JPS6420621A - Plasma etching apparatus - Google Patents

Plasma etching apparatus

Info

Publication number
JPS6420621A
JPS6420621A JP17583287A JP17583287A JPS6420621A JP S6420621 A JPS6420621 A JP S6420621A JP 17583287 A JP17583287 A JP 17583287A JP 17583287 A JP17583287 A JP 17583287A JP S6420621 A JPS6420621 A JP S6420621A
Authority
JP
Japan
Prior art keywords
microwave
wafer
mirror field
plasma etching
perpendicularly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17583287A
Other languages
English (en)
Inventor
Naoyoshi Fujiwara
Kotaro Hamashima
Masanobu Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP17583287A priority Critical patent/JPS6420621A/ja
Publication of JPS6420621A publication Critical patent/JPS6420621A/ja
Pending legal-status Critical Current

Links

JP17583287A 1987-07-16 1987-07-16 Plasma etching apparatus Pending JPS6420621A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17583287A JPS6420621A (en) 1987-07-16 1987-07-16 Plasma etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17583287A JPS6420621A (en) 1987-07-16 1987-07-16 Plasma etching apparatus

Publications (1)

Publication Number Publication Date
JPS6420621A true JPS6420621A (en) 1989-01-24

Family

ID=16002996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17583287A Pending JPS6420621A (en) 1987-07-16 1987-07-16 Plasma etching apparatus

Country Status (1)

Country Link
JP (1) JPS6420621A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5133825A (en) * 1987-04-08 1992-07-28 Hi Tachi, Ltd. Plasma generating apparatus
JPH06310464A (ja) * 1993-04-27 1994-11-04 Nec Corp 中性粒子ビームエッチング装置
JP7105521B1 (ja) * 2021-07-05 2022-07-25 マイクロ波化学株式会社 導波管装置、マイクロ波照射装置、及びマイクロ波の伝送方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5133825A (en) * 1987-04-08 1992-07-28 Hi Tachi, Ltd. Plasma generating apparatus
JPH06310464A (ja) * 1993-04-27 1994-11-04 Nec Corp 中性粒子ビームエッチング装置
JP7105521B1 (ja) * 2021-07-05 2022-07-25 マイクロ波化学株式会社 導波管装置、マイクロ波照射装置、及びマイクロ波の伝送方法

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