JPS6428644A - Production of photomask blank - Google Patents
Production of photomask blankInfo
- Publication number
- JPS6428644A JPS6428644A JP18411987A JP18411987A JPS6428644A JP S6428644 A JPS6428644 A JP S6428644A JP 18411987 A JP18411987 A JP 18411987A JP 18411987 A JP18411987 A JP 18411987A JP S6428644 A JPS6428644 A JP S6428644A
- Authority
- JP
- Japan
- Prior art keywords
- light shielding
- blank
- shielding film
- film
- titled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To improve the mechanical durability of a light shielding film, and to reduce the refractive index of the titled blank by forming the light shielding film composed of a chromium layer on a glass substrate by a vacuum depositing method, etc., followed by subjecting the shading film to plasma treatment. CONSTITUTION:The light shielding film composed of the chromium layer or a chromium compd. is formed on the glass substrate by the vacuum depositing or a sputtering method. Next, the substrate 12 mounted with a metallic chrom layer thereon is disposed on a table 22 of a plasma surface treating apparatus 20. And, said plate 12 is subjected to the plasma treatment by a high frequency discharge generated between an upper electrode 24 and a lower electrode 23 in an atmosphere of oxygen and nitrogen gas, etc., to form an oxide film or a nitride film. Subsequently, the resist film is formed to obtain the titled blank. Accordingly, as the light shielding film is treated with the plasma, the mechanical durability of the light shielding film is improved, and the refractive index of the titled blank is reduced, and the etching aptitude of said blank can be improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18411987A JPH0690502B2 (en) | 1987-07-23 | 1987-07-23 | Photomask blank manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18411987A JPH0690502B2 (en) | 1987-07-23 | 1987-07-23 | Photomask blank manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6428644A true JPS6428644A (en) | 1989-01-31 |
JPH0690502B2 JPH0690502B2 (en) | 1994-11-14 |
Family
ID=16147709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18411987A Expired - Lifetime JPH0690502B2 (en) | 1987-07-23 | 1987-07-23 | Photomask blank manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0690502B2 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5054674A (en) * | 1973-09-17 | 1975-05-14 | ||
JPS5140874A (en) * | 1974-10-04 | 1976-04-06 | Toppan Printing Co Ltd | |
JPS5876831A (en) * | 1981-11-02 | 1983-05-10 | Konishiroku Photo Ind Co Ltd | Metallic image forming material |
-
1987
- 1987-07-23 JP JP18411987A patent/JPH0690502B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5054674A (en) * | 1973-09-17 | 1975-05-14 | ||
JPS5140874A (en) * | 1974-10-04 | 1976-04-06 | Toppan Printing Co Ltd | |
JPS5876831A (en) * | 1981-11-02 | 1983-05-10 | Konishiroku Photo Ind Co Ltd | Metallic image forming material |
Also Published As
Publication number | Publication date |
---|---|
JPH0690502B2 (en) | 1994-11-14 |
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