JPH0322063U - - Google Patents
Info
- Publication number
- JPH0322063U JPH0322063U JP8062389U JP8062389U JPH0322063U JP H0322063 U JPH0322063 U JP H0322063U JP 8062389 U JP8062389 U JP 8062389U JP 8062389 U JP8062389 U JP 8062389U JP H0322063 U JPH0322063 U JP H0322063U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- thin film
- film material
- evaporation source
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001704 evaporation Methods 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- 238000007733 ion plating Methods 0.000 claims description 4
- 230000005284 excitation Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 230000005684 electric field Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１〜３図は本考案の実施例に係り、第１図は
イオンプレーテイング装置の概略断面図、第２図
は蒸発源の平面図、第３図は要部の一部断面図で
ある。第４〜７図は従来技術に係り、第４図は従
来のイオンプレーテイング装置の概略断面図、第
５図はハースの平面図、第６図はハースのるつぼ
に薄膜材料を供給する装置の原理を示す斜視図、
第７図は電子銃のフイラメントの正面図である。
１……真空槽、２……基板、３１，３２……薄
膜材料、４１，４２……蒸発源、５１，５２……
高周波励起コイル、６……直流バイアス電圧印加
手段、７１，７２……膜厚モニタ、１１，１２…
…作動室。
Figures 1 to 3 relate to embodiments of the present invention, with Figure 1 being a schematic sectional view of the ion plating device, Figure 2 being a plan view of the evaporation source, and Figure 3 being a partial sectional view of the main parts. . 4 to 7 relate to the prior art, FIG. 4 is a schematic sectional view of a conventional ion plating apparatus, FIG. 5 is a plan view of a Haas, and FIG. 6 is a diagram of an apparatus for supplying thin film material to a Haas crucible. A perspective view showing the principle,
FIG. 7 is a front view of the filament of the electron gun. 1... Vacuum chamber, 2... Substrate, 31, 32... Thin film material, 41, 42... Evaporation source, 51, 52...
High frequency excitation coil, 6... DC bias voltage application means, 71, 72... Film thickness monitor, 11, 12...
...Working room.
Claims (1)
料を蒸発供給する蒸発源と、 該真空槽内で該蒸発源と該基板との間に設けら
れ蒸発した該薄膜材料をイオン化する高周波励起
コイルと、 該真空槽内で該基板と該蒸発源との間にイオン
加速電界を形成する直流バイアス電圧印加手段と
、 蒸発する該薄膜材料の蒸発速度を感知する膜厚
モニタとを具備したイオンプレーテイング装置で
あつて、 該真空槽は真空状態と大気状態とを切換え可能
な複数の作動室をもち、 該蒸発源、該高周波励起コイル及び該膜厚モニ
タのうち少なくとも一種は、該作動室毎に配設さ
れたことを特徴とするイオンプレーテイング装置
。[Scope of Claim for Utility Model Registration] A vacuum chamber whose interior can be maintained in a vacuum state, a substrate supported within the vacuum chamber, and a thin film material provided in the vacuum chamber to evaporate and supply a thin film material. an evaporation source; a high-frequency excitation coil that is provided between the evaporation source and the substrate in the vacuum chamber and ionizes the evaporated thin film material; An ion plating apparatus equipped with a direct current bias voltage applying means for forming an accelerating electric field and a film thickness monitor for sensing the evaporation rate of the evaporating thin film material, wherein the vacuum chamber switches between a vacuum state and an atmospheric state. An ion plating apparatus characterized in that it has a plurality of possible working chambers, and at least one of the evaporation source, the high-frequency excitation coil, and the film thickness monitor is disposed for each working chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8062389U JPH0322063U (en) | 1989-07-07 | 1989-07-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8062389U JPH0322063U (en) | 1989-07-07 | 1989-07-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0322063U true JPH0322063U (en) | 1991-03-06 |
Family
ID=31625848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8062389U Pending JPH0322063U (en) | 1989-07-07 | 1989-07-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0322063U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011156090A (en) * | 2010-01-29 | 2011-08-18 | Kyoraku Sangyo Kk | Game machine |
| JP2011156088A (en) * | 2010-01-29 | 2011-08-18 | Kyoraku Sangyo Kk | Game machine |
-
1989
- 1989-07-07 JP JP8062389U patent/JPH0322063U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011156090A (en) * | 2010-01-29 | 2011-08-18 | Kyoraku Sangyo Kk | Game machine |
| JP2011156088A (en) * | 2010-01-29 | 2011-08-18 | Kyoraku Sangyo Kk | Game machine |
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