JPS6473652A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS6473652A JPS6473652A JP23035687A JP23035687A JPS6473652A JP S6473652 A JPS6473652 A JP S6473652A JP 23035687 A JP23035687 A JP 23035687A JP 23035687 A JP23035687 A JP 23035687A JP S6473652 A JPS6473652 A JP S6473652A
- Authority
- JP
- Japan
- Prior art keywords
- hydroxide
- oxide
- less
- epoxy resin
- 100ppm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
PURPOSE:To retain excellent reliability even when a semiconductor is left in a high-temperature atmosphere for a long time by a method wherein the semiconductor device is sealed by using a specific epoxy resin, a specific phenol resin and at least one compound selected from a group composed of a hydroxide of Bi, an oxide of Bi, a hydroxide of Al and an oxide of Al. CONSTITUTION:An epoxy resin composition is obtained by using a specific epoxy resin, a specific phenol resin and at least one compound selected from a group composed of a hydroxide of Bi, an oxide of Bi, a hydroxide of Al and an oxide of Al. For the epoxy resin, its content of an organic acid is set to be 100ppm or less, its total amount of chlorine is set to be 100ppm or less and its total amount of sodium is set to be 20ppm or less. For the phenol resin, its content of the organic acid is set to be 100ppm or less and its total amount of chlorine is set to be 10ppm or less. In addition, at least one compound selected from the group composed of the hydroxide of Al or Bi and the oxide of Al or Bi is contained. If at least one of the epoxy resin and the phenol resin reacts with an organopolysiloxane represented by a general formula, a stress is reduced and resistance to a temperature is improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62230356A JP2558293B2 (en) | 1987-09-14 | 1987-09-14 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62230356A JP2558293B2 (en) | 1987-09-14 | 1987-09-14 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6473652A true JPS6473652A (en) | 1989-03-17 |
JP2558293B2 JP2558293B2 (en) | 1996-11-27 |
Family
ID=16906579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62230356A Expired - Lifetime JP2558293B2 (en) | 1987-09-14 | 1987-09-14 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2558293B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005519147A (en) * | 2002-02-28 | 2005-06-30 | シーメンス アクチエンゲゼルシヤフト | Low corrosive epoxy resin and manufacturing method therefor |
WO2008007730A1 (en) | 2006-07-12 | 2008-01-17 | Unisantis Electronics (Japan) Ltd. | Nonvolatile semiconductor memory and its drive method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5978380B1 (en) * | 2015-12-25 | 2016-08-24 | 太陽インキ製造株式会社 | Sealant for semiconductor |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS572329A (en) * | 1980-06-05 | 1982-01-07 | Toshiba Corp | Epoxy resin type composition and semiconductor device of resin sealing type |
JPS57212224A (en) * | 1981-06-24 | 1982-12-27 | Nitto Electric Ind Co Ltd | Epoxy resin composition for encapsulation of semiconductor |
JPS61138619A (en) * | 1984-12-10 | 1986-06-26 | Matsushita Electric Works Ltd | Epoxy resin composition for sealing semiconductor |
JPS61221223A (en) * | 1985-03-27 | 1986-10-01 | Toshiba Corp | Epoxy resin composition for sealing semiconductor |
JPS6259626A (en) * | 1985-09-10 | 1987-03-16 | Shin Etsu Chem Co Ltd | Epoxy resin composition |
JPS62136860A (en) * | 1985-12-10 | 1987-06-19 | Nitto Electric Ind Co Ltd | Semiconductor device |
-
1987
- 1987-09-14 JP JP62230356A patent/JP2558293B2/en not_active Expired - Lifetime
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS572329A (en) * | 1980-06-05 | 1982-01-07 | Toshiba Corp | Epoxy resin type composition and semiconductor device of resin sealing type |
JPS57212224A (en) * | 1981-06-24 | 1982-12-27 | Nitto Electric Ind Co Ltd | Epoxy resin composition for encapsulation of semiconductor |
JPS61138619A (en) * | 1984-12-10 | 1986-06-26 | Matsushita Electric Works Ltd | Epoxy resin composition for sealing semiconductor |
JPS61221223A (en) * | 1985-03-27 | 1986-10-01 | Toshiba Corp | Epoxy resin composition for sealing semiconductor |
JPS6259626A (en) * | 1985-09-10 | 1987-03-16 | Shin Etsu Chem Co Ltd | Epoxy resin composition |
JPS62136860A (en) * | 1985-12-10 | 1987-06-19 | Nitto Electric Ind Co Ltd | Semiconductor device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005519147A (en) * | 2002-02-28 | 2005-06-30 | シーメンス アクチエンゲゼルシヤフト | Low corrosive epoxy resin and manufacturing method therefor |
US7582706B2 (en) | 2002-02-28 | 2009-09-01 | Siemens Aktiengesellschaft | Low chlorine content epoxy resin |
WO2008007730A1 (en) | 2006-07-12 | 2008-01-17 | Unisantis Electronics (Japan) Ltd. | Nonvolatile semiconductor memory and its drive method |
Also Published As
Publication number | Publication date |
---|---|
JP2558293B2 (en) | 1996-11-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080905 Year of fee payment: 12 |