JPS6468930A - Manufacture of x-ray exposure mask - Google Patents

Manufacture of x-ray exposure mask

Info

Publication number
JPS6468930A
JPS6468930A JP22604887A JP22604887A JPS6468930A JP S6468930 A JPS6468930 A JP S6468930A JP 22604887 A JP22604887 A JP 22604887A JP 22604887 A JP22604887 A JP 22604887A JP S6468930 A JPS6468930 A JP S6468930A
Authority
JP
Japan
Prior art keywords
sample stage
thin film
holder
ray
substrate holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22604887A
Other languages
Japanese (ja)
Other versions
JP2599730B2 (en
Inventor
Yukio Iimura
Hideo Yoshihara
Akira Ozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Dai Nippon Printing Co Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd, Nippon Telegraph and Telephone Corp filed Critical Dai Nippon Printing Co Ltd
Priority to JP22604887A priority Critical patent/JP2599730B2/en
Publication of JPS6468930A publication Critical patent/JPS6468930A/en
Application granted granted Critical
Publication of JP2599730B2 publication Critical patent/JP2599730B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To obtain a mask for X-ray exposure, whose position accuracy is improved, when an X-ray absorbing material layer comprising high-melting-point metal is formed, by bringing the outer surface of an X-ray transmitting thin film into contact with a conductive substrate holder, maintaining the holder at a positive DC potential with respect to a ground potential, and maintaining the device at a constant temperature. CONSTITUTION:A substrate holder 112 comprising a conductive material is directly attached to the lower side of a sample stage 105. An Si wafer substrate 1 is arranged and held between the sample stage 105 and the substrate holder 112 so that the entire body of or a part of the outer surface of an X-ray transmitting thin film 2 is directly in contact with the inner side of the sample holder 112. The X-ray transmitting thin film 2 is directed downward. A vacuum container 101 is grounded. DC voltage sources 113 are connected between the sample stage 105 comprising the conductive material and the ground through a DC bias potential electrometer 116 and a polality switch 117. The temperature of the sample stage 105 is made constant between 100-400 deg.C. Gas pressure is controlled at the accuracy of a 1/100 Pa level.
JP22604887A 1987-09-09 1987-09-09 Method of manufacturing mask for X-ray exposure Expired - Lifetime JP2599730B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22604887A JP2599730B2 (en) 1987-09-09 1987-09-09 Method of manufacturing mask for X-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22604887A JP2599730B2 (en) 1987-09-09 1987-09-09 Method of manufacturing mask for X-ray exposure

Publications (2)

Publication Number Publication Date
JPS6468930A true JPS6468930A (en) 1989-03-15
JP2599730B2 JP2599730B2 (en) 1997-04-16

Family

ID=16838972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22604887A Expired - Lifetime JP2599730B2 (en) 1987-09-09 1987-09-09 Method of manufacturing mask for X-ray exposure

Country Status (1)

Country Link
JP (1) JP2599730B2 (en)

Also Published As

Publication number Publication date
JP2599730B2 (en) 1997-04-16

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