JPS6442195A - Method of forming pattern by lift-off - Google Patents
Method of forming pattern by lift-offInfo
- Publication number
- JPS6442195A JPS6442195A JP19838587A JP19838587A JPS6442195A JP S6442195 A JPS6442195 A JP S6442195A JP 19838587 A JP19838587 A JP 19838587A JP 19838587 A JP19838587 A JP 19838587A JP S6442195 A JPS6442195 A JP S6442195A
- Authority
- JP
- Japan
- Prior art keywords
- metal layer
- substrate
- resist pattern
- lift
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/04—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
- H05K3/046—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
- H05K3/048—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
Abstract
PURPOSE:To facilitate forming of a pattern which has a high adhesion strength to a substrate by a method wherein a 1st metal layer is formed on the substrate surface and a resist pattern and a 2nd metal layer are successively formed on the 1st metal layer and the 2nd metal layer is lifted off. CONSTITUTION:A first metal layer 4 is formed on the clean surface of a substrate 1. After a resist pattern 2 and a 2nd metal layer 5 are successively formed, the 2nd metal layer 5 is lifted off by removing the resist pattern 2 and the 1st metal layer 4 is etched with the remaining 2nd metal layer 5 as a mask. With this constitution, a pattern which is reversal of the resist pattern and composed of the 1st metal layer with a high adhesion strength to the substrate can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19838587A JPS6442195A (en) | 1987-08-07 | 1987-08-07 | Method of forming pattern by lift-off |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19838587A JPS6442195A (en) | 1987-08-07 | 1987-08-07 | Method of forming pattern by lift-off |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6442195A true JPS6442195A (en) | 1989-02-14 |
Family
ID=16390244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19838587A Pending JPS6442195A (en) | 1987-08-07 | 1987-08-07 | Method of forming pattern by lift-off |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6442195A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002374093A (en) * | 2001-06-13 | 2002-12-26 | Bridgestone Corp | Electromagnetic wave shielding light transmitting window material and its producing method |
JP2002374094A (en) * | 2001-06-13 | 2002-12-26 | Bridgestone Corp | Electromagnetic wave shielding light transmitting window material and its producing method |
-
1987
- 1987-08-07 JP JP19838587A patent/JPS6442195A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002374093A (en) * | 2001-06-13 | 2002-12-26 | Bridgestone Corp | Electromagnetic wave shielding light transmitting window material and its producing method |
JP2002374094A (en) * | 2001-06-13 | 2002-12-26 | Bridgestone Corp | Electromagnetic wave shielding light transmitting window material and its producing method |
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