JPS6365621B2 - - Google Patents
Info
- Publication number
- JPS6365621B2 JPS6365621B2 JP13721783A JP13721783A JPS6365621B2 JP S6365621 B2 JPS6365621 B2 JP S6365621B2 JP 13721783 A JP13721783 A JP 13721783A JP 13721783 A JP13721783 A JP 13721783A JP S6365621 B2 JPS6365621 B2 JP S6365621B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon oxide
- substrate
- oxide film
- boric acid
- aqueous solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 25
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 25
- 239000007788 liquid Substances 0.000 claims description 18
- 238000012545 processing Methods 0.000 claims description 15
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 14
- 239000004327 boric acid Substances 0.000 claims description 14
- 239000000243 solution Substances 0.000 claims description 14
- 239000007864 aqueous solution Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 6
- 238000007654 immersion Methods 0.000 claims description 6
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- 239000011521 glass Substances 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000001914 filtration Methods 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229960002050 hydrofluoric acid Drugs 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Surface Treatment Of Glass (AREA)
- Chemically Coating (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13721783A JPS6033233A (ja) | 1983-07-27 | 1983-07-27 | 酸化珪素被膜の製造方法 |
DE19833332995 DE3332995A1 (de) | 1983-07-14 | 1983-09-13 | Verfahren zum herstellen einer siliciumdioxidbeschichtung |
FR8314651A FR2549035A1 (en) | 1983-07-14 | 1983-09-14 | Process for producing a silica coating on the surface of a substrate such as a sheet of glass containing an alkali metal |
GB08324760A GB2144733B (en) | 1983-07-14 | 1983-09-15 | Methods of making silicon dioxide coatings |
DD83254853A DD215996A5 (de) | 1983-07-14 | 1983-09-15 | Verfahren zur herstellung einer siliciumdioxidbeschichtung |
US06/538,289 US4468420A (en) | 1983-07-14 | 1983-10-03 | Method for making a silicon dioxide coating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13721783A JPS6033233A (ja) | 1983-07-27 | 1983-07-27 | 酸化珪素被膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6033233A JPS6033233A (ja) | 1985-02-20 |
JPS6365621B2 true JPS6365621B2 (hr) | 1988-12-16 |
Family
ID=15193519
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13721783A Granted JPS6033233A (ja) | 1983-07-14 | 1983-07-27 | 酸化珪素被膜の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6033233A (hr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02105920U (hr) * | 1989-02-07 | 1990-08-23 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS648296A (en) * | 1987-06-30 | 1989-01-12 | Nippon Sheet Glass Co Ltd | Production of silicon dioxide film |
JPS6417871A (en) * | 1987-07-13 | 1989-01-20 | Nippon Sheet Glass Co Ltd | Production of silicon dioxide coated film |
JPS6436770A (en) * | 1987-07-30 | 1989-02-07 | Nippon Sheet Glass Co Ltd | Production of silicon dioxide film containing phosphorus |
JPS6483670A (en) * | 1987-09-28 | 1989-03-29 | Nippon Sheet Glass Co Ltd | Production of oxide film |
JP2803355B2 (ja) * | 1990-09-29 | 1998-09-24 | 日本板硝子株式会社 | 二酸化珪素被膜の製造方法 |
US5326720A (en) * | 1990-10-25 | 1994-07-05 | Nippon Sheet Glass Co., Ltd. | Method for producing silicon dioxide film which prevents escape of Si component to the environment |
JP2912457B2 (ja) * | 1991-02-01 | 1999-06-28 | 日本板硝子株式会社 | 薄膜コンデンサ |
-
1983
- 1983-07-27 JP JP13721783A patent/JPS6033233A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02105920U (hr) * | 1989-02-07 | 1990-08-23 |
Also Published As
Publication number | Publication date |
---|---|
JPS6033233A (ja) | 1985-02-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1124008A (en) | Bath for electroless depositing tin on substrates | |
DD215996A5 (de) | Verfahren zur herstellung einer siliciumdioxidbeschichtung | |
JPS6365621B2 (hr) | ||
DE1931936A1 (de) | Waermereflektierendes Glas und Verfahren zur Herstellung desselben | |
US4108621A (en) | Process of producing soft aperture filter | |
EP0510191A1 (en) | Process for preparing silicon dioxide coating | |
US3674517A (en) | Solution for depositing transparent metal films | |
JP2730249B2 (ja) | 二酸化珪素被膜の製造方法 | |
JPH058274B2 (hr) | ||
JPH0367978B2 (hr) | ||
JPH03122030A (ja) | ガラス表面処理方法 | |
DE1496625C (de) | Verfahren zur Herstellung von gering spiegelnden Oberflachen an Glasgegen standen mit gutem optischen Auflosungs vermögen | |
SU1315407A1 (ru) | Способ металлизации изделий из диэлектриков | |
JP3010239B2 (ja) | プラスチック成形体への二酸化珪素膜の選択形成方法 | |
JPS6231186Y2 (hr) | ||
SU1130619A1 (ru) | Раствор дл предварительной обработки поверхности пластмасс перед химическим меднением | |
JPH03112806A (ja) | 二酸化珪素被膜の製造方法及び装置 | |
JPH01178529A (ja) | ポリエステルの表面処理方法 | |
JPH0567709B2 (hr) | ||
JPH0762087B2 (ja) | 二酸化珪素被覆ポリカーボネート成形体の製造方法 | |
JPS6125663B2 (hr) | ||
JPH0694368B2 (ja) | 二酸化珪素被膜の製造方法 | |
KR910009165B1 (ko) | 무전해 니켈 도금용 활성용액의 제조방법. | |
JPS62288141A (ja) | 結晶化ガラス物品の製造方法 | |
JPH06158332A (ja) | 二酸化珪素被膜の製造方法 |