JPS64810B2 - - Google Patents

Info

Publication number
JPS64810B2
JPS64810B2 JP56085575A JP8557581A JPS64810B2 JP S64810 B2 JPS64810 B2 JP S64810B2 JP 56085575 A JP56085575 A JP 56085575A JP 8557581 A JP8557581 A JP 8557581A JP S64810 B2 JPS64810 B2 JP S64810B2
Authority
JP
Japan
Prior art keywords
endless
wafer
stretched
arm
liquid tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56085575A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57201028A (en
Inventor
Masaaki Minami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP56085575A priority Critical patent/JPS57201028A/ja
Publication of JPS57201028A publication Critical patent/JPS57201028A/ja
Publication of JPS64810B2 publication Critical patent/JPS64810B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3411—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • H10P72/3412—Batch transfer of wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H10P72/3402—Mechanical parts of transfer devices

Landscapes

  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP56085575A 1981-06-05 1981-06-05 Wafer conveying device Granted JPS57201028A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56085575A JPS57201028A (en) 1981-06-05 1981-06-05 Wafer conveying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56085575A JPS57201028A (en) 1981-06-05 1981-06-05 Wafer conveying device

Publications (2)

Publication Number Publication Date
JPS57201028A JPS57201028A (en) 1982-12-09
JPS64810B2 true JPS64810B2 (https=) 1989-01-09

Family

ID=13862607

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56085575A Granted JPS57201028A (en) 1981-06-05 1981-06-05 Wafer conveying device

Country Status (1)

Country Link
JP (1) JPS57201028A (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59127838A (ja) * 1983-01-11 1984-07-23 Sumitomo Electric Ind Ltd ミラ−ウエハの連続エツチング装置
JPH058675Y2 (https=) * 1985-03-13 1993-03-04
JPS63260037A (ja) * 1987-04-16 1988-10-27 Nec Kyushu Ltd 半導体基板自動薬液処理装置
US4902608A (en) * 1987-12-17 1990-02-20 Texas Instruments Incorporated Immersion development and rinse machine and process

Also Published As

Publication number Publication date
JPS57201028A (en) 1982-12-09

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