JPS6476412A - Production of thin film magnetic head - Google Patents

Production of thin film magnetic head

Info

Publication number
JPS6476412A
JPS6476412A JP23111387A JP23111387A JPS6476412A JP S6476412 A JPS6476412 A JP S6476412A JP 23111387 A JP23111387 A JP 23111387A JP 23111387 A JP23111387 A JP 23111387A JP S6476412 A JPS6476412 A JP S6476412A
Authority
JP
Japan
Prior art keywords
layer
resist
coil conductor
production
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23111387A
Other languages
Japanese (ja)
Inventor
Yoshiaki Kato
Shigeru Kamioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP23111387A priority Critical patent/JPS6476412A/en
Publication of JPS6476412A publication Critical patent/JPS6476412A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate short-circuit of a coil conductor by specifying the side wall angle of a first layer coil conductor and performing heat treatment and ion milling of a resist for production of second and higher layer coil conductors on a specific condition. CONSTITUTION:A lower magnetic layer 2, a first insulating layer 3, and a copper layer 4 are formed on a substrate 1 in order. A photoresist is coated on the layer 4 and is patterned and is subjected to heat treatment in a prescribed condition to form a hemispherical resist 10. The resist 10 is used as the mask and the angle of incidence of an ion beam is controlled to perform ion milling, thereby forming a first layer coil conductor 4 whose side wall angle is 40-70 deg.. Next, a second insulating layer 5, a copper layer 6, and the photoresist are formed on the conductor 4 in order, and the resist is patterned and is subjected to heat treatment at 130-<200 deg.C to perform ion milling, thereby forming a second layer coil conductor 6.
JP23111387A 1987-09-17 1987-09-17 Production of thin film magnetic head Pending JPS6476412A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23111387A JPS6476412A (en) 1987-09-17 1987-09-17 Production of thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23111387A JPS6476412A (en) 1987-09-17 1987-09-17 Production of thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS6476412A true JPS6476412A (en) 1989-03-22

Family

ID=16918498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23111387A Pending JPS6476412A (en) 1987-09-17 1987-09-17 Production of thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS6476412A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001067502A2 (en) * 2000-03-10 2001-09-13 Fei Company Method and apparatus for milling copper interconnects in a charged particle beam system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61210508A (en) * 1985-03-15 1986-09-18 Fuji Photo Film Co Ltd Manufacture of thin-film magnetic head
JPS6247812A (en) * 1985-08-26 1987-03-02 Sony Corp Thin film magnetic head

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61210508A (en) * 1985-03-15 1986-09-18 Fuji Photo Film Co Ltd Manufacture of thin-film magnetic head
JPS6247812A (en) * 1985-08-26 1987-03-02 Sony Corp Thin film magnetic head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001067502A2 (en) * 2000-03-10 2001-09-13 Fei Company Method and apparatus for milling copper interconnects in a charged particle beam system
WO2001067502A3 (en) * 2000-03-10 2002-02-21 Fei Co Method and apparatus for milling copper interconnects in a charged particle beam system

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