JP2002374093A - Electromagnetic wave shielding light transmitting window material and its producing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an efficient method for producing an electromagnetic wave shielding light transmitting window material exhibiting excellent light transmitting performance and electromagnetic wave shielding performance while preventing moire phenomenon. SOLUTION: On a transparent substrate, at least a pattern is formed using a substance soluble to a solvent and a conductive layer insoluble to the solvent is formed thereon and then a plating layer is formed after removing the pattern and the conductive layer formed thereon by the solvent. In such a method for producing an electromagnetic wave shielding light transmitting window material, at least any one of copper, nickel, chromium, zinc, silver and gold is employed in the plating and the thickness of the plating layer is preferably in the range of 0.1-10 μm.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electromagnetic wave shielding property useful as a front filter of a plasma display panel (PDP) or a window material (for example, a sticking film) of a building requiring an electromagnetic wave shielding such as a hospital. The present invention relates to a method for manufacturing a light-transmitting window material and the like, and particularly to an electromagnetic-shielding light-transmitting window material obtained by forming a conductive pattern on a transparent substrate and a method for manufacturing the same.

[0002]

2. Description of the Related Art In recent years, with the spread of OA equipment and communication equipment, electromagnetic waves generated from these equipment have been regarded as a problem. In particular, the effects of the electromagnetic wave on the human body and the error movement of precision equipment have become problems. Have been.

In order to solve the above-mentioned problem, an electromagnetic wave shielding and light transmitting window material having electromagnetic wave shielding and light transmitting properties has been developed and put to practical use as a front filter of a PDP in OA equipment. Such a window material is also used as a window material in places where precision equipment is installed, such as hospitals and laboratories, for protecting precision equipment from electromagnetic waves such as mobile phones. However, these were mainly integrated with a conductive mesh material such as a wire mesh or a transparent conductive film interposed between transparent substrates such as an acrylic plate.

Generally, the conductive mesh has a wire diameter of 1 mm.
It is about 5 to 500 mesh at 0 to 500 μm, the opening ratio is low, and it is possible to use a coarse fiber mesh for a fiber with a large wire diameter, but a coarse mesh is formed with a fiber with a small wire diameter. It was very difficult to do. For this reason, in the electromagnetic wave shielding light transmitting window material using such a conductive mesh, even if it has excellent light transmittance, the light transmittance is about 70%, and it is not possible to obtain excellent light transmittance. was there. There is also a problem that moire (interference fringes) is likely to occur due to the relationship with the pixel pitch in the light emitting panel to which the electromagnetic wave shielding light transmitting window material is attached.

[0005] By using the transparent conductive film,
In the technology for achieving both the light transmittance and the electromagnetic wave shielding property, there is a problem that it is not easy for the transparent conductive film to conduct with the housing. That is, if it is a conductive mesh, the periphery of the conductive mesh protrudes from the periphery of the transparent substrate, and the protruding portion is bent, and conduction with the housing can be achieved from the bent portion.
In the case of the transparent conductive film, when the peripheral portion is bent out of the peripheral portion of the transparent substrate, the film is torn at the bent portion, and there is a problem that conduction with the housing cannot be obtained.

[0006] Instead of using a transparent conductive film, a technique of directly forming a transparent conductive film on the bonding surface of one transparent substrate is also conceivable. However, in this case, the transparent conductive film is covered with the other transparent substrate, and conduction from the transparent conductive film to the housing cannot be achieved.

Therefore, when a transparent conductive film is used, it is necessary to change the design, for example, by forming a through hole in a transparent substrate to provide a conduction path with the transparent conductive film. There is a problem because the work of assembling the materials and assembling them into the housing becomes complicated.

In order to provide sufficient electromagnetic wave shielding properties, it is necessary to increase the thickness of the conductive layer. However, if the thickness of the conductive layer is large, the solvent sufficiently penetrates in the step of removing with the solvent. Therefore, there were problems such as poor removal efficiency, insufficient removal, and formation of a conductive layer having a precise shape. Furthermore, when a conductive layer is obtained by vapor deposition, sputtering, or the like, there is a problem that an enormous amount of time and cost are required. In recent years, with the development of technology, there is a demand for an electromagnetic wave shielding light transmitting window material having excellent electromagnetic wave shielding properties, excellent light transmittance, and an efficient manufacturing method thereof.

[0009]

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned conventional problems and achieve the following objects. That is, an object of the present invention is to provide an electromagnetic wave shielding light transmitting window material excellent in light transmitting property and electromagnetic wave shielding property while preventing a moire phenomenon, and an efficient manufacturing method thereof.

[0010]

Means for solving the above problems are as follows. That is, <1> a pattern was formed on a transparent substrate using at least a substance soluble in a solvent, a conductive layer insoluble in the solvent was formed, and the pattern was formed on the pattern using the solvent. A method for producing a light-transmitting window material having electromagnetic shielding properties, comprising providing a plating layer by plating after removing the conductive layer. <2> In the plating process, copper, nickel, chromium,
The method for producing an electromagnetic wave shielding light transmitting window material according to <1>, wherein at least one of zinc, tin, silver, and gold is used.

<3> The thickness of the plating layer is 0.1 to 10
The method for producing an electromagnetic wave shielding light transmitting window material according to <1> or <2>, wherein the thickness is μm. <4> The method according to any one of <1> to <3>, wherein the solvent is water. <5> wherein the substance soluble in the solvent is a water-soluble resin;
A method for producing an electromagnetic wave shielding light transmitting window material according to any one of 1> to <4>.

<6> The method for producing an electromagnetic wave shielding light transmitting window material according to <5>, wherein the water-soluble resin is polyvinyl alcohol. <7> The method according to any one of <1> to <6>, wherein the pattern is a dot-like pattern, and the electromagnetic wave shielding light transmitting window material is formed by printing. <8> Thickness of conductive layer (refers to the thickness of the conductive layer formed on the pattern. The same applies to the present invention hereinafter).
Is from 100 to 10000 °, from <1> to <7>
5. The method for producing an electromagnetic wave shielding light transmitting window material according to any one of the above.

<9> An electromagnetic wave shielding light transmitting window material obtained by the method for producing an electromagnetic wave shielding light transmitting window material according to any one of <1> to <8>. <10> The electromagnetic wave shielding light transmitting window material according to <9>, wherein the aperture ratio is 75% or more. <11> The electromagnetic wave shielding light transmitting window material according to <9> or <10>, wherein the plating layer has a surface resistivity of 3Ω / □ or less.

<12> An electromagnetic wave having at least a conductive layer and a plating layer in this order on a transparent substrate, wherein the conductive layer and the plating layer are lattice-shaped layers having an aperture ratio of 75% or more. It is a light transmitting window material having a shielding property.

[0015]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail. [Method of Manufacturing Electromagnetic Wave Shielding Light Transmitting Window Material] The method of manufacturing an electromagnetic wave shielding light transmitting window material of the present invention comprises forming a pattern on a transparent substrate, forming a conductive layer, and forming the pattern and the pattern. After removing the conductive layer, a plating layer is provided by plating.

-Transparent Substrate-The material of the transparent substrate is not particularly limited as long as it is transparent (meaning "transparent to visible light". The same applies hereinafter). For example, polyester and polyethylene terephthalate (PET), polybutylene terephthalate,
Polymethyl methacrylate (PMMA), acrylic resin, polycarbonate (PC), polystyrene, triacetate resin, polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion-crosslinked ethylene-methacryl Acid copolymer, polyurethane,
Cellophane and the like. Among these, polyethylene terephthalate (PET), polycarbonate (PC), polymethyl methacrylate (PMMA), and the like are highly resistant to loads during processing (heat, solvent, bending, etc.) and particularly high in transparency. preferable.

The thickness of the transparent substrate varies depending on the use of the electromagnetic wave shielding light transmitting window material and the like, but is generally preferably about 1 μm to 5 mm.

-Formation of Pattern- The pattern is formed using a substance soluble in a solvent. In the present invention, using a substance soluble in such a solvent, after forming a pattern on a transparent substrate, forming a conductive layer insoluble in the solvent, by the solvent, the pattern and formed on the pattern The removed conductive layer is removed. Thereby, by leaving the conductive layer formed in the region other than the region where the pattern is formed on the transparent substrate, it is possible to suitably obtain the electromagnetic wave shielding light transmitting window material having the conductive layer formed on the transparent substrate. .

Therefore, the material used for forming the pattern is relatively selected in relation to the solvent used for the subsequent removal. For example, when an aqueous solvent is used as the solvent, a water-soluble substance is used, and when an oil-based solvent is used as the solvent, an oil-soluble substance is used. Examples of the solvent include known organic solvents, but water is particularly preferable when it is inexpensive and considers the effect on the environment. The water may be ordinary water (tap water, distilled water, ion-exchanged water, etc.) or an aqueous solution containing an acid, an alkali, a surfactant and the like.

When the solvent is water, the material used for forming the pattern is preferably a water-soluble resin or the like, and particularly preferably polyvinyl alcohol because of its good water solubility. If desired, the material used for forming the pattern may be mixed with a pigment, a dye, or the like to make it easier to confirm the finished state.

The method for forming the pattern is not particularly limited, and includes known pattern forming methods such as printing, coating, and vapor deposition. Among these, printing is more preferable because a conductive layer having a small line width and a high aperture ratio can be formed. Examples of the printing method include gravure printing, screen printing, ink jet printing, electrostatic printing, and the like. Among these, gravure printing is particularly preferable in that the conductive layer and the like can be made thinner. In the printing, it is particularly preferable to form by a negative pattern printing in that a grid-like conductive layer having a high aperture ratio can be more suitably formed. The “aperture ratio” is a value obtained by calculation from the line width of the grid in the grid-shaped conductive layer and the number of grids (lines) existing in one inch width.

The shape of the pattern is not particularly limited, and includes a dot shape such as a circle, an ellipse, and a square (such as a square), a line shape, a grid shape, and the like. A grid-like conductive layer is preferably used. A square dot shape is preferred, and a square dot shape is particularly preferred, in that it is formed and has a higher aperture ratio and a more uniform grid line width. When the dot is a square, the length of one side is preferably about 100 to 500 μm, and the gap between the dots is preferably narrow in that a grid-like conductive layer with a smaller line width can be formed. , 1 to 50 μm is preferable, and a gap having a line width of 30 μm or less in the obtained lattice-shaped conductive layer is particularly preferable. The thickness of the pattern is not particularly limited, but is preferably about 0.1 to 5 μm.

Since it is not necessary to disperse conductive fine particles and the like in the material used for forming the pattern, the material used for forming the pattern has a low viscosity. Therefore, a pattern in which the gap between the patterns is extremely small as described above is formed. Since the region between the patterns is a region where the conductive layer is formed, in the present invention, a grid-like conductive layer having a small line width, fine and precise, and a high aperture ratio is suitably formed.

-Formation of Conductive Layer- The conductive layer is not particularly limited as long as it is insoluble in the solvent and contains a conductive material. Examples of the conductive material include aluminum, nickel, indium, and chromium. ,
Gold, vanadium, tin, cadmium, silver, platinum,
Metals such as copper, titanium, cobalt, lead, alloys, or IT
Preferable examples include conductive oxides such as O.

The thickness of the conductive layer is 100 to 10
000 ° is preferred, and 100-1000 ° is more preferred. When the thickness is less than 100 °, the electromagnetic wave shielding performance may not be sufficient. On the other hand, when the thickness is more than 10,000 °, when the solvent is removed, the solvent does not sufficiently penetrate and the removal efficiency is poor, or the removal is insufficient. There may be a problem that a precise conductive layer is not formed.

The method of forming the conductive layer is not particularly limited, but includes a vapor phase plating method such as sputtering, ion plating, vacuum deposition, and chemical vapor deposition; a liquid phase plating (electrolytic plating, electroless plating, etc.); Printing, coating and the like are mentioned, but vapor phase plating (sputtering, ion plating, vacuum deposition, chemical vapor deposition), liquid phase plating and the like are preferable.

-Removal- In the removal, the pattern and the conductive layer formed on the pattern are removed by the solvent. The removal method is not particularly limited as long as the pattern and the conductive layer formed on the pattern can be suitably removed, and examples thereof include washing with the solvent. At the time of the washing, if desired, an ultrasonic irradiation brush,
A dissolution promoting means such as a sponge may be used in combination. By the removal, the pattern formed of a substance soluble in the solvent is dissolved, furthermore, the conductive layer formed on the pattern is peeled off with the dissolution of the pattern, and only the conductive layer formed in the region between the patterns Is left without being peeled off, and is subjected to finish washing (rinsing) and drying as required, whereby a conductive layer having a high aperture ratio and a precise shape can be obtained.

-Plating Process- In the plating process, a plating layer is provided on the conductive layer by a plating process after the removal. In the present invention,
By performing the plating treatment in this manner, the electromagnetic wave shielding effect can be enhanced, so that the thickness of the conductive layer can be suppressed to the small value as described above. Therefore, at the time of the removal, the solvent can sufficiently penetrate the conductive layer, and a conductive layer having a high aperture ratio is formed. Also,
The time and cost for forming the conductive layer can be significantly reduced.

The material used for the plating treatment is not particularly limited as long as the plating layer has an excellent electromagnetic wave shielding effect. Examples of the material include metals such as copper, nickel, chromium, zinc, tin, silver, and gold. Is mentioned. These are 1
The species may be used alone or as two or more alloys.

The plating layer has a thickness of 0.1 to 1
0 μm is preferable, and 2 to 5 μm is more preferable. When the thickness is less than 0.1 μm, a sufficient electromagnetic wave shielding effect may not be provided in some cases. On the other hand, when the thickness is more than 10 μm, the plating spreads in the width direction when forming a plating layer. As a result, the aperture ratio of the conductive layer may be reduced.

The method for producing the electromagnetic wave shielding light transmitting window material of the present invention may include a step of providing another layer such as an antiglare layer, if desired. The method for forming the anti-glare layer is not particularly limited, and all known methods for forming an anti-glare layer can be suitably mentioned. For example, a blackening treatment can be mentioned. Examples of the blackening treatment include oxidation treatment of a metal film, black plating of a chromium alloy or the like, application of black or dark color ink, and the like.

An example of the method for producing the electromagnetic wave shielding light transmitting window material of the present invention will be described with reference to FIGS. FIG.
4 to 4 are schematic cross-sectional views for sequentially explaining a method of manufacturing the electromagnetic wave shielding light transmitting window material of the present invention. In the present invention, first, dots 2 are formed on a transparent substrate 1 using a substance soluble in a solvent (FIG. 1). Next, after forming a conductive layer 4 insoluble in the solvent and containing a conductive material (FIG. 2), the conductive layer 4 formed on the dots 2 and the dots 2 by the solvent is formed.
After removing (FIG. 3), a plating layer 5 is provided by plating to obtain an electromagnetic wave shielding light transmitting window material 10 (FIG. 4).

According to the method for manufacturing the electromagnetic wave shielding light transmitting window material of the present invention described above, an excellent electromagnetic wave shielding effect can be imparted by plating after removing the conductive layer. Can be reduced. Therefore, when the conductive layer is removed, a conductive layer having a high aperture ratio can be sufficiently removed, and the time required for vapor deposition and sputtering at the time of forming the conductive layer can be reduced. The present invention provides an electromagnetic wave shielding light transmitting window material excellent in both light transmittance and electromagnetic wave shielding performance efficiently. Therefore, according to the method of manufacturing the electromagnetic wave shielding light transmitting window material of the present invention, the moire phenomenon is prevented,
An electromagnetic wave shielding light transmitting window material having excellent light transmitting and electromagnetic wave shielding properties is efficiently manufactured.

[Electromagnetic Wave Shielding Light Transmitting Window Material] The electromagnetic wave shielding light transmitting window material of the present invention is obtained by the method for producing an electromagnetic wave shielding light transmitting window material of the present invention. The transparent substrate, the conductive layer, the plating layer and the like are all the same as those described in the method for producing the electromagnetic wave shielding light transmitting window material of the present invention. If desired, an anti-glare layer may be provided on the plating layer or the like to improve the anti-glare property.
Since the electromagnetic wave shielding light transmitting window material of the present invention has a small thickness of the conductive layer, it can be sufficiently removed with a solvent and has a high aperture ratio. In addition, since it has a plating layer, it has excellent electromagnetic wave shielding properties. Therefore, the electromagnetic wave shielding light transmitting window material of the present invention prevents the moire phenomenon and is excellent in light transmission and electromagnetic wave shielding properties.

The surface resistivity of the plating layer is preferably 3 Ω / □ or less, more preferably 1 Ω / □ or less. If the surface resistivity exceeds 3Ω / □, the conductivity may be insufficient and the electromagnetic wave shielding effect may be insufficient.

Further, the electromagnetic wave shielding light transmitting window material of the present invention has a conductive layer and a plating layer in this order on a transparent substrate, and the conductive layer and the plating layer have a grid-like layer having an aperture ratio of 75% or more. It is. The method for obtaining the electromagnetic wave shielding light transmitting window material of the present invention includes the manufacturing efficiency, the aperture ratio of the conductive layer and the plating layer, and the excellent electromagnetic wave shielding property in the obtained electromagnetic wave shielding light transmitting window material. The method for producing the electromagnetic wave shielding light transmitting window material of the present invention is particularly preferred. The transparent substrate, the conductive layer, and the plating layer are all the same as those described in the method of manufacturing the electromagnetic wave shielding light transmitting window material of the present invention. If desired, an antiglare layer may be further provided on the plating layer or the like. The aperture ratio needs to be 75% or more, and preferably 90% or more. If the aperture ratio is less than 75%, the light transmittance becomes insufficient.

FIG. 5 is a schematic configuration diagram showing a state in which the electromagnetic wave shielding light transmitting window material 10 of the present invention is viewed from the front.
In FIG. 5, the electromagnetic wave shielding light transmitting window material 10 has a grid-like conductive layer (not shown) and a plating layer 5 on the transparent substrate 1 in this order.

The electromagnetic wave shielding light transmitting window material of the present invention comprises:
As described above, it has excellent electromagnetic wave shielding properties, and has a high aperture ratio, and thus has excellent light transmittance. Furthermore, since the moire phenomenon is prevented and the electromagnetic wave shielding property and the heat ray (near infrared ray) cutting property are excellent, the window material of a front filter of a PDP (plasma display panel) or a building such as a hospital requiring an electromagnetic wave shielding is particularly required. (For example, a sticking film).

[0039]

EXAMPLES The present invention will be described below in detail with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples.

(Example)-Production of electromagnetic wave shielding light transmitting window material-Polyethylene terephthalate film (transparent substrate, thickness: 250 µm), 20% of polyvinyl alcohol
Printing was performed in the form of dots using the solution, and dots 2 were formed on the transparent substrate 1 as shown in FIG. The formed dots had a square shape with one side of 234 μm, the gap between the dots was 20 μm, and the thickness of the dots was 2 μm. Also,
Dots are printed on polyethylene terephthalate film.
They were regularly arranged in a square lattice.

Next, copper was vacuum deposited thereon to form a conductive layer 4 (thickness: 1000 °) as shown in FIG. Next, the dots and the conductive layer formed on the dots were removed by washing with water, and dried to form a grid-like conductive layer (FIG. 3). Then, by electroless copper plating,
A plating layer 5 (thickness: 3 μm) was provided to obtain an electromagnetic wave shielding light transmitting window material 10 as shown in FIG. 4.

<Measurement of surface resistivity (Ω / □)> The surface resistivity (Ω / □) of the plating layer in the electromagnetic wave shielding light transmitting window material was determined by a four-terminal method using Loresta AP (manufactured by Mitsubishi Chemical Corporation). Was measured by Table 1 shows the results.

<Measurement of Electric Field Shielding Effect (dB)> The electric field shielding effect (dB) of the electromagnetic wave shielding light transmitting window material was measured as follows. Table 1 shows the results.
The window material cut into 15 cm × 15 cm was measured by the KEC method under the condition of a frequency of 100 MHz. For the measurement, a shield characteristic evaluation device (manufactured by Anritsu Corporation) was used.

<Measurement of Magnetic Field Shielding Effect (dB)> The magnetic field shielding effect (dB) of the electromagnetic wave shielding light transmitting window material was measured in the same manner as the measurement of the electric field shielding effect (dB). Table 1 shows the results.

<Measurement and Calculation of Aperture Ratio (%)> The aperture ratio (%) of the electromagnetic wave shielding light transmitting window material was measured and calculated as follows. Table 1 shows the results. Using a Hitachi spectrophotometer (U-4000; manufactured by Hitachi, Ltd.), a wavelength of 55
The light transmittance at 0 nm was measured, the loss due to reflection at the air interface was canceled, and the result was taken as the aperture ratio.

(Comparative Example)-Production of Electromagnetic Wave Shielding Light Transmitting Window Material-In the "electromagnetic wave shielding light transmitting window material" of the example, except that the electroless copper plating treatment was not performed, the procedure was the same as in the example. Thus, an electromagnetic wave shielding light transmitting window material was obtained. That is,
20% polyvinyl alcohol on polyethylene terephthalate film (transparent substrate, thickness: 250 μm)
Printing was performed in the form of dots using a solution, and dots 2 were formed on a transparent substrate 1 as shown in FIG. 1 (square shape having one side of 234 μm, gap between dots: 20 μm, thickness of dots: 2 μm).
m, regular arrangement in a square lattice shape), and copper is vacuum-deposited thereon, and as shown in FIG.
After forming Å), the dots and the conductive layer formed on the dots are removed by washing with water, and dried to form a grid-like conductive layer, thereby obtaining an electromagnetic wave shielding light transmitting window material (FIG. 3).

<Measurement of Surface Resistivity (Ω / □)> The surface resistivity (Ω / □) of the plating layer in the electromagnetic wave shielding light transmitting window material was measured in the same manner as in the example. Table 1 shows the results.

<Measurement of Electric Field Shielding Effect (dB)> The electric field shielding effect (dB) of the electromagnetic wave shielding light transmitting window material was measured in the same manner as in the example. Table 1 shows the results.

<Measurement of Magnetic Field Shielding Effect (dB)> The magnetic field shielding effect (dB) of the electromagnetic wave shielding light transmitting window material was measured in the same manner as in the example. Table 1 shows the results.

<Measurement / Calculation of Opening Ratio (%)> The opening ratio (%) of the electromagnetic wave shielding light transmitting window material was measured and calculated in the same manner as in the example. Table 1 shows the results.

[0051]

[Table 1]

It can be seen that the electromagnetic wave shielding light transmitting window material obtained in the examples has a low surface resistivity, is excellent in both the electric field shielding effect and the magnetic field shielding effect, and is excellent in the electromagnetic wave shielding effect. In addition, since the aperture ratio is high, the conductive layer can be removed sufficiently efficiently, and the obtained electromagnetic wave shielding light-transmitting window material has excellent light transmittance.

[0053]

According to the present invention, it is possible to provide an electromagnetic wave shielding light transmitting window material which prevents the moire phenomenon and has excellent light transmitting properties and electromagnetic wave shielding properties, and an efficient manufacturing method thereof.

[Brief description of the drawings]

FIG. 1 is a schematic view for explaining a method for producing an electromagnetic wave shielding light transmitting window material of the present invention.

FIG. 2 is a schematic diagram for explaining a method of manufacturing the electromagnetic wave shielding light transmitting window material of the present invention.

FIG. 3 is a schematic view for explaining a method for producing an electromagnetic wave shielding light transmitting window material of the present invention.

FIG. 4 is a schematic diagram for explaining a method of manufacturing the electromagnetic wave shielding light transmitting window material of the present invention.

FIG. 5 is a schematic configuration diagram illustrating a state in which the electromagnetic wave shielding light transmitting window material of the present invention is viewed from the front.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Transparent substrate 2 Dot 4 Conductive layer 5 Plating layer 10 Electromagnetic wave shielding light transmission window material

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Masato Yoshikawa 3-16-15-102 Josuihoncho, Kodaira-shi, Tokyo F-term (reference) 5C058 AA11 DA08 5E321 AA23 AA46 BB22 BB23 BB25 BB44 CC16 GG05 GH01

Claims (12)

[Claims] At least a pattern is formed on a transparent substrate using a substance soluble in a solvent, a conductive layer insoluble in the solvent is formed, and the pattern is formed on the pattern by the solvent. A method for manufacturing an electromagnetic wave shielding light transmitting window material, comprising: providing a plating layer by plating after removing the conductive layer. 2. The method according to claim 1, wherein at least one of copper, nickel, chromium, zinc, tin, silver, and gold is used in the plating process. 3. The method according to claim 1, wherein the thickness of the plating layer is 0.1 to 10 μm. 4. The method for producing an electromagnetic wave shielding light transmitting window material according to claim 1, wherein the solvent is water. 5. The method for producing an electromagnetic wave shielding light transmitting window material according to claim 1, wherein the substance soluble in the solvent is a water-soluble resin. 6. The method according to claim 5, wherein the water-soluble resin is polyvinyl alcohol. 7. The method according to claim 1, wherein the pattern is a dot-shaped pattern, and the pattern is formed by printing. 8. The conductive layer has a thickness of 100 to 10000 °.
The method for producing an electromagnetic wave shielding light transmitting window material according to any one of claims 1 to 7, wherein 9. An electromagnetic wave shielding light transmitting window material obtained by the method for producing an electromagnetic wave shielding light transmitting window material according to any one of claims 1 to 8. 10. The electromagnetic wave shielding light transmitting window material according to claim 9, wherein the aperture ratio is 75% or more. 11. The surface resistivity of the plating layer is 3Ω.
The electromagnetic wave shielding light transmitting window material according to claim 9 or 10, which is not more than / □. 12. A transparent substrate having at least a conductive layer and a plating layer in this order, wherein the conductive layer and the plating layer are
An electromagnetic wave shielding light transmitting window material comprising a lattice layer having an aperture ratio of 75% or more.