JPS642357A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS642357A JPS642357A JP62158015A JP15801587A JPS642357A JP S642357 A JPS642357 A JP S642357A JP 62158015 A JP62158015 A JP 62158015A JP 15801587 A JP15801587 A JP 15801587A JP S642357 A JPS642357 A JP S642357A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- layer
- metallic
- insulating film
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62158015A JPS642357A (en) | 1987-06-25 | 1987-06-25 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62158015A JPS642357A (en) | 1987-06-25 | 1987-06-25 | Manufacture of semiconductor device |
Publications (3)
Publication Number | Publication Date |
---|---|
JPH012357A JPH012357A (ja) | 1989-01-06 |
JPS642357A true JPS642357A (en) | 1989-01-06 |
JPH0557744B2 JPH0557744B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-08-24 |
Family
ID=15662408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62158015A Granted JPS642357A (en) | 1987-06-25 | 1987-06-25 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS642357A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7368380B2 (en) | 2003-06-09 | 2008-05-06 | Fuji Electric Device Technology Co., Ltd. | Method of manufacturing semiconductor device |
JP2011091424A (ja) * | 2010-12-17 | 2011-05-06 | Mitsubishi Electric Corp | 半導体装置 |
US10426306B2 (en) | 2016-01-22 | 2019-10-01 | Dyson Technology Limited | Brushbar, cleaner head and method of manufacture of a brushbar |
CN111081787A (zh) * | 2019-11-20 | 2020-04-28 | 广微集成技术(深圳)有限公司 | 晶圆制备方法 |
-
1987
- 1987-06-25 JP JP62158015A patent/JPS642357A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7368380B2 (en) | 2003-06-09 | 2008-05-06 | Fuji Electric Device Technology Co., Ltd. | Method of manufacturing semiconductor device |
JP2011091424A (ja) * | 2010-12-17 | 2011-05-06 | Mitsubishi Electric Corp | 半導体装置 |
US10426306B2 (en) | 2016-01-22 | 2019-10-01 | Dyson Technology Limited | Brushbar, cleaner head and method of manufacture of a brushbar |
CN111081787A (zh) * | 2019-11-20 | 2020-04-28 | 广微集成技术(深圳)有限公司 | 晶圆制备方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0557744B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-08-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100257429B1 (ko) | 집적 회로 장치 및 그의 패시베이션 방법 | |
US5091331A (en) | Ultra-thin circuit fabrication by controlled wafer debonding | |
JPS63155671A (ja) | 半導体装置の製造方法 | |
JPS5599722A (en) | Preparation of semiconductor device | |
JPS642357A (en) | Manufacture of semiconductor device | |
JPS5516464A (en) | Method of forming wafer for semiconductor device | |
JPH027175B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JPH02260441A (ja) | 半導体素子 | |
KR100444012B1 (ko) | 반도체칩의가드링(guard-ring) | |
JPS644662B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
JPH03205846A (ja) | 半導体装置の製造方法 | |
JPS5828863A (ja) | 集積回路装置 | |
JPH0223955B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
KR100366725B1 (ko) | 웨이퍼 표면에 반도체 소자의 보호막 패턴을 제조하는 방법 | |
JPH02153527A (ja) | 半導体装置の製造方法 | |
KR100312477B1 (ko) | 응용주문형집적회로소자의베이스어레이제조방법 | |
EP0718896A2 (en) | Photoelectric conversion semiconductor device | |
JPH0582511A (ja) | 半導体素子およびその製造方法 | |
JPS62237730A (ja) | 半導体装置の制造方法 | |
JPH05136198A (ja) | 半導体装置 | |
KR960002742A (ko) | 반도체소자의 제조방법 | |
JPH0541450A (ja) | 半導体ウエハ | |
JPS577948A (en) | Semiconductor device and its manufacture | |
JPS59114824A (ja) | 半導体装置の平坦化方法 | |
JPH0562983A (ja) | 半導体装置の製造方法 |