JPS6442094A - Electron beam graphic display type magnetic bubble memory element - Google Patents

Electron beam graphic display type magnetic bubble memory element

Info

Publication number
JPS6442094A
JPS6442094A JP62198040A JP19804087A JPS6442094A JP S6442094 A JPS6442094 A JP S6442094A JP 62198040 A JP62198040 A JP 62198040A JP 19804087 A JP19804087 A JP 19804087A JP S6442094 A JPS6442094 A JP S6442094A
Authority
JP
Japan
Prior art keywords
magnetic bubble
electron beam
irradiated area
forming
memory element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62198040A
Other languages
Japanese (ja)
Inventor
Akira Imura
Makoto Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62198040A priority Critical patent/JPS6442094A/en
Publication of JPS6442094A publication Critical patent/JPS6442094A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate the needs for forming a mask pattern for forming a transfer line and to simplify the process of producing an element by partially radiating an electron beam on a magnetic bubble film. CONSTITUTION:The electron beam 11 is restricted and scanned, and an irradiated area and non-irradiated area 18 are directly drawn in the magnetic bubble film 2. Namely, the area which is irradiated the electron beam operates as an in-plane magnetized layer driving the magnetic bubble since thermal stress occurs and a lattice is warped. With scanning the electron beam, the irradiated area 17 and the non-irradiated area 18 are directly drawn and formed, and the boundary part of the pattern which is formed here is operated as the transfer line of the magnetic bubble. Thus, the mask pattern at the time of forming the driving layer of the magnetic bubble is eliminated and a restriction for high density from a pattern processing surface can be removed.
JP62198040A 1987-08-10 1987-08-10 Electron beam graphic display type magnetic bubble memory element Pending JPS6442094A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62198040A JPS6442094A (en) 1987-08-10 1987-08-10 Electron beam graphic display type magnetic bubble memory element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62198040A JPS6442094A (en) 1987-08-10 1987-08-10 Electron beam graphic display type magnetic bubble memory element

Publications (1)

Publication Number Publication Date
JPS6442094A true JPS6442094A (en) 1989-02-14

Family

ID=16384536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62198040A Pending JPS6442094A (en) 1987-08-10 1987-08-10 Electron beam graphic display type magnetic bubble memory element

Country Status (1)

Country Link
JP (1) JPS6442094A (en)

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