JP2001332889A - Method for manufacturing electromagnetic wave shielding light transmitting window material - Google Patents

Method for manufacturing electromagnetic wave shielding light transmitting window material

Info

Publication number
JP2001332889A
JP2001332889A JP2000146895A JP2000146895A JP2001332889A JP 2001332889 A JP2001332889 A JP 2001332889A JP 2000146895 A JP2000146895 A JP 2000146895A JP 2000146895 A JP2000146895 A JP 2000146895A JP 2001332889 A JP2001332889 A JP 2001332889A
Authority
JP
Japan
Prior art keywords
dots
film
conductive
electromagnetic wave
wave shielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000146895A
Other languages
Japanese (ja)
Inventor
Hideshi Kotsubo
秀史 小坪
Yasuhiro Morimura
泰大 森村
Itsuo Tanuma
逸夫 田沼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bridgestone Corp
Original Assignee
Bridgestone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bridgestone Corp filed Critical Bridgestone Corp
Priority to JP2000146895A priority Critical patent/JP2001332889A/en
Priority to EP01922044A priority patent/EP1205901B1/en
Priority to AU48848/01A priority patent/AU4884801A/en
Priority to PCT/JP2001/003501 priority patent/WO2001088889A1/en
Priority to DE60142952T priority patent/DE60142952D1/en
Priority to US09/995,572 priority patent/US6506090B2/en
Publication of JP2001332889A publication Critical patent/JP2001332889A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To easily manufacture an electromagnetic wave shielding light transmitting window material having a mesh-like conductive pattern with less line width and high numerical aperture. SOLUTION: Firstly, as shown in (1) and (2), dots 2 are printed on a transparent film 1 using a material soluble in a solvent such as water. Then, as shown in (3), a conductive material layer 3 is formed so as to cover all exposed surfaces of the film 1 on the dot 2 as well as between dots 2. The film 1 is washed in a solvent such as water. Thus, as shown in (4), the soluble dot 2 dissolves and the conductive material on the dot 2 is also released from the film 1 and removed. A conductive pattern 4 comprising the conductive material formed in the region between the dots is formed on the film 1.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はPDP(プラズマデ
ィスプレーパネル)の前面フィルタや、病院などの電磁
波シールドを必要とする建築物の窓材料(例えば貼着用
フィルム)等として有用な電磁波シールド性光透過窓材
の製造方法に係り、特に、フィルム上に導電パターンを
形成してなる電磁波シールド性光透過窓材の製造方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electromagnetic wave shielding light transmission useful as a front filter of a plasma display panel (PDP) or a window material (for example, a sticking film) of a building requiring an electromagnetic wave shield such as a hospital. The present invention relates to a method for manufacturing a window material, and more particularly to a method for manufacturing an electromagnetic wave shielding light transmitting window material having a conductive pattern formed on a film.

【0002】[0002]

【従来の技術】近年、OA機器や通信機器等の普及にと
もない、これらの機器から発生する電磁波が問題視され
るようになっている。即ち、電磁波の人体への影響が懸
念され、また、電磁波による精密機器の誤作動等が問題
となっている。
2. Description of the Related Art In recent years, with the spread of office automation equipment and communication equipment, electromagnetic waves generated from these equipment have become a problem. That is, there is a concern that the electromagnetic waves may affect the human body, and malfunctions of precision equipment due to the electromagnetic waves have become a problem.

【0003】そこで、従来、OA機器のPDPの前面フ
ィルタとして、電磁波シールド性を有し、かつ光透過性
の窓材が開発され、実用に供されている。このような窓
材はまた、携帯電話等の電磁波から精密機器を保護する
ために、病院や研究室等の精密機器設置場所の窓材とし
ても利用されている。
Therefore, as a front filter of a PDP of an OA device, a window material having an electromagnetic wave shielding property and a light transmitting property has been conventionally developed and put to practical use. Such a window material is also used as a window material in a place where precision equipment is installed, such as a hospital or a laboratory, in order to protect precision equipment from electromagnetic waves such as mobile phones.

【0004】従来の電磁波シールド性光透過窓材は、主
に、金網のような導電性メッシュ材又は透明導電性フィ
ルムをアクリル板等の透明基板の間に介在させて一体化
した構成とされている。
[0004] The conventional electromagnetic wave shielding light transmitting window material has a structure in which a conductive mesh material such as a wire mesh or a transparent conductive film is interposed between transparent substrates such as an acrylic plate to be integrated. I have.

【0005】従来の電磁波シールド性光透過窓材に用い
られている導電性メッシュは、一般に線径10〜500
μmで5〜500メッシュ程度のものであり、開口率は
75%未満である。
The conductive mesh used for the conventional electromagnetic shielding light transmitting window material generally has a wire diameter of 10 to 500.
It is about 5 to 500 mesh in μm, and the aperture ratio is less than 75%.

【0006】従来用いられている導電性メッシュは、一
般に、メッシュを構成する導電性繊維の線径が太いもの
は目が粗く、線径が細くなると目が細かくなっている。
これは、線径の太い繊維であれば、目の粗いメッシュと
することは可能であるが、線径の細い繊維で目の粗いメ
ッシュを形成することは非常に困難であることによる。
[0006] In the conventional conductive mesh, generally, the conductive fiber constituting the mesh has a large wire diameter, the coarser the mesh, and the thinner the wire, the finer the mesh.
This is because it is possible to form a coarse mesh with fibers having a large wire diameter, but it is very difficult to form a coarse mesh with fibers having a small wire diameter.

【0007】このため、このような導電性メッシュを用
いた従来の電磁波シールド性光透過窓材では、光透過率
の良いものでも、高々70%程度であり、良好な光透過
性を得ることができないという欠点があった。
For this reason, in the conventional electromagnetic wave shielding light transmitting window material using such a conductive mesh, even a material having a good light transmittance is at most about 70%, and it is possible to obtain a good light transmittance. There was a disadvantage that it could not be done.

【0008】また、従来の導電性メッシュでは、電磁波
シールド性光透過窓材を取り付ける発光パネルの画素ピ
ッチとの関係で、モアレ(干渉縞)が発生し易いという
問題もあった。
Further, in the conventional conductive mesh, there is a problem that moire (interference fringes) is easily generated in relation to the pixel pitch of the light emitting panel on which the electromagnetic wave shielding light transmitting window material is mounted.

【0009】透明導電性フィルムを併用することで光透
過性と電磁波シールド性とを両立させることが考えられ
るが、透明導電性フィルムは、筐体との導通をとること
が容易ではないという不具合がある。
It is conceivable that both light transmittance and electromagnetic wave shielding properties can be achieved by using a transparent conductive film in combination. However, the transparent conductive film has a drawback that it is not easy to establish conduction with the housing. is there.

【0010】即ち、導電性メッシュであれば、上述の如
く、導電性メッシュの周縁部を透明基板周縁部からはみ
出させ、このはみ出し部分を折り曲げ、この折り曲げた
部分から筐体との導通を図ることができるが、透明導電
性フィルムでは、その周縁部を透明基板周縁部からはみ
出させて折り曲げると、この折り目部分でフィルムが裂
けてしまい、筐体との導通をとることができない。
That is, in the case of a conductive mesh, as described above, the periphery of the conductive mesh protrudes from the periphery of the transparent substrate, the protruding portion is bent, and conduction from the bent portion to the housing is achieved. However, in the case of a transparent conductive film, if the peripheral portion of the transparent conductive film protrudes from the peripheral portion of the transparent substrate and is bent, the film is torn at the fold portion and conduction with the housing cannot be achieved.

【0011】また、透明導電性フィルムの代りに、一方
の透明基板の接着面に透明導電性膜を直接成膜すること
も考えられるが、この場合には、透明導電性膜が他方の
透明基板で覆われてしまい、透明導電性膜から筐体への
導通を図ることができない。
It is also conceivable to form a transparent conductive film directly on the bonding surface of one transparent substrate instead of the transparent conductive film. In this case, the transparent conductive film is formed on the other transparent substrate. Therefore, conduction from the transparent conductive film to the housing cannot be achieved.

【0012】従って、透明導電性膜フィルムを用いる場
合には、例えば、透明基板に貫通孔を形成して透明導電
性フィルムとの導通路を設けるなどの設計変更が必要と
なり、電磁波シールド性光透過窓材の組み立てや筐体へ
の組み込み作業が複雑となる。
Therefore, when a transparent conductive film is used, it is necessary to make a design change such as forming a through hole in a transparent substrate to provide a conduction path with the transparent conductive film. The work of assembling the window material and assembling it into the housing becomes complicated.

【0013】このような問題点を解決し、モアレ現象を
防止すると共に、光透過性、電磁波シールド性、熱線
(近赤外線)カット性がいずれも極めて良好な電磁波シ
ールド性光透過窓材とするために、導電性インキを、線
幅200μm以下、開口率75%以上の格子状に透明板
の表面にパターン状に印刷してなるものが考えられてい
る。
In order to solve such problems and prevent the moire phenomenon, an electromagnetic wave shielding light transmitting window material having extremely excellent light transmittance, electromagnetic wave shielding property, and heat ray (near infrared ray) cutting property is provided. In addition, a method is proposed in which a conductive ink is printed in a grid pattern with a line width of 200 μm or less and an aperture ratio of 75% or more on the surface of a transparent plate in a pattern.

【0014】かかる電磁波シールド性光透過窓材にあっ
ては、パターン印刷により、所望のパターン形状の導電
層を形成することができることから、線幅や間隔、網目
形状の自由度は導電性メッシュに比べて格段に大きく、
線幅200μm以下、開口率75%以上という細線で開
口率の高い格子状の導電層であっても容易に形成可能で
ある。そして、このような細線で目の粗い導電層を形成
した導電性印刷膜であれば、良好な光透過性を得ること
ができると共に、モアレ現象を防止することができる。
In such an electromagnetic-shielding light-transmitting window material, a conductive layer having a desired pattern shape can be formed by pattern printing. It is much larger than
Even a grid-shaped conductive layer having a fine line with a line width of 200 μm or less and an aperture ratio of 75% or more and a high aperture ratio can be easily formed. In addition, a conductive print film having such a fine line and a coarse conductive layer formed thereon can obtain good light transmittance and prevent a moire phenomenon.

【0015】なお、開口率とはメッシュの線幅と1イン
チ幅に存在する線の数から計算で求めたものである。
The aperture ratio is calculated from the mesh line width and the number of lines existing in one inch width.

【0016】[0016]

【発明が解決しようとする課題】上記の導電性インクと
しては、バインダー(インクメジウム)に導電性微粒子
を分散させたものが用いられているが、この導電性微粒
子のインク中での分散状態を保つためにインクの粘性を
十分に高くしておく必要がある。このため、インク線幅
を著しく小さくすることはできず、開口率も著しく大き
くすることはできなかった。
As the above-mentioned conductive ink, one obtained by dispersing conductive fine particles in a binder (ink medium) is used. In order to maintain the ink, the viscosity of the ink needs to be sufficiently high. For this reason, the ink line width could not be significantly reduced, and the aperture ratio could not be significantly increased.

【0017】本発明は、線幅が十分に小さく、開口率も
著しく高いメッシュ状の導電層を有した電磁波シールド
性光透過窓材を製造する方法を提供することを目的とす
る。
An object of the present invention is to provide a method for producing an electromagnetic wave shielding light transmitting window material having a mesh-like conductive layer having a sufficiently small line width and an extremely high aperture ratio.

【0018】[0018]

【課題を解決するための手段】本発明の電磁波シールド
性光透過窓材の製造方法は、フィルム面に、溶剤に対し
て可溶な物質によってドットを形成し、該フィルム面に
該溶剤に対して不溶な導電材料よりなる導電材料層を形
成し、該フィルム面を該溶剤と接触させて該ドット及び
該ドット上の導電材料層を除去することを特徴とするも
のである。
According to the present invention, there is provided a method for producing an electromagnetic wave shielding light transmitting window material, wherein dots are formed on a film surface by using a substance soluble in a solvent, and a dot is formed on the film surface with respect to the solvent. A conductive material layer made of an insoluble conductive material, and contacting the film surface with the solvent to remove the dots and the conductive material layer on the dots.

【0019】かかる電磁波シールド性光透過窓材の製造
方法によると、溶剤に対して可溶性の材料には導電性微
粒子が分散されておらず、低粘性の材料によってドット
を印刷、形成することができる。このため、ドット間の
間隔を著しく小さくするように微細で精微な印刷を施す
ことができる。このドット同士の間の細い領域は、後に
導電性材料が残存してメッシュ状の導電層となる領域で
あるから、本発明によると、著しく細い導電性メッシュ
パターンを高精度にて形成することができる。この線幅
を小さくすることにより、メッシュの開口率を大きくと
ることができる。
According to the method of manufacturing the electromagnetic wave shielding light transmitting window material, the conductive fine particles are not dispersed in the material soluble in the solvent, and the dots can be printed and formed with a low-viscosity material. . For this reason, fine and minute printing can be performed so as to significantly reduce the interval between dots. Since the narrow region between the dots is a region where the conductive material later remains and becomes a mesh-shaped conductive layer, according to the present invention, a significantly thin conductive mesh pattern can be formed with high accuracy. it can. By reducing the line width, the aperture ratio of the mesh can be increased.

【0020】本発明方法によれば、例えば開口率75%
以上の導電性メッシュパターンを有した電磁波シールド
性光透過窓材を容易に製造することができる。
According to the method of the present invention, for example, an aperture ratio of 75%
An electromagnetic shielding light transmitting window material having the above conductive mesh pattern can be easily manufactured.

【0021】[0021]

【発明の実施の形態】以下、図面を参照して実施の形態
について説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0022】図1は本発明の一例を示す断面図であり、
まず,のように透明フィルム1上に水等の溶剤に対
して可溶な材料を用いてドット2を印刷する。次いで、
の通り、このフィルム1のドット2上及びドット2間
のフィルム露出面のすべてを覆うように導電材料層3を
形成する。次に、このフィルム1を水等の溶剤によって
洗浄する。この際、必要に応じ、超音波照射やブラシ、
スポンジ等で擦るなどの溶解促進手段を併用してもよ
い。
FIG. 1 is a sectional view showing an example of the present invention.
First, dots 2 are printed on a transparent film 1 using a material soluble in a solvent such as water as described above. Then
As described above, the conductive material layer 3 is formed so as to cover the entire exposed surface of the film 1 on the dots 2 and between the dots 2. Next, the film 1 is washed with a solvent such as water. At this time, if necessary, ultrasonic irradiation, brush,
A dissolution promoting means such as rubbing with a sponge or the like may be used in combination.

【0023】これにより、の通り、可溶性のドット2
が溶解し、このドット2上の導電材料もフィルム1から
剥れて除去される。そして、ドット同士の間の領域に形
成された導電材料よりなる導電性パターン4がフィルム
1上に残る。この導電性パターン4は、ドット1間の領
域を占めるものであるから、全体としてはメッシュ状と
なる。
As a result, as shown in FIG.
Is dissolved, and the conductive material on the dots 2 is also peeled off from the film 1 and removed. Then, the conductive pattern 4 made of the conductive material formed in the region between the dots remains on the film 1. Since the conductive pattern 4 occupies the area between the dots 1, it has a mesh shape as a whole.

【0024】従って、ドット2間の間隙を狭くしておく
ことにより、線幅の小さいメッシュ状の導電性パターン
4が形成される。また、各ドット2の面積を広くするこ
とにより、開口率の大きなメッシュ状の導電性パターン
4が形成される。ドット2を形成するための前記水等に
対して可溶な印刷材料は、微粒子を分散させる必要のな
いものであり、低粘性のもので足りる。この低粘性の印
刷材料によれば、微細なドットパターンとなるようにド
ットを印刷することができる。
Therefore, the mesh-shaped conductive pattern 4 having a small line width is formed by reducing the gap between the dots 2. Also, by increasing the area of each dot 2, a mesh-shaped conductive pattern 4 having a large aperture ratio is formed. The printing material soluble in water or the like for forming the dots 2 does not need to disperse the fine particles, and a low-viscosity material is sufficient. With this low-viscosity printing material, dots can be printed in a fine dot pattern.

【0025】なお、上記の工程の後、必要に応じ仕上
げ洗浄(リンス)し、乾燥することにより、電磁波シー
ルド性光透過窓材が得られる。
After the above-described steps, the substrate is subjected to finish washing (rinsing) if necessary, and dried to obtain an electromagnetic wave shielding light transmitting window material.

【0026】次に、上記の各材料の好適例について説明
する。
Next, preferred examples of each of the above materials will be described.

【0027】透明フィルム1としては、ポリエステル、
ポリエチレンテレフタレート(PET)、ポリブチレン
テレフタレート、ポリメチルメタクリレート(PMM
A)、アクリル板、ポリカーボネート(PC)、ポリス
チレン、トリアセテートフィルム、ポリビニルアルコー
ル、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリエチレ
ン、エチレン−酢酸ビニル共重合体、ポリビニルブチラ
ール、金属イオン架橋エチレン−メタクリル酸共重合
体、ポリウレタン、セロファン等、好ましくは、PE
T、PC、PMMAが挙げられる。
As the transparent film 1, polyester,
Polyethylene terephthalate (PET), polybutylene terephthalate, polymethyl methacrylate (PMM
A), acrylic plate, polycarbonate (PC), polystyrene, triacetate film, polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, ethylene-vinyl acetate copolymer, polyvinyl butyral, metal ion-crosslinked ethylene-methacrylic acid copolymer , Polyurethane, cellophane, etc., preferably PE
T, PC, and PMMA.

【0028】この透明フィルムの厚さは、電磁波シール
ド性光透過窓材の用途等によっても異なるが、通常の場
合1μm〜5mm程度とされる。
The thickness of the transparent film varies depending on the application of the electromagnetic wave shielding light transmitting window material and the like, but is usually about 1 μm to 5 mm.

【0029】フィルム1上に形成するドットは印刷によ
り形成されることが好ましい。印刷材料としては、ドッ
トを除去させる溶剤に対して可溶な材料の溶液が用いら
れる。このドットを除去させる溶剤としては、有機溶剤
であってもよいが、安価であると共に、環境への影響の
点からして水が好ましい。水は、通常の水のほか、酸、
アルカリ又は界面活性剤を含んだ水溶液であってもよ
い。この印刷材料には、印刷仕上り状況を確認し易くす
るために顔料や染料を混ぜてもよい。
The dots formed on the film 1 are preferably formed by printing. As a printing material, a solution of a material that is soluble in a solvent that removes dots is used. As a solvent for removing the dots, an organic solvent may be used, but water is preferable because it is inexpensive and has an adverse effect on the environment. Water is normal water, acid,
It may be an aqueous solution containing an alkali or a surfactant. The printing material may be mixed with a pigment or a dye in order to make it easier to confirm the printing condition.

【0030】溶剤をこのように水とする関係からして、
ドット形成材料としては水溶性の高分子材料が好ましく
は、具体的にはポリビニルアルコールなどが好適であ
る。
In view of the fact that the solvent is water,
As the dot forming material, a water-soluble polymer material is preferable, and specifically, polyvinyl alcohol and the like are suitable.

【0031】ドット2は、それらの間のフィルム露出領
域がメッシュ状となるように印刷される。好ましくは、
このフィルム露出領域の線幅が30μm以下となるよう
に印刷される。印刷手法としてはグラビア印刷、スクリ
ーン印刷、インクジェット印刷、静電印刷が好適である
が、細線化のためにはグラビア印刷が好適である。
The dots 2 are printed such that the film exposed area between them is meshed. Preferably,
Printing is performed so that the line width of the exposed film area is 30 μm or less. As a printing method, gravure printing, screen printing, inkjet printing, and electrostatic printing are preferable, but gravure printing is preferable for thinning.

【0032】ドットの性状は、円、楕円、角形など伝意
であるが、角形とくに正方形であることが好ましい。
The nature of the dot is a mystery such as a circle, an ellipse, and a square, but is preferably a square, especially a square.

【0033】ドットの印刷厚みは、特に限定されるもの
ではないが、通常は0.1〜5μm程度とされる。
The printing thickness of the dots is not particularly limited, but is usually about 0.1 to 5 μm.

【0034】ドットの印刷後、好ましくは乾燥し、次い
で導電材料層3を形成する。この材料としては、アルミ
ニウム、ニッケル、インジウム、クロム、金、バナジウ
ム、すず、カドミウム、銀、プラチナ、銅、チタン、コ
バルト、鉛等の金属又は合金或いはITO等の導電性酸
化物が好適である。
After printing the dots, they are preferably dried, and then the conductive material layer 3 is formed. As this material, a metal or alloy such as aluminum, nickel, indium, chromium, gold, vanadium, tin, cadmium, silver, platinum, copper, titanium, cobalt, lead or a conductive oxide such as ITO is preferable.

【0035】この導電材料層3の厚さは、薄過ぎると電
磁波シールド性能が不足するので好ましくなく、厚過ぎ
ると得られる電磁波シールド性光透過窓材の厚さに影響
を及ぼすと共に、視野角を狭くしてしまうことから、
0.5〜100μm程度とするのが好ましい。
If the thickness of the conductive material layer 3 is too small, the electromagnetic wave shielding performance will be insufficient, which is not preferable. If the thickness is too large, the thickness of the obtained electromagnetic wave shielding light transmitting window material is affected, and the viewing angle is reduced. Because it narrows,
The thickness is preferably about 0.5 to 100 μm.

【0036】導電材料層3の形成手法としては、スパッ
タリング、イオンプレーティング、真空蒸着、化学蒸着
などの気相メッキ法や、液相メッキ(電解メッキ、無電
解メッキ等)、印刷、塗布などが例示されるが、広義の
気相メッキ(スパッタリング、イオンプレーティング、
真空蒸着、化学蒸着)又は液相メッキが好適である。
The conductive material layer 3 may be formed by a vapor phase plating method such as sputtering, ion plating, vacuum deposition, or chemical vapor deposition, liquid phase plating (electrolytic plating, electroless plating, etc.), printing, coating, and the like. Examples include vapor phase plating in a broad sense (sputtering, ion plating,
Vacuum vapor deposition, chemical vapor deposition) or liquid phase plating are preferred.

【0037】この導電材料層3の形成後、前記の通り、
溶剤好ましくは水を用いてドット2を除去し、必要に応
じ乾燥して電磁波シールド性光透過窓材とされる。
After the formation of the conductive material layer 3, as described above,
The dots 2 are removed using a solvent, preferably water, and dried as necessary to obtain an electromagnetic wave shielding light transmitting window material.

【0038】この電磁波シールド性光透過窓材は、1枚
物のフィルムよりなるものであってもよく、ロールから
巻き出された連続ウェブ状のフィルムであってもよい。
The electromagnetic wave shielding light transmitting window material may be formed of a single film or a continuous web film unwound from a roll.

【0039】[0039]

【実施例】以下に実施例を挙げて、本発明をより具体的
に説明する。
The present invention will be described more specifically with reference to the following examples.

【0040】実施例1 厚さ500μmのポリエチレンフィルムの上に、ポリビ
ニルアルコールの20%水溶液をドット状に印刷した。
ドット1個の大きさは1辺が234μmの正方形状であ
り、ドット同士間の間隔は20μmであり、ドット配列
は正方格子状である。印刷厚さは、乾燥後で約5μmで
ある。
Example 1 A 20% aqueous solution of polyvinyl alcohol was printed in dot form on a polyethylene film having a thickness of 500 μm.
Each dot has a square shape with one side of 234 μm, the interval between the dots is 20 μm, and the dot arrangement is a square lattice. The printing thickness is about 5 μm after drying.

【0041】その上に、アルミニウムを平均膜厚10μ
mとなるように真空蒸着した。次いで、常温の水に浸漬
し、スポンジで擦ることによりドット部分を溶解除去
し、次いで水でリンスした後、乾燥して電磁波シールド
性光透過窓材とした。
On top of this, aluminum is coated with an average film thickness of 10 μm.
m was vacuum deposited. Next, it was immersed in water at room temperature and rubbed with a sponge to dissolve and remove the dot portion, then rinsed with water and dried to obtain an electromagnetic wave shielding light transmitting window material.

【0042】このフィルム表面の導電層は、正確にドッ
トのネガパターンに対応した正方格子状のものであり、
線幅は20μm、開口率は77%であった。また、導電
層(アルミニウム層)の平均厚さは10μmであった。
The conductive layer on the surface of the film is a square lattice that exactly corresponds to the negative pattern of dots.
The line width was 20 μm and the aperture ratio was 77%. The average thickness of the conductive layer (aluminum layer) was 10 μm.

【0043】[0043]

【発明の効果】以上の通り、本発明によると、線幅が小
さく開口率の高いメッシュ状の導電性パターンを有した
電磁波シールド性光透過窓材を容易に製造することがで
きる。
As described above, according to the present invention, an electromagnetic wave shielding light transmitting window material having a mesh-shaped conductive pattern having a small line width and a high aperture ratio can be easily manufactured.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施の形態に係る電磁波シールド性光透過窓材
の製造方法を示す模式的な断面図である。
FIG. 1 is a schematic cross-sectional view illustrating a method for manufacturing an electromagnetic wave shielding light transmitting window material according to an embodiment.

【符号の説明】[Explanation of symbols]

1 フィルム 2 ドット 3 導電材料層 4 導電性パターン Reference Signs List 1 film 2 dot 3 conductive material layer 4 conductive pattern

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 フィルム面に、溶剤に対して可溶な物質
によってドットを形成し、 該フィルム面に該溶剤に対して不溶な導電材料よりなる
導電材料層を形成し、 該フィルム面を該溶剤と接触させて該ドット及び該ドッ
ト上の導電材料層を除去することを特徴とする電磁波シ
ールド性光透過窓材の製造方法。
1. A dot is formed on a film surface with a substance soluble in a solvent, a conductive material layer made of a conductive material insoluble in the solvent is formed on the film surface, and the film surface is A method for producing an electromagnetic wave shielding light transmitting window material, comprising removing the dots and a conductive material layer on the dots by contacting with a solvent.
【請求項2】 請求項1において、該溶剤は水であるこ
とを特徴とする電磁波シールド性光透過窓材の製造方
法。
2. The method according to claim 1, wherein the solvent is water.
【請求項3】 請求項2において、該溶剤に対して可溶
な物質は水溶性高分子材料であることを特徴とする電磁
波シールド性光透過窓材の製造方法。
3. The method according to claim 2, wherein the substance soluble in the solvent is a water-soluble polymer material.
【請求項4】 請求項3において、該水溶性高分子材料
はポリビニルアルコールであることを特徴とする電磁波
シールド性光透過窓材の製造方法。
4. The method according to claim 3, wherein the water-soluble polymer material is polyvinyl alcohol.
【請求項5】 請求項1ないし4のいずれか1項におい
て、該ドットを印刷により形成することを特徴とする電
磁波シールド性光透過窓材の製造方法。
5. The method according to claim 1, wherein the dots are formed by printing. 5. The method according to claim 1, wherein the dots are formed by printing.
【請求項6】 請求項1ないし5のいずれか1項におい
て、該導電材料層を気相メッキ又は液相メッキにより形
成することを特徴とする電磁波シールド性光透過窓材の
製造方法。
6. The method according to claim 1, wherein the conductive material layer is formed by vapor phase plating or liquid phase plating.
【請求項7】 請求項1ないし5のいずれか1項におい
て、該導電材料層を塗布により形成することを特徴とす
る電磁波シールド性光透過窓材の製造方法。
7. The method according to claim 1, wherein the conductive material layer is formed by coating.
【請求項8】 請求項1ないし7のいずれか1項におい
て、該ドット及び該ドット上の導電材料層を除去するこ
とにより、開口率75%以上の格子状の導電材料パター
ンを形成することを特徴とする電磁波シールド性光透過
窓材の製造方法。
8. The method according to claim 1, wherein the dots and the conductive material layer on the dots are removed to form a grid-like conductive material pattern having an aperture ratio of 75% or more. A method for producing an electromagnetic wave shielding light transmitting window material.
JP2000146895A 2000-05-18 2000-05-18 Method for manufacturing electromagnetic wave shielding light transmitting window material Pending JP2001332889A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2000146895A JP2001332889A (en) 2000-05-18 2000-05-18 Method for manufacturing electromagnetic wave shielding light transmitting window material
EP01922044A EP1205901B1 (en) 2000-05-18 2001-04-24 Electromagnetic shielding and light transmitting plate manufacturing method
AU48848/01A AU4884801A (en) 2000-05-18 2001-04-24 Display panel, and electromagnetic shielding light transmitting window material manufacturing method
PCT/JP2001/003501 WO2001088889A1 (en) 2000-05-18 2001-04-24 Display panel, and electromagnetic shielding light transmitting window material manufacturing method
DE60142952T DE60142952D1 (en) 2000-05-18 2001-04-24 METHOD FOR PRODUCING AN ELECTROMAGNETIC SHIELDING AND TRANSLUCENT PLATE
US09/995,572 US6506090B2 (en) 2000-05-18 2001-11-29 Display panel and method of manufacturing electromagnetic-wave shielding and light transmitting plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000146895A JP2001332889A (en) 2000-05-18 2000-05-18 Method for manufacturing electromagnetic wave shielding light transmitting window material

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005002818A Division JP2005210113A (en) 2005-01-07 2005-01-07 Method for manufacturing light transmission window material shielding electromagnetic wave

Publications (1)

Publication Number Publication Date
JP2001332889A true JP2001332889A (en) 2001-11-30

Family

ID=18653167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000146895A Pending JP2001332889A (en) 2000-05-18 2000-05-18 Method for manufacturing electromagnetic wave shielding light transmitting window material

Country Status (1)

Country Link
JP (1) JP2001332889A (en)

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JP2004158861A (en) * 2002-11-07 2004-06-03 Samsung Electronics Co Ltd Plasma display device
WO2006112535A1 (en) * 2005-04-18 2006-10-26 Seiren Co., Ltd. Transparent electrically conductive film and process for producing the same
JP2007042887A (en) * 2005-08-03 2007-02-15 Bridgestone Corp Light-transmitting electromagnetic-wave shielding window material and its manufacturing method
JP2007242921A (en) * 2006-03-09 2007-09-20 Bridgestone Corp Light transmissive electromagnetic wave shielding material, manufacturing method thereof, and filter for display
WO2008029709A1 (en) 2006-09-06 2008-03-13 Toray Industries, Inc. Display filter and its manufacturing method, and display manufacturing method
JP2008068519A (en) * 2006-09-14 2008-03-27 Oike Ind Co Ltd Laminate, its manufacturing method and laminated glass or glass sheet using it
WO2008053989A1 (en) 2006-11-02 2008-05-08 Bridgestone Corporation Optical filter for display, display comprising the same, and plasma display panel
JP2009302432A (en) * 2008-06-17 2009-12-24 Bridgestone Corp Method of manufacturing conductive member

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002264461A (en) * 2001-03-09 2002-09-18 Dainippon Ink & Chem Inc Method for forming laminating pattern
JP2004158861A (en) * 2002-11-07 2004-06-03 Samsung Electronics Co Ltd Plasma display device
WO2006112535A1 (en) * 2005-04-18 2006-10-26 Seiren Co., Ltd. Transparent electrically conductive film and process for producing the same
US7883837B2 (en) 2005-04-18 2011-02-08 Seiren Co., Ltd. Transparent electrically conductive film and process for producing the same
JP2007042887A (en) * 2005-08-03 2007-02-15 Bridgestone Corp Light-transmitting electromagnetic-wave shielding window material and its manufacturing method
JP2007242921A (en) * 2006-03-09 2007-09-20 Bridgestone Corp Light transmissive electromagnetic wave shielding material, manufacturing method thereof, and filter for display
WO2008029709A1 (en) 2006-09-06 2008-03-13 Toray Industries, Inc. Display filter and its manufacturing method, and display manufacturing method
JP2008068519A (en) * 2006-09-14 2008-03-27 Oike Ind Co Ltd Laminate, its manufacturing method and laminated glass or glass sheet using it
WO2008053989A1 (en) 2006-11-02 2008-05-08 Bridgestone Corporation Optical filter for display, display comprising the same, and plasma display panel
US7960029B2 (en) 2006-11-02 2011-06-14 Bridgestone Corporation Optical filter for display, and display and plasma display panel provided with the optical filter
JP2009302432A (en) * 2008-06-17 2009-12-24 Bridgestone Corp Method of manufacturing conductive member

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