JPS6365620B2 - - Google Patents
Info
- Publication number
- JPS6365620B2 JPS6365620B2 JP57041234A JP4123482A JPS6365620B2 JP S6365620 B2 JPS6365620 B2 JP S6365620B2 JP 57041234 A JP57041234 A JP 57041234A JP 4123482 A JP4123482 A JP 4123482A JP S6365620 B2 JPS6365620 B2 JP S6365620B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- mol
- silica
- boric acid
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 57
- 239000011521 glass Substances 0.000 claims description 31
- 239000000377 silicon dioxide Substances 0.000 claims description 28
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 21
- 239000004327 boric acid Substances 0.000 claims description 20
- 239000000243 solution Substances 0.000 claims description 20
- 238000011282 treatment Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 11
- 229910052783 alkali metal Inorganic materials 0.000 claims description 9
- 150000001340 alkali metals Chemical class 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 229920006395 saturated elastomer Polymers 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 238000004381 surface treatment Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 description 8
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- LRCFXGAMWKDGLA-UHFFFAOYSA-N dioxosilane;hydrate Chemical compound O.O=[Si]=O LRCFXGAMWKDGLA-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000011221 initial treatment Methods 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000012085 test solution Substances 0.000 description 1
Landscapes
- Chemically Coating (AREA)
- Surface Treatment Of Glass (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4123482A JPS58161944A (ja) | 1982-03-16 | 1982-03-16 | アルカリ金属を含むガラスの表面処理方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4123482A JPS58161944A (ja) | 1982-03-16 | 1982-03-16 | アルカリ金属を含むガラスの表面処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58161944A JPS58161944A (ja) | 1983-09-26 |
JPS6365620B2 true JPS6365620B2 (US07179912-20070220-C00144.png) | 1988-12-16 |
Family
ID=12602719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4123482A Granted JPS58161944A (ja) | 1982-03-16 | 1982-03-16 | アルカリ金属を含むガラスの表面処理方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58161944A (US07179912-20070220-C00144.png) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0288924U (US07179912-20070220-C00144.png) * | 1988-12-28 | 1990-07-13 | ||
CN103695875A (zh) * | 2013-12-06 | 2014-04-02 | 湖洲三峰能源科技有限公司 | 一种用于加速氧化硅生长在衬底表面上的化学组合物 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6436770A (en) * | 1987-07-30 | 1989-02-07 | Nippon Sheet Glass Co Ltd | Production of silicon dioxide film containing phosphorus |
JP4734517B2 (ja) * | 2004-04-02 | 2011-07-27 | 新コスモス電機株式会社 | ガスセンサの製造方法 |
JP5518490B2 (ja) * | 2008-01-30 | 2014-06-11 | Hoya株式会社 | 基板製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB626810A (en) * | 1946-08-16 | 1949-07-21 | Rca Corp | Process of depositing silica films |
US2490662A (en) * | 1946-09-21 | 1949-12-06 | Rca Corp | Skeletonizing glass |
-
1982
- 1982-03-16 JP JP4123482A patent/JPS58161944A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB626810A (en) * | 1946-08-16 | 1949-07-21 | Rca Corp | Process of depositing silica films |
US2490662A (en) * | 1946-09-21 | 1949-12-06 | Rca Corp | Skeletonizing glass |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0288924U (US07179912-20070220-C00144.png) * | 1988-12-28 | 1990-07-13 | ||
CN103695875A (zh) * | 2013-12-06 | 2014-04-02 | 湖洲三峰能源科技有限公司 | 一种用于加速氧化硅生长在衬底表面上的化学组合物 |
Also Published As
Publication number | Publication date |
---|---|
JPS58161944A (ja) | 1983-09-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5073408A (en) | Method of depositing a silicon dioxide film | |
US8066898B2 (en) | Surface treatment solution for the fine surface processing of a glass substrate containing multiple ingredients | |
US9926225B2 (en) | Media and methods for etching glass | |
US3314772A (en) | Corrosion retarding fluorine treatment of glass surfaces | |
JP2019043841A (ja) | リン酸リチウム化合物を含有する残留物を表面から除去する方法 | |
US4693916A (en) | Method of depositing a silicon dioxide film | |
US4578100A (en) | Method of making non-glare coated glass | |
US5851366A (en) | Adhering metal to glass | |
JPS6365620B2 (US07179912-20070220-C00144.png) | ||
JPH06227842A (ja) | フロート板ガラス物品の表面スズ除去方法 | |
US3661545A (en) | Method for treating a molten salt with water vapor | |
JPH03285821A (ja) | 酸化チタン被膜の製造方法 | |
JPH0193004A (ja) | 透明導電性ガラス基板およびその製造方法 | |
JPH0741335A (ja) | ガラス容器の処理方法 | |
JPH0132172B2 (US07179912-20070220-C00144.png) | ||
SU1033467A1 (ru) | Способ очистки стекл нных подложек | |
KR20050066395A (ko) | 인듐 산화막의 식각액 조성물 및 그를 이용한 식각 방법 | |
JP2730261B2 (ja) | 二酸化珪素被膜の製造方法 | |
JP4140158B2 (ja) | 二酸化珪素被膜の形成方法 | |
JPS62288141A (ja) | 結晶化ガラス物品の製造方法 | |
JPH06333912A (ja) | フッ酸系エッチング液 | |
JP3531576B2 (ja) | 二酸化珪素被膜の形成方法 | |
SU945113A1 (ru) | Состав дл обработки стекл нных пластин | |
JPH0246609A (ja) | 酸化錫膜を有するガラス板の製造方法 | |
JP2000207737A (ja) | 情報記録媒体用ガラス基板の製造方法 |