JPS6358226B2 - - Google Patents

Info

Publication number
JPS6358226B2
JPS6358226B2 JP57147368A JP14736882A JPS6358226B2 JP S6358226 B2 JPS6358226 B2 JP S6358226B2 JP 57147368 A JP57147368 A JP 57147368A JP 14736882 A JP14736882 A JP 14736882A JP S6358226 B2 JPS6358226 B2 JP S6358226B2
Authority
JP
Japan
Prior art keywords
electrodes
container
plasma
vacuum
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57147368A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5935674A (ja
Inventor
Naoharu Fujimori
Akira Doi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP14736882A priority Critical patent/JPS5935674A/ja
Publication of JPS5935674A publication Critical patent/JPS5935674A/ja
Publication of JPS6358226B2 publication Critical patent/JPS6358226B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP14736882A 1982-08-24 1982-08-24 蒸着装置 Granted JPS5935674A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14736882A JPS5935674A (ja) 1982-08-24 1982-08-24 蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14736882A JPS5935674A (ja) 1982-08-24 1982-08-24 蒸着装置

Publications (2)

Publication Number Publication Date
JPS5935674A JPS5935674A (ja) 1984-02-27
JPS6358226B2 true JPS6358226B2 (enrdf_load_stackoverflow) 1988-11-15

Family

ID=15428638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14736882A Granted JPS5935674A (ja) 1982-08-24 1982-08-24 蒸着装置

Country Status (1)

Country Link
JP (1) JPS5935674A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2589168B1 (fr) * 1985-10-25 1992-07-17 Solems Sa Appareil et son procede d'utilisation pour la formation de films minces assistee par plasma
JPS6328871A (ja) * 1986-07-22 1988-02-06 Toshiba Corp プラズマｃｖｄ処理装置
JPH0811178B2 (ja) * 1987-06-24 1996-02-07 日本合成ゴム株式会社 高温反応処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5931977B2 (ja) * 1977-01-24 1984-08-06 株式会社日立製作所 プラズマｃｖｄ装置
JPS5456366A (en) * 1977-10-14 1979-05-07 Hitachi Ltd Plasma film forming apparatus
JPS565972A (en) * 1979-06-27 1981-01-22 Canon Inc Film forming method

Also Published As

Publication number Publication date
JPS5935674A (ja) 1984-02-27

Similar Documents

Publication Publication Date Title
US4749587A (en) Process for depositing layers on substrates in a vacuum chamber
US5186973A (en) HFCVD method for producing thick, adherent and coherent polycrystalline diamonds films
JP2004006885A (ja) 高周波型プラズマ強化化学気相堆積反応装置、及びそれを用いる方法
JP2001181846A (ja) Ｃｖｄ装置
JPH0377655B2 (enrdf_load_stackoverflow)
JPS6358226B2 (enrdf_load_stackoverflow)
JPS62167294A (ja) 気相法によるダイヤモンド薄膜の製造法
JPH04180566A (ja) 薄膜形成装置
JPS62210623A (ja) 気相反応装置用電極
JPH04228566A (ja) スパッターイオンめっきによる導電性繊維被覆方法および装置
JPH06336677A (ja) プラズマｃｖｄ装置
JPH05195230A (ja) 長尺体用コーティング装置
JPH03130366A (ja) 炭化珪素膜製造装置
JPH0527707B2 (enrdf_load_stackoverflow)
JPH03138370A (ja) 薄膜製造装置
JPS61199068A (ja) 筒状導体部材のセラミツクス被覆法およびそのための装置
JPH01247574A (ja) プラズマｃｖｄ装置
JPS63256596A (ja) ダイヤモンドの気相合成法
JPS6068619A (ja) プラズマｃｖｄ装置
JPS5943988B2 (ja) 超微粒子膜の製造方法および製造装置
JPS6353271A (ja) 薄膜被覆方法およびその装置
JPS63270471A (ja) プラズマｃｖｄ装置
JPH0215633B2 (enrdf_load_stackoverflow)
JPS58117868A (ja) 皮膜形成装置
JPH03202467A (ja) 高周波プラズマ素材プロセッシング装置