JPS6428987A - Semiconductor laser - Google Patents

Semiconductor laser

Info

Publication number
JPS6428987A
JPS6428987A JP18592987A JP18592987A JPS6428987A JP S6428987 A JPS6428987 A JP S6428987A JP 18592987 A JP18592987 A JP 18592987A JP 18592987 A JP18592987 A JP 18592987A JP S6428987 A JPS6428987 A JP S6428987A
Authority
JP
Japan
Prior art keywords
layer
type
thickness
clad layer
clad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18592987A
Other languages
Japanese (ja)
Inventor
Masaaki Nidou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP18592987A priority Critical patent/JPS6428987A/en
Publication of JPS6428987A publication Critical patent/JPS6428987A/en
Pending legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To obtain a semiconductor laser which is not damaged in a section even by a higher optical output than a conventional one by providing clad layers in contact with an active layer so that the refractive index of one active layer is larger than that of the other, and making a larger amount of laser radiation ooze out to the clad layer having the larger refractive index as compared with the other clad layer having the smaller refractive index. CONSTITUTION:An N-type Al0.55Ga0.45As first clad layer 2 having 2mum or thickness, an Al0.15Ga0.85As active layer 3 having 300 Angstroms, a P-type Al0.45Ga0.55 second clad layer 4 having 0.6mum of thickness, and an N-type GaAs current blocking layer 5 are sequentially laminated on an N-type GaAs substrate 1, and a groove 6 which penetrates the layer 5 is formed. The width in the bottom of the groove is 3-5mum. Thereafter, a P-type Al0.45Ga0.55As third clad layer 7 having 0.4mum of thickness, a P-type Al0.5Ga0.5As fourth clad layer 8 having 1mum of thickness, and a P-type GaAs layer 9 are sequentially formed, and a P-type electrode 10, and an N-type electrode 11 are eventually formed to complete a semiconductor laser.
JP18592987A 1987-07-24 1987-07-24 Semiconductor laser Pending JPS6428987A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18592987A JPS6428987A (en) 1987-07-24 1987-07-24 Semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18592987A JPS6428987A (en) 1987-07-24 1987-07-24 Semiconductor laser

Publications (1)

Publication Number Publication Date
JPS6428987A true JPS6428987A (en) 1989-01-31

Family

ID=16179346

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18592987A Pending JPS6428987A (en) 1987-07-24 1987-07-24 Semiconductor laser

Country Status (1)

Country Link
JP (1) JPS6428987A (en)

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