JPS6359223B2 - - Google Patents

Info

Publication number
JPS6359223B2
JPS6359223B2 JP57168178A JP16817882A JPS6359223B2 JP S6359223 B2 JPS6359223 B2 JP S6359223B2 JP 57168178 A JP57168178 A JP 57168178A JP 16817882 A JP16817882 A JP 16817882A JP S6359223 B2 JPS6359223 B2 JP S6359223B2
Authority
JP
Japan
Prior art keywords
electron beam
aperture
sample
electron
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57168178A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5968158A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP57168178A priority Critical patent/JPS5968158A/ja
Priority to US06/534,833 priority patent/US4547669A/en
Priority to GB08325829A priority patent/GB2127588B/en
Publication of JPS5968158A publication Critical patent/JPS5968158A/ja
Publication of JPS6359223B2 publication Critical patent/JPS6359223B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP57168178A 1982-09-27 1982-09-27 電子線装置 Granted JPS5968158A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP57168178A JPS5968158A (ja) 1982-09-27 1982-09-27 電子線装置
US06/534,833 US4547669A (en) 1982-09-27 1983-09-22 Electron beam scanning device
GB08325829A GB2127588B (en) 1982-09-27 1983-09-27 Electron beam scanning control

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57168178A JPS5968158A (ja) 1982-09-27 1982-09-27 電子線装置

Publications (2)

Publication Number Publication Date
JPS5968158A JPS5968158A (ja) 1984-04-18
JPS6359223B2 true JPS6359223B2 (US07345094-20080318-C00003.png) 1988-11-18

Family

ID=15863231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57168178A Granted JPS5968158A (ja) 1982-09-27 1982-09-27 電子線装置

Country Status (3)

Country Link
US (1) US4547669A (US07345094-20080318-C00003.png)
JP (1) JPS5968158A (US07345094-20080318-C00003.png)
GB (1) GB2127588B (US07345094-20080318-C00003.png)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0241728U (US07345094-20080318-C00003.png) * 1988-09-13 1990-03-22
JPH0645127U (ja) * 1992-11-26 1994-06-14 サンデン株式会社 電磁クラッチの防塵構造
JP2007207764A (ja) * 2007-02-26 2007-08-16 Hitachi Ltd 走査形荷電粒子顕微鏡

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63231856A (ja) * 1987-03-19 1988-09-27 Jeol Ltd 電子顕微鏡等の制御方法
JPS6435838A (en) * 1987-07-31 1989-02-06 Jeol Ltd Charged particle beam device
JPH0616405B2 (ja) * 1987-09-02 1994-03-02 株式会社日立製作所 電子顕微鏡
JPH0766766B2 (ja) * 1989-03-30 1995-07-19 株式会社日立製作所 電子顕微鏡
CA1308203C (en) * 1989-06-01 1992-09-29 Nanoquest (Canada) Inc. Magnification compensation apparatus
NL8902843A (nl) * 1989-11-17 1991-06-17 Philips Nv Contaminatiemonitor voor het meten van een verontreinigingsgraad in een evacueerbaar geladen deeltjesbundelsysteem.
DE4243489A1 (de) * 1992-12-22 1994-06-23 Zeiss Carl Fa Verfahren zur Beleuchtung mit einem fokussierten Elektronenstrahl und zugehöriges elektronen-optisches Beleuchtungssystem
GB9816799D0 (en) * 1998-08-03 1998-09-30 Anson Anthony W A means of writing,storing and retrieving binary information
US10504684B1 (en) * 2018-07-12 2019-12-10 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH High performance inspection scanning electron microscope device and method of operating the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1614123B1 (de) * 1967-02-24 1970-07-02 Max Planck Gesellschaft Korpuskularstrahlgeraet,insbesondere Elektronenmikroskop
JPS5854463B2 (ja) * 1978-02-27 1983-12-05 日本電子株式会社 電子プロ−ブ装置
US4210806A (en) * 1979-01-18 1980-07-01 International Business Machines Corporation High brightness electron probe beam and method
JPS5632655A (en) * 1979-08-24 1981-04-02 Toshiba Corp Electron beam device
US4424448A (en) * 1979-12-26 1984-01-03 Tokyo Shibaura Denki Kabushiki Kaisha Electron beam apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0241728U (US07345094-20080318-C00003.png) * 1988-09-13 1990-03-22
JPH0645127U (ja) * 1992-11-26 1994-06-14 サンデン株式会社 電磁クラッチの防塵構造
JP2007207764A (ja) * 2007-02-26 2007-08-16 Hitachi Ltd 走査形荷電粒子顕微鏡

Also Published As

Publication number Publication date
US4547669A (en) 1985-10-15
JPS5968158A (ja) 1984-04-18
GB2127588A (en) 1984-04-11
GB8325829D0 (en) 1983-10-26
GB2127588B (en) 1987-05-07

Similar Documents

Publication Publication Date Title
US5412209A (en) Electron beam apparatus
JP3542140B2 (ja) 投射型イオンビーム加工装置
JP3323021B2 (ja) 走査形電子顕微鏡及びそれを用いた試料像観察方法
JPS6359223B2 (US07345094-20080318-C00003.png)
JPH0766766B2 (ja) 電子顕微鏡
US20010030287A1 (en) Method of observing image and scanning electron microscope
JPH08255588A (ja) 走査電子顕微鏡およびその類似装置
JP2003151484A (ja) 走査型荷電粒子ビーム装置
US5258617A (en) Method and apparatus for correcting axial coma in electron microscopy
JP3524776B2 (ja) 走査電子顕微鏡
JPH1027563A (ja) 走査電子顕微鏡
US7161149B2 (en) Scanning electron microscope and method of controlling same
JPS5854463B2 (ja) 電子プロ−ブ装置
JP2002015691A (ja) 走査電子顕微鏡
JP3156428B2 (ja) 走査形電子顕微鏡
JP2636381B2 (ja) 電子線装置
JPS5914222B2 (ja) 走査電子顕微鏡等用倍率制御装置
JPS62296351A (ja) 荷電ビ−ム装置
JPH05258700A (ja) 走査像観察方法および走査電子顕微鏡
JPH0636347B2 (ja) 電子顕微鏡
JPH10283971A (ja) 集束イオンビーム加工方法及び加工装置
JP4223734B2 (ja) 電子顕微鏡
JPH0227494Y2 (US07345094-20080318-C00003.png)
JPS6355935A (ja) 電子ビ−ム描画装置
JPH01186743A (ja) 電界放射型走査電子顕微鏡