JPS6355231B2 - - Google Patents

Info

Publication number
JPS6355231B2
JPS6355231B2 JP17097983A JP17097983A JPS6355231B2 JP S6355231 B2 JPS6355231 B2 JP S6355231B2 JP 17097983 A JP17097983 A JP 17097983A JP 17097983 A JP17097983 A JP 17097983A JP S6355231 B2 JPS6355231 B2 JP S6355231B2
Authority
JP
Japan
Prior art keywords
layer
grown
groove
plane
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17097983A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6062181A (ja
Inventor
Koichi Imanaka
Hideaki Horikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP17097983A priority Critical patent/JPS6062181A/ja
Publication of JPS6062181A publication Critical patent/JPS6062181A/ja
Publication of JPS6355231B2 publication Critical patent/JPS6355231B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/2205Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2232Buried stripe structure with inner confining structure between the active layer and the lower electrode
    • H01S5/2234Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Semiconductor Lasers (AREA)
JP17097983A 1983-09-16 1983-09-16 半導体発光素子の製造方法 Granted JPS6062181A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17097983A JPS6062181A (ja) 1983-09-16 1983-09-16 半導体発光素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17097983A JPS6062181A (ja) 1983-09-16 1983-09-16 半導体発光素子の製造方法

Publications (2)

Publication Number Publication Date
JPS6062181A JPS6062181A (ja) 1985-04-10
JPS6355231B2 true JPS6355231B2 (enrdf_load_stackoverflow) 1988-11-01

Family

ID=15914886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17097983A Granted JPS6062181A (ja) 1983-09-16 1983-09-16 半導体発光素子の製造方法

Country Status (1)

Country Link
JP (1) JPS6062181A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010212664A (ja) * 2009-02-10 2010-09-24 Renesas Electronics Corp 半導体レーザとその製造方法

Also Published As

Publication number Publication date
JPS6062181A (ja) 1985-04-10

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