | 2001-06-19 | Mitsubishi Motors Corp | プラズマ排気ガス処理システム |
-
2004
- 2004-06-18 JP JP2005507239A patent/JP4746986B2/ja not_active Expired - Fee Related
- 2004-06-18 EP EP04746119A patent/EP1638376A4/en not_active Withdrawn
- 2004-06-18 US US10/560,805 patent/US7635824B2/en not_active Expired - Fee Related
- 2004-06-18 WO PCT/JP2004/008617 patent/WO2004114728A1/ja active Application Filing
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JP2001193441A (ja) * | 2000-01-11 | 2001-07-17 | Denso Corp | 内燃機関の排ガス浄化装置 |
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Also Published As
Publication number | Publication date |
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US7635824B2 (en) | 2009-12-22 |
US20060152163A1 (en) | 2006-07-13 |
EP1638376A4 (en) | 2008-04-02 |
WO2004114728A1 (ja) | 2004-12-29 |
JPWO2004114728A1 (ja) | 2006-08-03 |
EP1638376A1 (en) | 2006-03-22 |
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