JPS641722B2 - - Google Patents

Info

Publication number
JPS641722B2
JPS641722B2 JP16626782A JP16626782A JPS641722B2 JP S641722 B2 JPS641722 B2 JP S641722B2 JP 16626782 A JP16626782 A JP 16626782A JP 16626782 A JP16626782 A JP 16626782A JP S641722 B2 JPS641722 B2 JP S641722B2
Authority
JP
Japan
Prior art keywords
door
cover
ray tube
shutter
shutter block
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16626782A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5967409A (ja
Inventor
Minoru Handa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP16626782A priority Critical patent/JPS5967409A/ja
Publication of JPS5967409A publication Critical patent/JPS5967409A/ja
Publication of JPS641722B2 publication Critical patent/JPS641722B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • GPHYSICS
    • G12INSTRUMENT DETAILS
    • G12BCONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G12B17/00Screening
    • G12B17/02Screening from electric or magnetic fields, e.g. radio waves

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
JP16626782A 1982-09-24 1982-09-24 螢光x線膜厚計 Granted JPS5967409A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16626782A JPS5967409A (ja) 1982-09-24 1982-09-24 螢光x線膜厚計

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16626782A JPS5967409A (ja) 1982-09-24 1982-09-24 螢光x線膜厚計

Publications (2)

Publication Number Publication Date
JPS5967409A JPS5967409A (ja) 1984-04-17
JPS641722B2 true JPS641722B2 (enrdf_load_stackoverflow) 1989-01-12

Family

ID=15828210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16626782A Granted JPS5967409A (ja) 1982-09-24 1982-09-24 螢光x線膜厚計

Country Status (1)

Country Link
JP (1) JPS5967409A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4933702B2 (ja) * 2000-04-06 2012-05-16 エスアイアイ・ナノテクノロジー株式会社 可搬型蛍光x線分析計
CN1965228B (zh) 2004-04-28 2010-12-08 松下电器产业株式会社 荧光x射线分析方法及装置
JP5509604B2 (ja) * 2009-02-02 2014-06-04 株式会社島津製作所 X線分析装置

Also Published As

Publication number Publication date
JPS5967409A (ja) 1984-04-17

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