JPS645687B2 - - Google Patents

Info

Publication number
JPS645687B2
JPS645687B2 JP13492580A JP13492580A JPS645687B2 JP S645687 B2 JPS645687 B2 JP S645687B2 JP 13492580 A JP13492580 A JP 13492580A JP 13492580 A JP13492580 A JP 13492580A JP S645687 B2 JPS645687 B2 JP S645687B2
Authority
JP
Japan
Prior art keywords
film
parts
transparent support
image
photopolymerizable composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13492580A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5760328A (en
Inventor
Shunichi Hayashi
Takashi Yamamura
Toku Nagasawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP13492580A priority Critical patent/JPS5760328A/ja
Publication of JPS5760328A publication Critical patent/JPS5760328A/ja
Publication of JPS645687B2 publication Critical patent/JPS645687B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP13492580A 1980-09-27 1980-09-27 Image forming material Granted JPS5760328A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13492580A JPS5760328A (en) 1980-09-27 1980-09-27 Image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13492580A JPS5760328A (en) 1980-09-27 1980-09-27 Image forming material

Publications (2)

Publication Number Publication Date
JPS5760328A JPS5760328A (en) 1982-04-12
JPS645687B2 true JPS645687B2 (enrdf_load_stackoverflow) 1989-01-31

Family

ID=15139741

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13492580A Granted JPS5760328A (en) 1980-09-27 1980-09-27 Image forming material

Country Status (1)

Country Link
JP (1) JPS5760328A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4895787A (en) * 1988-07-18 1990-01-23 Hoechst Celanese Corporation Photopolymerizable positive working, peel developable, single sheet color proofing system

Also Published As

Publication number Publication date
JPS5760328A (en) 1982-04-12

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