JPS6468930A - Manufacture of x-ray exposure mask - Google Patents
Manufacture of x-ray exposure maskInfo
- Publication number
- JPS6468930A JPS6468930A JP22604887A JP22604887A JPS6468930A JP S6468930 A JPS6468930 A JP S6468930A JP 22604887 A JP22604887 A JP 22604887A JP 22604887 A JP22604887 A JP 22604887A JP S6468930 A JPS6468930 A JP S6468930A
- Authority
- JP
- Japan
- Prior art keywords
- sample stage
- thin film
- holder
- ray
- substrate holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To obtain a mask for X-ray exposure, whose position accuracy is improved, when an X-ray absorbing material layer comprising high-melting-point metal is formed, by bringing the outer surface of an X-ray transmitting thin film into contact with a conductive substrate holder, maintaining the holder at a positive DC potential with respect to a ground potential, and maintaining the device at a constant temperature. CONSTITUTION:A substrate holder 112 comprising a conductive material is directly attached to the lower side of a sample stage 105. An Si wafer substrate 1 is arranged and held between the sample stage 105 and the substrate holder 112 so that the entire body of or a part of the outer surface of an X-ray transmitting thin film 2 is directly in contact with the inner side of the sample holder 112. The X-ray transmitting thin film 2 is directed downward. A vacuum container 101 is grounded. DC voltage sources 113 are connected between the sample stage 105 comprising the conductive material and the ground through a DC bias potential electrometer 116 and a polality switch 117. The temperature of the sample stage 105 is made constant between 100-400 deg.C. Gas pressure is controlled at the accuracy of a 1/100 Pa level.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22604887A JP2599730B2 (en) | 1987-09-09 | 1987-09-09 | Method of manufacturing mask for X-ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22604887A JP2599730B2 (en) | 1987-09-09 | 1987-09-09 | Method of manufacturing mask for X-ray exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6468930A true JPS6468930A (en) | 1989-03-15 |
JP2599730B2 JP2599730B2 (en) | 1997-04-16 |
Family
ID=16838972
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22604887A Expired - Lifetime JP2599730B2 (en) | 1987-09-09 | 1987-09-09 | Method of manufacturing mask for X-ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2599730B2 (en) |
-
1987
- 1987-09-09 JP JP22604887A patent/JP2599730B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2599730B2 (en) | 1997-04-16 |
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Legal Events
Date | Code | Title | Description |
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R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080109 Year of fee payment: 11 |