JPS62190334U - - Google Patents
Info
- Publication number
- JPS62190334U JPS62190334U JP7695686U JP7695686U JPS62190334U JP S62190334 U JPS62190334 U JP S62190334U JP 7695686 U JP7695686 U JP 7695686U JP 7695686 U JP7695686 U JP 7695686U JP S62190334 U JPS62190334 U JP S62190334U
- Authority
- JP
- Japan
- Prior art keywords
- surface treatment
- compound
- gas
- vacuum chamber
- atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 230000007935 neutral effect Effects 0.000 claims description 2
- 238000004381 surface treatment Methods 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 5
- 238000001816 cooling Methods 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 230000001133 acceleration Effects 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 239000002826 coolant Substances 0.000 description 2
Description
第１図は本考案の第１の実施例の略式断面図、
第２図は本考案の第２の実施例の略式断面図、第
３図は従来の例を示す略式断面図である。
１１……真空槽、１２……挑気通路、２３……
気体収容部、２４……クラスタ源、２５１……冷
却剤容器、２５２……冷却剤、２７……ノズル、
３２……グリツド、３３……熱電子、３４……加
速電極、４１……中性クラスタ、４２……クラス
タ・イオン、５１……基板、５２……基板ホルダ
。
FIG. 1 is a schematic sectional view of the first embodiment of the present invention;
FIG. 2 is a schematic sectional view of a second embodiment of the present invention, and FIG. 3 is a schematic sectional view of a conventional example. 11...Vacuum tank, 12...Challenge passageway, 23...
Gas storage unit, 24... cluster source, 251... coolant container, 252... coolant, 27... nozzle,
32... Grid, 33... Thermionic electron, 34... Accelerating electrode, 41... Neutral cluster, 42... Cluster ion, 51... Substrate, 52... Substrate holder.
Claims (1)
内に設けられた基板の表面処理をすべき物質を有
するの常温気体の化合物を噴出して、該化合物の
クラスタを発生するノズル付気体収容部と、該気
体収容部を冷却する冷却手段と、上記クラスタと
なつた化合物を分離して上記表面処理物質原子の
クラスタの一部をイオン化するイオン化手段と、
該イオン化された表面処理原子のクラスタ・イオ
ンを加速しこれをイオン化されていない中性クラ
スタとともに基板に衝突させて、膜形成ないしエ
ツチングさせる加速手段とを備えた表面処理装置
において、上記常温気体の化合物の温度を制御す
る手段として、上記気体収容部の内部に該気体収
容部の内壁に接して上記常温ガスの化合物の直進
防止機構部を設けたことを特徴とする表面処理装
置。 A gas with a nozzle that ejects a room temperature gas compound containing a substance to be used for surface treatment of a substrate placed in the vacuum chamber into a vacuum chamber maintained at a predetermined degree of vacuum to generate clusters of the compound. a storage section, a cooling means for cooling the gas storage section, and an ionization means for separating the clustered compound and ionizing a part of the cluster of surface treatment substance atoms;
A surface treatment apparatus comprising an acceleration means for accelerating the cluster ions of the ionized surface treatment atoms and causing them to collide with the substrate together with the non-ionized neutral clusters to form a film or etch the surface treatment. A surface treatment apparatus characterized in that, as a means for controlling the temperature of the compound, a mechanism for preventing the compound of the normal temperature gas from moving straight is provided inside the gas containing section in contact with an inner wall of the gas containing section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7695686U JPS62190334U (en) | 1986-05-23 | 1986-05-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7695686U JPS62190334U (en) | 1986-05-23 | 1986-05-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62190334U true JPS62190334U (en) | 1987-12-03 |
Family
ID=30924511
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7695686U Pending JPS62190334U (en) | 1986-05-23 | 1986-05-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62190334U (en) |
-
1986
- 1986-05-23 JP JP7695686U patent/JPS62190334U/ja active Pending
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