JPS5643641A - Photomask - Google Patents

Photomask

Info

Publication number
JPS5643641A
JPS5643641A JP12116279A JP12116279A JPS5643641A JP S5643641 A JPS5643641 A JP S5643641A JP 12116279 A JP12116279 A JP 12116279A JP 12116279 A JP12116279 A JP 12116279A JP S5643641 A JPS5643641 A JP S5643641A
Authority
JP
Japan
Prior art keywords
photomask
mask
dust
substrate
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12116279A
Other languages
Japanese (ja)
Inventor
Hiroshi Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP12116279A priority Critical patent/JPS5643641A/en
Publication of JPS5643641A publication Critical patent/JPS5643641A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To prevent dust from attaching to the surface of a photomask, and to enhance IC fabrication yield, by covering the surfaces of the mask formed on part of a transparent substrate and the residual part of substrate with a conductive film. CONSTITUTION:Mask 2 is formed on transparent glass substrate 1 with a metal such as Cr, a metal oxide, or the like. Conductive film 3, for covering substrate 1 and mask 2, such as a film of SnO2 transmitting a light of 100-500nm wavelength region is formed by the vacuum sputtering or vapor deposition method. Film 3 may be formed only on the side of mask 2, but films 3 formed on both the sides are more effective. Films 3 are grounded and an opposite dust collecting electrode is subjected to a positive DC voltage, and the photomask is conserved in such conditions. Dust in the air or an inert gas is charged negatively, and attracted to electrode 4, and the photomask is conserved in a superior state, thus permitting a photoresist pattern to be prevented from causing troubles due to dust in IC fabrication using this photomask.
JP12116279A 1979-09-19 1979-09-19 Photomask Pending JPS5643641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12116279A JPS5643641A (en) 1979-09-19 1979-09-19 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12116279A JPS5643641A (en) 1979-09-19 1979-09-19 Photomask

Publications (1)

Publication Number Publication Date
JPS5643641A true JPS5643641A (en) 1981-04-22

Family

ID=14804369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12116279A Pending JPS5643641A (en) 1979-09-19 1979-09-19 Photomask

Country Status (1)

Country Link
JP (1) JPS5643641A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59146954A (en) * 1982-12-28 1984-08-23 Seiko Epson Corp See-through mask
EP0323264A2 (en) * 1987-12-29 1989-07-05 Canon Kabushiki Kaisha X-ray exposure process using an electrically conductive x-ray mask
US7961244B2 (en) * 1998-03-31 2011-06-14 Nikon Corporation Optical filter and optical device provided with this optical filter

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59146954A (en) * 1982-12-28 1984-08-23 Seiko Epson Corp See-through mask
EP0323264A2 (en) * 1987-12-29 1989-07-05 Canon Kabushiki Kaisha X-ray exposure process using an electrically conductive x-ray mask
US7961244B2 (en) * 1998-03-31 2011-06-14 Nikon Corporation Optical filter and optical device provided with this optical filter

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