JPS6389963U - - Google Patents
Info
- Publication number
- JPS6389963U JPS6389963U JP18386786U JP18386786U JPS6389963U JP S6389963 U JPS6389963 U JP S6389963U JP 18386786 U JP18386786 U JP 18386786U JP 18386786 U JP18386786 U JP 18386786U JP S6389963 U JPS6389963 U JP S6389963U
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- evaporation source
- vacuum
- container
- melting point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001704 evaporation Methods 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 9
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18386786U JPS6389963U (enrdf_load_stackoverflow) | 1986-11-28 | 1986-11-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18386786U JPS6389963U (enrdf_load_stackoverflow) | 1986-11-28 | 1986-11-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6389963U true JPS6389963U (enrdf_load_stackoverflow) | 1988-06-10 |
Family
ID=31130996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18386786U Pending JPS6389963U (enrdf_load_stackoverflow) | 1986-11-28 | 1986-11-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6389963U (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005272965A (ja) * | 2004-03-25 | 2005-10-06 | Sumitomo Heavy Ind Ltd | 電極部材、及びこれを備えた成膜装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56123368A (en) * | 1980-02-29 | 1981-09-28 | Sekisui Chem Co Ltd | Crucible for evaporation source |
| JPS59100268A (ja) * | 1982-11-29 | 1984-06-09 | Toshiba Corp | 真空蒸着装置 |
| JPS59202624A (ja) * | 1983-04-30 | 1984-11-16 | Sharp Corp | 薄膜形成用蒸発源 |
| JPS59203644A (ja) * | 1983-05-06 | 1984-11-17 | Mitsubishi Electric Corp | 蒸発源用るつぼ |
| JPS60165373A (ja) * | 1984-02-09 | 1985-08-28 | Matsushita Electronics Corp | 電子ビ−ム蒸着装置 |
-
1986
- 1986-11-28 JP JP18386786U patent/JPS6389963U/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56123368A (en) * | 1980-02-29 | 1981-09-28 | Sekisui Chem Co Ltd | Crucible for evaporation source |
| JPS59100268A (ja) * | 1982-11-29 | 1984-06-09 | Toshiba Corp | 真空蒸着装置 |
| JPS59202624A (ja) * | 1983-04-30 | 1984-11-16 | Sharp Corp | 薄膜形成用蒸発源 |
| JPS59203644A (ja) * | 1983-05-06 | 1984-11-17 | Mitsubishi Electric Corp | 蒸発源用るつぼ |
| JPS60165373A (ja) * | 1984-02-09 | 1985-08-28 | Matsushita Electronics Corp | 電子ビ−ム蒸着装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005272965A (ja) * | 2004-03-25 | 2005-10-06 | Sumitomo Heavy Ind Ltd | 電極部材、及びこれを備えた成膜装置 |