JPS6457666A - Heterojunction bipolar transistor - Google Patents

Heterojunction bipolar transistor

Info

Publication number
JPS6457666A
JPS6457666A JP21307687A JP21307687A JPS6457666A JP S6457666 A JPS6457666 A JP S6457666A JP 21307687 A JP21307687 A JP 21307687A JP 21307687 A JP21307687 A JP 21307687A JP S6457666 A JPS6457666 A JP S6457666A
Authority
JP
Japan
Prior art keywords
external base
base region
heterojunction bipolar
region
bipolar transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21307687A
Other languages
Japanese (ja)
Inventor
Yoshiko Hiraoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP21307687A priority Critical patent/JPS6457666A/en
Publication of JPS6457666A publication Critical patent/JPS6457666A/en
Pending legal-status Critical Current

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  • Bipolar Transistors (AREA)

Abstract

PURPOSE:To obtain a collector-top type heterojunction bipolar transistor having a high current amplification percentage by a method wherein at least the surface located in the vicinity of the boundary of an intrinsic transistor and an external base of the external base region formed outside an intrinsic transistor region is covered by a semiconductor layer having the band gap wider than that of the external base region. CONSTITUTION:At least three layers selected from the first conductivity type semiconductor layers 102 and 103 which become an emitter, the second conductivity type semiconductor layer 104 which becomes a base, and the first conductivity type third semiconductor layers 105 and 106 which become a collector are laminated successively, and the forbidden band width of at least a part of the first semiconductor layers 102 and 103 is formed wider than that of the second semiconductor layer 104. In such a heterojunction bipolar transistor above- mentioned, at least the surface in the vicinity of the boundary of the intrinsic transistor of the external base region 107 formed outside the intrinsic transistor region and external base region 107, is covered by the semiconductive material layer 108 having the band gap wider than that of the external base region 107.
JP21307687A 1987-08-28 1987-08-28 Heterojunction bipolar transistor Pending JPS6457666A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21307687A JPS6457666A (en) 1987-08-28 1987-08-28 Heterojunction bipolar transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21307687A JPS6457666A (en) 1987-08-28 1987-08-28 Heterojunction bipolar transistor

Publications (1)

Publication Number Publication Date
JPS6457666A true JPS6457666A (en) 1989-03-03

Family

ID=16633146

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21307687A Pending JPS6457666A (en) 1987-08-28 1987-08-28 Heterojunction bipolar transistor

Country Status (1)

Country Link
JP (1) JPS6457666A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6426266B1 (en) 1997-12-22 2002-07-30 Nec Corporation Manufacturing method for an inverted-structure bipolar transistor with improved high-frequency characteristics

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6426266B1 (en) 1997-12-22 2002-07-30 Nec Corporation Manufacturing method for an inverted-structure bipolar transistor with improved high-frequency characteristics

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