JPS647491B2 - - Google Patents

Info

Publication number
JPS647491B2
JPS647491B2 JP9155279A JP9155279A JPS647491B2 JP S647491 B2 JPS647491 B2 JP S647491B2 JP 9155279 A JP9155279 A JP 9155279A JP 9155279 A JP9155279 A JP 9155279A JP S647491 B2 JPS647491 B2 JP S647491B2
Authority
JP
Japan
Prior art keywords
section
etching
wafer
processing
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9155279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5617022A (en
Inventor
Hiroshi Maejima
Susumu Nanko
Atsushi Fujisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9155279A priority Critical patent/JPS5617022A/ja
Publication of JPS5617022A publication Critical patent/JPS5617022A/ja
Publication of JPS647491B2 publication Critical patent/JPS647491B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP9155279A 1979-07-20 1979-07-20 Treating apparatus Granted JPS5617022A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9155279A JPS5617022A (en) 1979-07-20 1979-07-20 Treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9155279A JPS5617022A (en) 1979-07-20 1979-07-20 Treating apparatus

Publications (2)

Publication Number Publication Date
JPS5617022A JPS5617022A (en) 1981-02-18
JPS647491B2 true JPS647491B2 (cg-RX-API-DMAC7.html) 1989-02-09

Family

ID=14029655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9155279A Granted JPS5617022A (en) 1979-07-20 1979-07-20 Treating apparatus

Country Status (1)

Country Link
JP (1) JPS5617022A (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60249328A (ja) * 1984-05-25 1985-12-10 Kokusai Electric Co Ltd 半導体ウエ−ハ用ドライエツチング・化学気相生成装置
JPH0736400B2 (ja) * 1985-12-23 1995-04-19 東洋設備工業株式会社 ウエハのエツチング装置
KR100675316B1 (ko) * 1999-12-22 2007-01-26 엘지.필립스 엘시디 주식회사 세정장비 일체형 에치/스트립 장치
JP3686866B2 (ja) * 2001-12-18 2005-08-24 株式会社日立製作所 半導体製造装置及び製造方法

Also Published As

Publication number Publication date
JPS5617022A (en) 1981-02-18

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