JPS6451620A - Vapor growth method - Google Patents
Vapor growth methodInfo
- Publication number
- JPS6451620A JPS6451620A JP20953987A JP20953987A JPS6451620A JP S6451620 A JPS6451620 A JP S6451620A JP 20953987 A JP20953987 A JP 20953987A JP 20953987 A JP20953987 A JP 20953987A JP S6451620 A JPS6451620 A JP S6451620A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- vapor growth
- gas
- holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62209539A JP2538607B2 (ja) | 1987-08-24 | 1987-08-24 | 気相成長法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62209539A JP2538607B2 (ja) | 1987-08-24 | 1987-08-24 | 気相成長法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6451620A true JPS6451620A (en) | 1989-02-27 |
JP2538607B2 JP2538607B2 (ja) | 1996-09-25 |
Family
ID=16574483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62209539A Expired - Lifetime JP2538607B2 (ja) | 1987-08-24 | 1987-08-24 | 気相成長法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2538607B2 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0322527A (ja) * | 1989-06-20 | 1991-01-30 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH0417329A (ja) * | 1990-05-11 | 1992-01-22 | Nec Corp | 薄膜の形成方法 |
JPH09148268A (ja) * | 1995-11-22 | 1997-06-06 | Nec Corp | 半導体装置の製造方法 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4949180A (ja) * | 1972-09-18 | 1974-05-13 | ||
JPS5571040A (en) * | 1978-11-22 | 1980-05-28 | Mitsubishi Electric Corp | Multilayer interconnection structure |
JPS5683026A (en) * | 1979-11-08 | 1981-07-07 | Itt | Metallizing treatment for semiconductor device |
JPS5972132A (ja) * | 1982-10-19 | 1984-04-24 | Toshiba Corp | 金属及び金属シリサイド膜の形成方法 |
JPS61198763A (ja) * | 1985-02-28 | 1986-09-03 | Toshiba Corp | 半導体装置の製造方法 |
JPS61256672A (ja) * | 1985-05-09 | 1986-11-14 | Toshiba Corp | 半導体装置の製造方法 |
JPS6266629A (ja) * | 1985-09-19 | 1987-03-26 | Fujitsu Ltd | 薄膜形成方法 |
JPS62105422A (ja) * | 1985-11-01 | 1987-05-15 | Hitachi Ltd | 半導体装置の製造方法 |
JPS6333569A (ja) * | 1986-07-25 | 1988-02-13 | Nippon Telegr & Teleph Corp <Ntt> | 金属薄膜の製造方法 |
-
1987
- 1987-08-24 JP JP62209539A patent/JP2538607B2/ja not_active Expired - Lifetime
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4949180A (ja) * | 1972-09-18 | 1974-05-13 | ||
JPS5571040A (en) * | 1978-11-22 | 1980-05-28 | Mitsubishi Electric Corp | Multilayer interconnection structure |
JPS5683026A (en) * | 1979-11-08 | 1981-07-07 | Itt | Metallizing treatment for semiconductor device |
JPS5972132A (ja) * | 1982-10-19 | 1984-04-24 | Toshiba Corp | 金属及び金属シリサイド膜の形成方法 |
JPS61198763A (ja) * | 1985-02-28 | 1986-09-03 | Toshiba Corp | 半導体装置の製造方法 |
JPS61256672A (ja) * | 1985-05-09 | 1986-11-14 | Toshiba Corp | 半導体装置の製造方法 |
JPS6266629A (ja) * | 1985-09-19 | 1987-03-26 | Fujitsu Ltd | 薄膜形成方法 |
JPS62105422A (ja) * | 1985-11-01 | 1987-05-15 | Hitachi Ltd | 半導体装置の製造方法 |
JPS6333569A (ja) * | 1986-07-25 | 1988-02-13 | Nippon Telegr & Teleph Corp <Ntt> | 金属薄膜の製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0322527A (ja) * | 1989-06-20 | 1991-01-30 | Fujitsu Ltd | 半導体装置の製造方法 |
JPH0417329A (ja) * | 1990-05-11 | 1992-01-22 | Nec Corp | 薄膜の形成方法 |
JPH09148268A (ja) * | 1995-11-22 | 1997-06-06 | Nec Corp | 半導体装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2538607B2 (ja) | 1996-09-25 |
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