JPS6359538B2 - - Google Patents
Info
- Publication number
- JPS6359538B2 JPS6359538B2 JP56142383A JP14238381A JPS6359538B2 JP S6359538 B2 JPS6359538 B2 JP S6359538B2 JP 56142383 A JP56142383 A JP 56142383A JP 14238381 A JP14238381 A JP 14238381A JP S6359538 B2 JPS6359538 B2 JP S6359538B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- groove
- polysilicon
- semiconductor device
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10W10/041—
-
- H10W10/40—
Landscapes
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56142383A JPS5844735A (ja) | 1981-09-11 | 1981-09-11 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56142383A JPS5844735A (ja) | 1981-09-11 | 1981-09-11 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5844735A JPS5844735A (ja) | 1983-03-15 |
| JPS6359538B2 true JPS6359538B2 (index.php) | 1988-11-21 |
Family
ID=15314082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56142383A Granted JPS5844735A (ja) | 1981-09-11 | 1981-09-11 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5844735A (index.php) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59119848A (ja) * | 1982-12-27 | 1984-07-11 | Fujitsu Ltd | 半導体装置の製造方法 |
| GB2200794A (en) * | 1986-11-19 | 1988-08-10 | Plessey Co Plc | Semiconductor device manufacture |
| KR100256813B1 (ko) * | 1993-12-28 | 2000-05-15 | 김영환 | 반도체소자의 소자분리방법 |
| JP2891205B2 (ja) * | 1996-10-21 | 1999-05-17 | 日本電気株式会社 | 半導体集積回路の製造方法 |
| US7754550B2 (en) * | 2003-07-10 | 2010-07-13 | International Rectifier Corporation | Process for forming thick oxides on Si or SiC for semiconductor devices |
-
1981
- 1981-09-11 JP JP56142383A patent/JPS5844735A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5844735A (ja) | 1983-03-15 |
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