JPS6417871A - Production of silicon dioxide coated film - Google Patents

Production of silicon dioxide coated film

Info

Publication number
JPS6417871A
JPS6417871A JP17456187A JP17456187A JPS6417871A JP S6417871 A JPS6417871 A JP S6417871A JP 17456187 A JP17456187 A JP 17456187A JP 17456187 A JP17456187 A JP 17456187A JP S6417871 A JPS6417871 A JP S6417871A
Authority
JP
Japan
Prior art keywords
silicon dioxide
substrate
coated film
soln
dioxide coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17456187A
Other languages
Japanese (ja)
Inventor
Takuji Aida
Hisao Honda
Hirotsugu Nagayama
Akimitsu Hishinuma
Hideo Kawahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP17456187A priority Critical patent/JPS6417871A/en
Publication of JPS6417871A publication Critical patent/JPS6417871A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating

Abstract

PURPOSE:To easily obtain the title dense silicon dioxide film at a low cost by bringing a processing soln. obtained by dissolving silicon dioxide in an aq. soln. of hydrofluosilicic acid kept at a specified temp. to supersaturation into contact with a substrate to deposit a silicon dioxide coated film on the substrate surface. CONSTITUTION:Silicon dioxide is dissolved in an aq. soln. of hydrofluosilicic acid having 3.5-5mol./l concn. to supersaturation to prepare the processing soln. The processing soln. is then brought into contact with a substrate (e.g., a glass substrate and a silicon substrate) to deposit the silicon dioxide coated film on the substrate surface, and the silicon dioxide coated film is produced. The substrate is dipped in a dip tank filled with the processing soln., and the substrate is appropriately brought into contact with the processing soln. Since the concn. of the hydrofluosilicic acid in the processing soln. is controlled to 3.5-5mol./l, the content of an OH group in the silicon dioxide coated film is reduced, and a dense coated film can be formed.
JP17456187A 1987-07-13 1987-07-13 Production of silicon dioxide coated film Pending JPS6417871A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17456187A JPS6417871A (en) 1987-07-13 1987-07-13 Production of silicon dioxide coated film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17456187A JPS6417871A (en) 1987-07-13 1987-07-13 Production of silicon dioxide coated film

Publications (1)

Publication Number Publication Date
JPS6417871A true JPS6417871A (en) 1989-01-20

Family

ID=15980710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17456187A Pending JPS6417871A (en) 1987-07-13 1987-07-13 Production of silicon dioxide coated film

Country Status (1)

Country Link
JP (1) JPS6417871A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153035A (en) * 1990-09-29 1992-10-06 Nippon Sheet Glass Co., Ltd. Process for forming silica films
US5326720A (en) * 1990-10-25 1994-07-05 Nippon Sheet Glass Co., Ltd. Method for producing silicon dioxide film which prevents escape of Si component to the environment
WO2011006089A3 (en) * 2009-07-10 2011-05-05 Greg Caldwell Company, Llc Coated glass bottles, encapsulated compact fluorescent bulbs and articles and methods of manufacture

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB626810A (en) * 1946-08-16 1949-07-21 Rca Corp Process of depositing silica films
JPS6033233A (en) * 1983-07-27 1985-02-20 Nippon Sheet Glass Co Ltd Preparation of glass coated with silicon oxide

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB626810A (en) * 1946-08-16 1949-07-21 Rca Corp Process of depositing silica films
JPS6033233A (en) * 1983-07-27 1985-02-20 Nippon Sheet Glass Co Ltd Preparation of glass coated with silicon oxide

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153035A (en) * 1990-09-29 1992-10-06 Nippon Sheet Glass Co., Ltd. Process for forming silica films
US5326720A (en) * 1990-10-25 1994-07-05 Nippon Sheet Glass Co., Ltd. Method for producing silicon dioxide film which prevents escape of Si component to the environment
WO2011006089A3 (en) * 2009-07-10 2011-05-05 Greg Caldwell Company, Llc Coated glass bottles, encapsulated compact fluorescent bulbs and articles and methods of manufacture

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