JPS645287B2 - - Google Patents

Info

Publication number
JPS645287B2
JPS645287B2 JP13390180A JP13390180A JPS645287B2 JP S645287 B2 JPS645287 B2 JP S645287B2 JP 13390180 A JP13390180 A JP 13390180A JP 13390180 A JP13390180 A JP 13390180A JP S645287 B2 JPS645287 B2 JP S645287B2
Authority
JP
Japan
Prior art keywords
film
parts
image
photopolymerizable composition
composition layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13390180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5758140A (en
Inventor
Takashi Yamamura
Tomomichi Kaneko
Shunichi Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP13390180A priority Critical patent/JPS5758140A/ja
Publication of JPS5758140A publication Critical patent/JPS5758140A/ja
Publication of JPS645287B2 publication Critical patent/JPS645287B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP13390180A 1980-09-25 1980-09-25 Image forming material Granted JPS5758140A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13390180A JPS5758140A (en) 1980-09-25 1980-09-25 Image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13390180A JPS5758140A (en) 1980-09-25 1980-09-25 Image forming material

Publications (2)

Publication Number Publication Date
JPS5758140A JPS5758140A (en) 1982-04-07
JPS645287B2 true JPS645287B2 (zh) 1989-01-30

Family

ID=15115743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13390180A Granted JPS5758140A (en) 1980-09-25 1980-09-25 Image forming material

Country Status (1)

Country Link
JP (1) JPS5758140A (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5989367A (ja) * 1982-11-15 1984-05-23 Mitsui Petrochem Ind Ltd 被覆用硬化型樹脂組成物
JPS59159155A (ja) * 1983-03-01 1984-09-08 Hitachi Chem Co Ltd 感光性樹脂組成物
JP2719799B2 (ja) * 1988-10-14 1998-02-25 日本合成化学工業株式会社 感光性樹脂組成物

Also Published As

Publication number Publication date
JPS5758140A (en) 1982-04-07

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