JPS5368990A - Production of semiconductor integrated circuit - Google Patents
Production of semiconductor integrated circuitInfo
- Publication number
- JPS5368990A JPS5368990A JP14504576A JP14504576A JPS5368990A JP S5368990 A JPS5368990 A JP S5368990A JP 14504576 A JP14504576 A JP 14504576A JP 14504576 A JP14504576 A JP 14504576A JP S5368990 A JPS5368990 A JP S5368990A
- Authority
- JP
- Japan
- Prior art keywords
- production
- integrated circuit
- semiconductor integrated
- gate circuit
- decreasing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To reduce use area without decreasing the operating speed of the gate circuit of an I2 L and make perfect the electrical isolation between each gate circuit by providing the interelement isolating regions composed of the combination of an oxide and a high impurity concentration region in a vertical direction from the epitaxial layer surface down to the buried layer.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14504576A JPS5368990A (en) | 1976-12-01 | 1976-12-01 | Production of semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14504576A JPS5368990A (en) | 1976-12-01 | 1976-12-01 | Production of semiconductor integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5368990A true JPS5368990A (en) | 1978-06-19 |
Family
ID=15376101
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14504576A Pending JPS5368990A (en) | 1976-12-01 | 1976-12-01 | Production of semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5368990A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5656537A (en) * | 1994-11-28 | 1997-08-12 | Mitsubishi Denki Kabushiki Kaisha | Method of manufacturing a semiconductor device having SOI structure |
US5801080A (en) * | 1993-07-05 | 1998-09-01 | Mitsubishi Denki Kabushiki Kaisha | Method of manufacturing semiconductor substrate having total and partial dielectric isolation |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4736785A (en) * | 1971-03-20 | 1972-11-29 | ||
JPS5154379A (en) * | 1974-10-29 | 1976-05-13 | Fairchild Camera Instr Co | |
JPS5164386A (en) * | 1974-10-09 | 1976-06-03 | Philips Nv |
-
1976
- 1976-12-01 JP JP14504576A patent/JPS5368990A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4736785A (en) * | 1971-03-20 | 1972-11-29 | ||
JPS5164386A (en) * | 1974-10-09 | 1976-06-03 | Philips Nv | |
JPS5154379A (en) * | 1974-10-29 | 1976-05-13 | Fairchild Camera Instr Co |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5801080A (en) * | 1993-07-05 | 1998-09-01 | Mitsubishi Denki Kabushiki Kaisha | Method of manufacturing semiconductor substrate having total and partial dielectric isolation |
US6198134B1 (en) | 1993-07-05 | 2001-03-06 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device having a common substrate bias |
US6351014B2 (en) | 1993-07-05 | 2002-02-26 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device having different field oxide sizes |
US6727552B2 (en) | 1993-07-05 | 2004-04-27 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device and method of manufacturing the same |
US5656537A (en) * | 1994-11-28 | 1997-08-12 | Mitsubishi Denki Kabushiki Kaisha | Method of manufacturing a semiconductor device having SOI structure |
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