JPS648630A - Cleaning method - Google Patents
Cleaning methodInfo
- Publication number
- JPS648630A JPS648630A JP16474187A JP16474187A JPS648630A JP S648630 A JPS648630 A JP S648630A JP 16474187 A JP16474187 A JP 16474187A JP 16474187 A JP16474187 A JP 16474187A JP S648630 A JPS648630 A JP S648630A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- ozone
- tank
- matter
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To prevent a static electricity from generating due to a collision when cleaning fluid is injected to a matter to be cleaned or a friction of air by dissolving ozone in water, and cleaning the matter to perform oxidative destruction of organic materials, on the matter to be cleaned. CONSTITUTION:An upper chamber 1 is raised, a semiconductor wafer 11 is conveyed into a cleaning chamber, supported fixedly on an induction motor 10, and the chamber 1 is moved down to be connected to a lower chamber 2. The chamber is sealed in this state. Then, pure water is introduced by a pure water inlet tube 5 into a bubbler tank 4, ozone is introduced by an ozone inlet tube 6 which is arrived at the bottom of the tank 4 through the upper face of the tank 4, bubbled in the tank 4 to dissolve the ozone in the water. Cleaning fluid formed by the dissolving is injected through a supply tube by a high pressure pump 7 from a high pressure nozzle 3 provided at the center of the upper face of the chamber 1 on a semiconductor wafer 11 which is, for example, rotated at 1000rpm by the motor 10. Thus, organic materials on the wafer 11 is subjected to oxidative destruction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16474187A JPS648630A (en) | 1986-09-22 | 1987-06-30 | Cleaning method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22460886 | 1986-09-22 | ||
JP16474187A JPS648630A (en) | 1986-09-22 | 1987-06-30 | Cleaning method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS648630A true JPS648630A (en) | 1989-01-12 |
Family
ID=26489735
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16474187A Pending JPS648630A (en) | 1986-09-22 | 1987-06-30 | Cleaning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS648630A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0341729A (en) * | 1989-07-07 | 1991-02-22 | Tokyo Electron Ltd | Substrate cleaning |
WO1992006489A1 (en) * | 1990-10-09 | 1992-04-16 | Chlorine Engineers Corp., Ltd. | Method of removing organic coating |
WO1992022087A1 (en) * | 1991-05-31 | 1992-12-10 | Tadahiro Ohmi | Method for cleaning and apparatus thereof |
EP0548596A2 (en) * | 1991-11-29 | 1993-06-30 | CHLORINE ENGINEERS CORP., Ltd. | Method and apparatus for cleaning substrate |
US5378317A (en) * | 1990-10-09 | 1995-01-03 | Chlorine Engineers Corp., Ltd. | Method for removing organic film |
US6277203B1 (en) | 1998-09-29 | 2001-08-21 | Lam Research Corporation | Method and apparatus for cleaning low K dielectric and metal wafer surfaces |
US6325081B1 (en) * | 1996-07-03 | 2001-12-04 | Kabushiki Kaisha Ultraclean Technology Research Institute | Washing apparatus and washing method |
US6817370B2 (en) | 1997-05-09 | 2004-11-16 | Semitool, Inc. | Method for processing the surface of a workpiece |
US6837252B2 (en) | 1997-05-09 | 2005-01-04 | Semitool, Inc. | Apparatus for treating a workpiece with steam and ozone |
EP2202782A3 (en) * | 2008-12-25 | 2010-10-06 | Siltronic AG | Micro-Bubble generating device |
CN107081569A (en) * | 2017-03-27 | 2017-08-22 | 宁波工程学院 | Precision component jet light adorns device and method |
-
1987
- 1987-06-30 JP JP16474187A patent/JPS648630A/en active Pending
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0341729A (en) * | 1989-07-07 | 1991-02-22 | Tokyo Electron Ltd | Substrate cleaning |
WO1992006489A1 (en) * | 1990-10-09 | 1992-04-16 | Chlorine Engineers Corp., Ltd. | Method of removing organic coating |
US5378317A (en) * | 1990-10-09 | 1995-01-03 | Chlorine Engineers Corp., Ltd. | Method for removing organic film |
WO1992022087A1 (en) * | 1991-05-31 | 1992-12-10 | Tadahiro Ohmi | Method for cleaning and apparatus thereof |
EP0548596A2 (en) * | 1991-11-29 | 1993-06-30 | CHLORINE ENGINEERS CORP., Ltd. | Method and apparatus for cleaning substrate |
EP0548596A3 (en) * | 1991-11-29 | 1994-08-17 | Chlorine Eng Corp Ltd | Method and apparatus for cleaning substrate |
US6325081B1 (en) * | 1996-07-03 | 2001-12-04 | Kabushiki Kaisha Ultraclean Technology Research Institute | Washing apparatus and washing method |
US6817370B2 (en) | 1997-05-09 | 2004-11-16 | Semitool, Inc. | Method for processing the surface of a workpiece |
US6837252B2 (en) | 1997-05-09 | 2005-01-04 | Semitool, Inc. | Apparatus for treating a workpiece with steam and ozone |
US6319330B1 (en) | 1998-09-29 | 2001-11-20 | Lam Research Corporation | Method and apparatus for cleaning low K dielectric and metal wafer surfaces |
US6277203B1 (en) | 1998-09-29 | 2001-08-21 | Lam Research Corporation | Method and apparatus for cleaning low K dielectric and metal wafer surfaces |
EP2202782A3 (en) * | 2008-12-25 | 2010-10-06 | Siltronic AG | Micro-Bubble generating device |
US8408221B2 (en) | 2008-12-25 | 2013-04-02 | Siltronic Ag | Micro bubble generating device and silicon wafer cleaning apparatus |
CN107081569A (en) * | 2017-03-27 | 2017-08-22 | 宁波工程学院 | Precision component jet light adorns device and method |
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