JPS6354213B2 - - Google Patents
Info
- Publication number
- JPS6354213B2 JPS6354213B2 JP57210922A JP21092282A JPS6354213B2 JP S6354213 B2 JPS6354213 B2 JP S6354213B2 JP 57210922 A JP57210922 A JP 57210922A JP 21092282 A JP21092282 A JP 21092282A JP S6354213 B2 JPS6354213 B2 JP S6354213B2
- Authority
- JP
- Japan
- Prior art keywords
- data
- alignment
- alignment mark
- mark
- memory
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001514 detection method Methods 0.000 claims description 61
- 238000003384 imaging method Methods 0.000 claims description 16
- 230000004397 blinking Effects 0.000 claims 1
- 230000015654 memory Effects 0.000 description 68
- 230000010354 integration Effects 0.000 description 37
- 238000000034 method Methods 0.000 description 20
- 238000005286 illumination Methods 0.000 description 15
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 14
- 230000003287 optical effect Effects 0.000 description 12
- 239000000872 buffer Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 230000006870 function Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 239000003550 marker Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Multimedia (AREA)
- Control Of Position Or Direction (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57210922A JPS59100528A (ja) | 1982-11-30 | 1982-11-30 | 位置検知方法 |
US07/042,534 US4794648A (en) | 1982-10-25 | 1987-04-27 | Mask aligner with a wafer position detecting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57210922A JPS59100528A (ja) | 1982-11-30 | 1982-11-30 | 位置検知方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59100528A JPS59100528A (ja) | 1984-06-09 |
JPS6354213B2 true JPS6354213B2 (pl) | 1988-10-27 |
Family
ID=16597289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57210922A Granted JPS59100528A (ja) | 1982-10-25 | 1982-11-30 | 位置検知方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59100528A (pl) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0316550U (pl) * | 1989-06-30 | 1991-02-19 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH021212A (ja) * | 1989-03-17 | 1990-01-05 | Canon Inc | 眼科装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53105376A (en) * | 1977-02-25 | 1978-09-13 | Hitachi Ltd | Positioning unit |
JPS53132271A (en) * | 1977-04-20 | 1978-11-17 | Thomson Csf | Thin semiconductor plate* method of positioning pattern projected to said plate in projector* and projector |
JPS5434673A (en) * | 1977-08-23 | 1979-03-14 | Hitachi Ltd | Micro-distance measuring device for scan-type electronic microscope |
JPS5610780A (en) * | 1979-07-06 | 1981-02-03 | Matsushita Electric Ind Co Ltd | Television receiving antenna unit for traveling-body mounting |
JPS5729846A (en) * | 1980-06-19 | 1982-02-17 | Efubeeberuku Furitsu Buruumu G | Device for transmitting pressure from inlet side of internal combustion engine to automatic change over gear |
-
1982
- 1982-11-30 JP JP57210922A patent/JPS59100528A/ja active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53105376A (en) * | 1977-02-25 | 1978-09-13 | Hitachi Ltd | Positioning unit |
JPS53132271A (en) * | 1977-04-20 | 1978-11-17 | Thomson Csf | Thin semiconductor plate* method of positioning pattern projected to said plate in projector* and projector |
JPS5434673A (en) * | 1977-08-23 | 1979-03-14 | Hitachi Ltd | Micro-distance measuring device for scan-type electronic microscope |
JPS5610780A (en) * | 1979-07-06 | 1981-02-03 | Matsushita Electric Ind Co Ltd | Television receiving antenna unit for traveling-body mounting |
JPS5729846A (en) * | 1980-06-19 | 1982-02-17 | Efubeeberuku Furitsu Buruumu G | Device for transmitting pressure from inlet side of internal combustion engine to automatic change over gear |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0316550U (pl) * | 1989-06-30 | 1991-02-19 |
Also Published As
Publication number | Publication date |
---|---|
JPS59100528A (ja) | 1984-06-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4794648A (en) | Mask aligner with a wafer position detecting device | |
US6750899B1 (en) | Solder paste inspection system | |
JPS5999304A (ja) | 顕微鏡系のレーザ光による比較測長装置 | |
JPH11148807A (ja) | バンプ高さ測定方法及びバンプ高さ測定装置 | |
US4643579A (en) | Aligning method | |
JPH08167571A (ja) | 位置検出装置及び位置合せ装置 | |
JPS6354213B2 (pl) | ||
JPS5976425A (ja) | 半導体用焼付装置 | |
JPH01253603A (ja) | 面位置検出装置 | |
JP3135063B2 (ja) | 比較検査方法および装置 | |
JPS59100534A (ja) | 位置検知方法 | |
JP3223483B2 (ja) | 欠陥検査方法とその装置 | |
JPS59100527A (ja) | 半導体製造装置 | |
JPS59100530A (ja) | 位置検知装置 | |
JPS59100532A (ja) | 位置検知装置 | |
JPS59100533A (ja) | 位置検知装置 | |
JPS59100531A (ja) | 位置検知装置 | |
JPS59100529A (ja) | 位置検知装置 | |
JPS60195933A (ja) | 位置検出装置 | |
JPS6062118A (ja) | 位置検出装置 | |
JPH0547901A (ja) | ウエハのアライメント方法 | |
JPS60195932A (ja) | 位置検出装置 | |
JP2795790B2 (ja) | 3次元計測装置のセンサ座標補正方法 | |
JPS59158522A (ja) | 半導体焼付装置用位置検知機構 | |
JP2003014438A (ja) | 基板検査装置および基板検査方法 |