KR970072138A - Wafer cleaning apparatus and cleaning method - Google Patents
Wafer cleaning apparatus and cleaning method Download PDFInfo
- Publication number
- KR970072138A KR970072138A KR1019960012523A KR19960012523A KR970072138A KR 970072138 A KR970072138 A KR 970072138A KR 1019960012523 A KR1019960012523 A KR 1019960012523A KR 19960012523 A KR19960012523 A KR 19960012523A KR 970072138 A KR970072138 A KR 970072138A
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- KR
- South Korea
- Prior art keywords
- cleaning
- wafer
- cleaning liquid
- liquid supply
- sonic
- Prior art date
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
본 발명은 웨이퍼 세정장치 및 세정방법에 관해 개시한다. 본 발명에 의한 세정장치는 세정액 공급부와 상기 세정액 공급부로부터 세정액을 공급받는 초음파는 방출하는 DI 소닉(sonic)과 웨이퍼 세정용 브러쉬와 DI 노즐(nozzle)을 포함하는 메가소닉 세정공정이 진행되는 스핀 스크래블러를 구비한다.The present invention discloses a wafer cleaning apparatus and a cleaning method. The cleaning apparatus according to the present invention is characterized in that the ultrasonic wave supplied from the cleaning liquid supply unit and the cleaning liquid supply unit is supplied to the cleaning apparatus through the spin sonic cleaning process including the DI sonic discharging ultrasonic wave, the wafer cleaning brush and the DI nozzle, Respectively.
따라서 본 발명에 의한 세정장치를 이용한 세정방법은 메가소닉장치와 DI소닉을 이용한 매엽식 세정장치를 결합한 세정장치를 이용함으로써, 물리 화학적인 방법으로 웨이퍼를 세정할 수 있다. 즉, 초음파 세정과 세정액을 이용한 세정을 결합하여 세정을 실시하므로 세정효과를 높일 수 있을 뿐만 아니라 세정시간을 짧게할 수 있으므로 대구경 웨이퍼의 세정에도 긴 시간을 요하지 않는다. 결과적으로 반도체장치의 생산성을 높일 수 있다.Therefore, the cleaning method using the cleaning device according to the present invention can clean the wafer by a physicochemical method by using a cleaning device that combines a megasonic device and a single wafer cleaning device using a DI Sonic. In other words, since cleaning is performed by combining ultrasonic cleaning with cleaning using a cleaning liquid, the cleaning effect can be enhanced and the cleaning time can be shortened, so that a long time is not required for washing the large diameter wafer. As a result, the productivity of the semiconductor device can be increased.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제1도는 본 발명에 의한 웨이퍼 세정장치의 계통도이다.FIG. 1 is a system diagram of a wafer cleaning apparatus according to the present invention.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960012523A KR970072138A (en) | 1996-04-24 | 1996-04-24 | Wafer cleaning apparatus and cleaning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960012523A KR970072138A (en) | 1996-04-24 | 1996-04-24 | Wafer cleaning apparatus and cleaning method |
Publications (1)
Publication Number | Publication Date |
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KR970072138A true KR970072138A (en) | 1997-11-07 |
Family
ID=66221478
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960012523A KR970072138A (en) | 1996-04-24 | 1996-04-24 | Wafer cleaning apparatus and cleaning method |
Country Status (1)
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KR (1) | KR970072138A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6743723B2 (en) | 1995-09-14 | 2004-06-01 | Canon Kabushiki Kaisha | Method for fabricating semiconductor device |
KR100426184B1 (en) * | 1996-11-29 | 2004-06-24 | 캐논 가부시끼가이샤 | Method for manufacturing semiconductor device |
KR100537022B1 (en) * | 1998-05-19 | 2006-03-17 | 삼성전자주식회사 | Cleaning equipment and cleaning solution supply method |
-
1996
- 1996-04-24 KR KR1019960012523A patent/KR970072138A/en not_active Application Discontinuation
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6743723B2 (en) | 1995-09-14 | 2004-06-01 | Canon Kabushiki Kaisha | Method for fabricating semiconductor device |
KR100426184B1 (en) * | 1996-11-29 | 2004-06-24 | 캐논 가부시끼가이샤 | Method for manufacturing semiconductor device |
KR100537022B1 (en) * | 1998-05-19 | 2006-03-17 | 삼성전자주식회사 | Cleaning equipment and cleaning solution supply method |
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