JPS6389964U - - Google Patents
Info
- Publication number
- JPS6389964U JPS6389964U JP18184186U JP18184186U JPS6389964U JP S6389964 U JPS6389964 U JP S6389964U JP 18184186 U JP18184186 U JP 18184186U JP 18184186 U JP18184186 U JP 18184186U JP S6389964 U JPS6389964 U JP S6389964U
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- thin film
- ionization section
- lid
- forming apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 claims description 5
- 238000005192 partition Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims 2
- 230000001133 acceleration Effects 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図はこの考案の一実施例の要部正断面図、
第２図は従来の薄膜形成装置の正断面図、第３図
は第２図のものの要部正断面図である。
１……真空槽、４……蒸着物質、５……るつぼ
、１１……イオン化フイラメント、１６……加速
電極、１８……中性クラスター、１９……イオン
化クラスター、２７……小孔、２８……るつぼふ
た、２９……るつぼ内隔壁、３０……開口、３１
……隙間。なお、各図中、同一符号は同一又は相
当部分を示す。
FIG. 1 is a front sectional view of the main part of an embodiment of this invention.
FIG. 2 is a front sectional view of a conventional thin film forming apparatus, and FIG. 3 is a front sectional view of a main part of the apparatus shown in FIG. DESCRIPTION OF SYMBOLS 1... Vacuum chamber, 4... Vapor deposition substance, 5... Crucible, 11... Ionization filament, 16... Accelerating electrode, 18... Neutral cluster, 19... Ionization cluster, 27... Small hole, 28... ... Crucible lid, 29 ... Crucible inner partition, 30 ... Opening, 31
……gap. In each figure, the same reference numerals indicate the same or equivalent parts.
Claims (1)
および薄膜を被着すべき基板を配置し、前記るつ
ぼおよび前記イオン化部と前記加速電極との間に
前者が正、後者が負となるように加速電圧が印加
され、前記るつぼ内の蒸着物質が加熱により蒸気
化されて前記るつぼのるつぼふたに設けられた小
孔より蒸気を高真空中に噴射して断熱膨張による
過冷却状態によつて発生したクラスターに対し、
前記イオン化部でクラスターイオンを発生させ、
これを加速して前記基板に前記薄膜を付着させる
薄膜形成装置において、前記るつぼ内に設けられ
前記るつぼふたとの間に隙間を形成し、かつ、上
端に開口を有したるつぼ内隔壁を備えてなること
を特徴とする薄膜形成装置。 A crucible, an ionization section, an accelerating electrode, and a substrate to which a thin film is to be deposited are arranged in a high vacuum region, and acceleration is performed between the crucible, the ionization section, and the accelerating electrode so that the former becomes positive and the latter becomes negative. When a voltage is applied, the deposited material in the crucible is heated and vaporized, and the steam is injected into a high vacuum through a small hole provided in the crucible lid of the crucible, resulting in a supercooled state due to adiabatic expansion. For the cluster,
generating cluster ions in the ionization section;
A thin film forming apparatus for accelerating this to adhere the thin film to the substrate, the crucible having an internal partition wall provided in the crucible, forming a gap between the crucible lid and the crucible lid, and having an opening at an upper end. A thin film forming apparatus characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18184186U JPH0516214Y2 (en) | 1986-11-28 | 1986-11-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18184186U JPH0516214Y2 (en) | 1986-11-28 | 1986-11-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6389964U true JPS6389964U (en) | 1988-06-10 |
| JPH0516214Y2 JPH0516214Y2 (en) | 1993-04-28 |
Family
ID=31127084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18184186U Expired - Lifetime JPH0516214Y2 (en) | 1986-11-28 | 1986-11-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0516214Y2 (en) |
-
1986
- 1986-11-28 JP JP18184186U patent/JPH0516214Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0516214Y2 (en) | 1993-04-28 |
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