JPH0444359U - - Google Patents
Info
- Publication number
- JPH0444359U JPH0444359U JP8545990U JP8545990U JPH0444359U JP H0444359 U JPH0444359 U JP H0444359U JP 8545990 U JP8545990 U JP 8545990U JP 8545990 U JP8545990 U JP 8545990U JP H0444359 U JPH0444359 U JP H0444359U
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- prevention plate
- evaporation device
- target surface
- vacuum arc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000002265 prevention Effects 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 230000008020 evaporation Effects 0.000 claims 2
- 238000001704 evaporation Methods 0.000 claims 2
- 239000000470 constituent Substances 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000010891 electric arc Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は本考案の第１実施例を示す真空アーク
蒸発装置の概略説明図、第２図は本考案の第２実
施例を示す真空アーク蒸発装置の概略説明図、第
３図は本考案の第３実施例を示す真空アーク蒸発
装置の概略説明図、第４図は従来例を示す真空ア
ーク蒸発装置の概略説明図である。
１，２１……ターゲツト、２，２２……ワーク
、３，２３……回転治具、４，２４……真空容器
、５，２５……カソード電源、６，２６……基板
バイアス電源、７，２７……排気口、８，２８…
…ガス導入口、９，２９……イグナイター、１０
，３０……駆動源、１１，３１……モーター、１
２……加熱機構付防着板、１３……電極。
Fig. 1 is a schematic explanatory diagram of a vacuum arc evaporator according to a first embodiment of the present invention, Fig. 2 is a schematic explanatory diagram of a vacuum arc evaporator according to a second embodiment of the present invention, and Fig. 3 is a schematic explanatory diagram of a vacuum arc evaporator according to a second embodiment of the present invention. FIG. 4 is a schematic explanatory diagram of a vacuum arc evaporator according to a conventional example. 1, 21... Target, 2, 22... Work, 3, 23... Rotating jig, 4, 24... Vacuum container, 5, 25... Cathode power supply, 6, 26... Substrate bias power supply, 7. 27...Exhaust port, 8, 28...
...Gas inlet, 9,29...Igniter, 10
, 30... Drive source, 11, 31... Motor, 1
2... Adhesion prevention plate with heating mechanism, 13... Electrode.
Claims (1)
その構成物質を蒸発させ、前記ターゲツト面と対
向配置した各ワークの表面に蒸発物が一定距離の
ものとで垂直方向に被着されるように、大地電位
またはカソード電位に保持された防着板を真空容
器内のワーク近傍に設けたことを特徴とする真空
アーク蒸発装置。 (2) 防着板が加熱機構を有する請求項１記載の
真空アーク蒸発装置。[Claims for Utility Model Registration] (1) A target surface is heated by arc discharge to evaporate its constituent substances, and the evaporated material is placed at a certain distance on the surface of each workpiece placed opposite the target surface in a vertical direction. 1. A vacuum arc evaporation device characterized in that an adhesion prevention plate held at ground potential or cathode potential is provided near a workpiece in a vacuum container so that the workpiece is adhered to the workpiece. (2) The vacuum arc evaporation device according to claim 1, wherein the deposition prevention plate has a heating mechanism.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8545990U JPH0444359U (en) | 1990-08-14 | 1990-08-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8545990U JPH0444359U (en) | 1990-08-14 | 1990-08-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0444359U true JPH0444359U (en) | 1992-04-15 |
Family
ID=31816744
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8545990U Pending JPH0444359U (en) | 1990-08-14 | 1990-08-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0444359U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010159439A (en) * | 2009-01-06 | 2010-07-22 | Shinko Seiki Co Ltd | Film-forming apparatus |
| JP2012057198A (en) * | 2010-09-07 | 2012-03-22 | Ulvac-Riko Inc | Device and method for forming particulate |
-
1990
- 1990-08-14 JP JP8545990U patent/JPH0444359U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010159439A (en) * | 2009-01-06 | 2010-07-22 | Shinko Seiki Co Ltd | Film-forming apparatus |
| JP2012057198A (en) * | 2010-09-07 | 2012-03-22 | Ulvac-Riko Inc | Device and method for forming particulate |
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