JPS6390534A - アルカリ可溶性ラダ−シリコ−ン重合体 - Google Patents

アルカリ可溶性ラダ−シリコ−ン重合体

Info

Publication number
JPS6390534A
JPS6390534A JP23612986A JP23612986A JPS6390534A JP S6390534 A JPS6390534 A JP S6390534A JP 23612986 A JP23612986 A JP 23612986A JP 23612986 A JP23612986 A JP 23612986A JP S6390534 A JPS6390534 A JP S6390534A
Authority
JP
Japan
Prior art keywords
polymer
alkali
group
soluble
silicone polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23612986A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0575005B2 (enExample
Inventor
Hisashi Sugiyama
寿 杉山
Kazuo Nate
和男 名手
Takashi Inoue
隆史 井上
Akiko Mizushima
明子 水島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP23612986A priority Critical patent/JPS6390534A/ja
Publication of JPS6390534A publication Critical patent/JPS6390534A/ja
Publication of JPH0575005B2 publication Critical patent/JPH0575005B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
JP23612986A 1986-10-06 1986-10-06 アルカリ可溶性ラダ−シリコ−ン重合体 Granted JPS6390534A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23612986A JPS6390534A (ja) 1986-10-06 1986-10-06 アルカリ可溶性ラダ−シリコ−ン重合体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23612986A JPS6390534A (ja) 1986-10-06 1986-10-06 アルカリ可溶性ラダ−シリコ−ン重合体

Publications (2)

Publication Number Publication Date
JPS6390534A true JPS6390534A (ja) 1988-04-21
JPH0575005B2 JPH0575005B2 (enExample) 1993-10-19

Family

ID=16996185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23612986A Granted JPS6390534A (ja) 1986-10-06 1986-10-06 アルカリ可溶性ラダ−シリコ−ン重合体

Country Status (1)

Country Link
JP (1) JPS6390534A (enExample)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63101427A (ja) * 1986-10-17 1988-05-06 Hitachi Ltd アルカリ可溶性ラダ−シリコ−ン
JPS63132942A (ja) * 1986-11-25 1988-06-04 Hitachi Ltd アルカリ可溶性ポリオルガノシルセスキオキサン重合体
JPS63239440A (ja) * 1986-11-25 1988-10-05 Nippon Telegr & Teleph Corp <Ntt> エネルギ線感応性樹脂組成物
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
JPH04130324A (ja) * 1990-09-21 1992-05-01 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物
US6387590B1 (en) * 1999-09-28 2002-05-14 Fuji Photo Film Co., Ltd. Positive photoresist composition
WO2004051376A1 (ja) * 2002-12-02 2004-06-17 Tokyo Ohka Kogyo Co., Ltd. 反射防止膜形成用組成物
WO2004055598A1 (ja) * 2002-12-02 2004-07-01 Tokyo Ohka Kogyo Co., Ltd. 化学増幅型シリコーン系ポジ型ホトレジスト組成物
WO2004111734A1 (ja) * 2003-06-11 2004-12-23 Tokyo Ohka Kogyo Co., Ltd. ポジ型レジスト組成物、レジスト積層体、およびレジストパターン形成方法
JP2008266576A (ja) * 2007-03-29 2008-11-06 Air Water Inc ポリシロキサン化合物、その製造方法、及びその用途
US8496967B2 (en) 2006-11-14 2013-07-30 Ariad Pharmaceuticals, Inc. Oral formulations
US9024014B2 (en) 2002-02-01 2015-05-05 Ariad Pharmaceuticals, Inc. Phosphorus-containing compounds and uses thereof
WO2016111112A1 (ja) * 2015-01-05 2016-07-14 東レ・ファインケミカル株式会社 シリコーン共重合体およびその製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102395936B1 (ko) * 2016-06-16 2022-05-11 다우 실리콘즈 코포레이션 규소-풍부 실세스퀴옥산 수지

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63101427A (ja) * 1986-10-17 1988-05-06 Hitachi Ltd アルカリ可溶性ラダ−シリコ−ン
JPS63132942A (ja) * 1986-11-25 1988-06-04 Hitachi Ltd アルカリ可溶性ポリオルガノシルセスキオキサン重合体
JPS63239440A (ja) * 1986-11-25 1988-10-05 Nippon Telegr & Teleph Corp <Ntt> エネルギ線感応性樹脂組成物
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
JPH04130324A (ja) * 1990-09-21 1992-05-01 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物
US6479213B2 (en) 1999-09-28 2002-11-12 Fuji Photo Film Co., Ltd. Positive photoresist composition
US6387590B1 (en) * 1999-09-28 2002-05-14 Fuji Photo Film Co., Ltd. Positive photoresist composition
US9024014B2 (en) 2002-02-01 2015-05-05 Ariad Pharmaceuticals, Inc. Phosphorus-containing compounds and uses thereof
WO2004051376A1 (ja) * 2002-12-02 2004-06-17 Tokyo Ohka Kogyo Co., Ltd. 反射防止膜形成用組成物
WO2004055598A1 (ja) * 2002-12-02 2004-07-01 Tokyo Ohka Kogyo Co., Ltd. 化学増幅型シリコーン系ポジ型ホトレジスト組成物
WO2004111734A1 (ja) * 2003-06-11 2004-12-23 Tokyo Ohka Kogyo Co., Ltd. ポジ型レジスト組成物、レジスト積層体、およびレジストパターン形成方法
US8496967B2 (en) 2006-11-14 2013-07-30 Ariad Pharmaceuticals, Inc. Oral formulations
JP2008266576A (ja) * 2007-03-29 2008-11-06 Air Water Inc ポリシロキサン化合物、その製造方法、及びその用途
WO2016111112A1 (ja) * 2015-01-05 2016-07-14 東レ・ファインケミカル株式会社 シリコーン共重合体およびその製造方法
JPWO2016111112A1 (ja) * 2015-01-05 2017-10-12 東レ・ファインケミカル株式会社 シリコーン共重合体およびその製造方法

Also Published As

Publication number Publication date
JPH0575005B2 (enExample) 1993-10-19

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