JPS645454B2 - - Google Patents
Info
- Publication number
- JPS645454B2 JPS645454B2 JP4555181A JP4555181A JPS645454B2 JP S645454 B2 JPS645454 B2 JP S645454B2 JP 4555181 A JP4555181 A JP 4555181A JP 4555181 A JP4555181 A JP 4555181A JP S645454 B2 JPS645454 B2 JP S645454B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- cleaning
- tank
- cleaned
- flow control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
- H01L21/3046—Mechanical treatment, e.g. grinding, polishing, cutting using blasting, e.g. sand-blasting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4555181A JPS57160131A (en) | 1981-03-30 | 1981-03-30 | Washing cell |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4555181A JPS57160131A (en) | 1981-03-30 | 1981-03-30 | Washing cell |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57160131A JPS57160131A (en) | 1982-10-02 |
JPS645454B2 true JPS645454B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-01-30 |
Family
ID=12722491
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4555181A Granted JPS57160131A (en) | 1981-03-30 | 1981-03-30 | Washing cell |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57160131A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5974887U (ja) * | 1982-11-09 | 1984-05-21 | ソニー株式会社 | 洗浄装置 |
JPS60163436A (ja) * | 1984-02-06 | 1985-08-26 | Seiichiro Sogo | 半導体材料の洗浄乾燥方法 |
JPS61254280A (ja) * | 1985-05-07 | 1986-11-12 | オムロン株式会社 | 超音波洗浄装置 |
JPH0164044U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1987-10-16 | 1989-04-25 | ||
KR0166831B1 (ko) * | 1995-12-18 | 1999-02-01 | 문정환 | 반도체 웨이퍼 세정장치 및 방법 |
-
1981
- 1981-03-30 JP JP4555181A patent/JPS57160131A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57160131A (en) | 1982-10-02 |