JPS6457666A - Heterojunction bipolar transistor - Google Patents
Heterojunction bipolar transistorInfo
- Publication number
- JPS6457666A JPS6457666A JP21307687A JP21307687A JPS6457666A JP S6457666 A JPS6457666 A JP S6457666A JP 21307687 A JP21307687 A JP 21307687A JP 21307687 A JP21307687 A JP 21307687A JP S6457666 A JPS6457666 A JP S6457666A
- Authority
- JP
- Japan
- Prior art keywords
- external base
- base region
- heterojunction bipolar
- region
- bipolar transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Bipolar Transistors (AREA)
Abstract
PURPOSE:To obtain a collector-top type heterojunction bipolar transistor having a high current amplification percentage by a method wherein at least the surface located in the vicinity of the boundary of an intrinsic transistor and an external base of the external base region formed outside an intrinsic transistor region is covered by a semiconductor layer having the band gap wider than that of the external base region. CONSTITUTION:At least three layers selected from the first conductivity type semiconductor layers 102 and 103 which become an emitter, the second conductivity type semiconductor layer 104 which becomes a base, and the first conductivity type third semiconductor layers 105 and 106 which become a collector are laminated successively, and the forbidden band width of at least a part of the first semiconductor layers 102 and 103 is formed wider than that of the second semiconductor layer 104. In such a heterojunction bipolar transistor above- mentioned, at least the surface in the vicinity of the boundary of the intrinsic transistor of the external base region 107 formed outside the intrinsic transistor region and external base region 107, is covered by the semiconductive material layer 108 having the band gap wider than that of the external base region 107.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21307687A JPS6457666A (en) | 1987-08-28 | 1987-08-28 | Heterojunction bipolar transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21307687A JPS6457666A (en) | 1987-08-28 | 1987-08-28 | Heterojunction bipolar transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6457666A true JPS6457666A (en) | 1989-03-03 |
Family
ID=16633146
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21307687A Pending JPS6457666A (en) | 1987-08-28 | 1987-08-28 | Heterojunction bipolar transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6457666A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6426266B1 (en) | 1997-12-22 | 2002-07-30 | Nec Corporation | Manufacturing method for an inverted-structure bipolar transistor with improved high-frequency characteristics |
-
1987
- 1987-08-28 JP JP21307687A patent/JPS6457666A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6426266B1 (en) | 1997-12-22 | 2002-07-30 | Nec Corporation | Manufacturing method for an inverted-structure bipolar transistor with improved high-frequency characteristics |
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