JPS53109479A - Forming method of insulating film - Google Patents

Forming method of insulating film

Info

Publication number
JPS53109479A
JPS53109479A JP2384877A JP2384877A JPS53109479A JP S53109479 A JPS53109479 A JP S53109479A JP 2384877 A JP2384877 A JP 2384877A JP 2384877 A JP2384877 A JP 2384877A JP S53109479 A JPS53109479 A JP S53109479A
Authority
JP
Japan
Prior art keywords
insulating film
forming method
coating
pattern
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2384877A
Other languages
Japanese (ja)
Inventor
Yukiyoshi Harada
Takashi Nishida
Kazuyoshi Ueki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2384877A priority Critical patent/JPS53109479A/en
Publication of JPS53109479A publication Critical patent/JPS53109479A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE: To obtain the insulating film flat and strong on the substrate, by forming the wiring pattern on the semiconductor substrate via the insulating film and by coating inorganic insulator between wires with laser evaporation method, after coating the pattern with the resist film.
COPYRIGHT: (C)1978,JPO&Japio
JP2384877A 1977-03-07 1977-03-07 Forming method of insulating film Pending JPS53109479A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2384877A JPS53109479A (en) 1977-03-07 1977-03-07 Forming method of insulating film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2384877A JPS53109479A (en) 1977-03-07 1977-03-07 Forming method of insulating film

Publications (1)

Publication Number Publication Date
JPS53109479A true JPS53109479A (en) 1978-09-25

Family

ID=12121817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2384877A Pending JPS53109479A (en) 1977-03-07 1977-03-07 Forming method of insulating film

Country Status (1)

Country Link
JP (1) JPS53109479A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135290A (en) * 1974-09-20 1976-03-25 Hitachi Ltd Handotaisochi no seizohoho
JPS51142275A (en) * 1975-06-02 1976-12-07 Hitachi Ltd Method of manufacturing insulating film for semiconductor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5135290A (en) * 1974-09-20 1976-03-25 Hitachi Ltd Handotaisochi no seizohoho
JPS51142275A (en) * 1975-06-02 1976-12-07 Hitachi Ltd Method of manufacturing insulating film for semiconductor

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