JPS53105376A - Positioning unit - Google Patents

Positioning unit

Info

Publication number
JPS53105376A
JPS53105376A JP1923777A JP1923777A JPS53105376A JP S53105376 A JPS53105376 A JP S53105376A JP 1923777 A JP1923777 A JP 1923777A JP 1923777 A JP1923777 A JP 1923777A JP S53105376 A JPS53105376 A JP S53105376A
Authority
JP
Japan
Prior art keywords
positioning unit
unit
distortion
rigidity
shift
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1923777A
Other languages
Japanese (ja)
Other versions
JPS5625775B2 (en
Inventor
Mitsuyoshi Koizumi
Nobuyuki Akiyama
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1923777A priority Critical patent/JPS5625775B2/ja
Publication of JPS53105376A publication Critical patent/JPS53105376A/en
Publication of JPS5625775B2 publication Critical patent/JPS5625775B2/ja
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To increase the rigidity and to prevent the position shift due to distortion at alignment work, by constituting the unit that the object is positioned by using a tool and it is carrier from the first to the second station.
COPYRIGHT: (C)1978,JPO&Japio
JP1923777A 1977-02-25 1977-02-25 Expired JPS5625775B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1923777A JPS5625775B2 (en) 1977-02-25 1977-02-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1923777A JPS5625775B2 (en) 1977-02-25 1977-02-25

Publications (2)

Publication Number Publication Date
JPS53105376A true JPS53105376A (en) 1978-09-13
JPS5625775B2 JPS5625775B2 (en) 1981-06-15

Family

ID=11993774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1923777A Expired JPS5625775B2 (en) 1977-02-25 1977-02-25

Country Status (1)

Country Link
JP (1) JPS5625775B2 (en)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5780724A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Positioning device
JPS57183031A (en) * 1981-05-06 1982-11-11 Toshiba Corp Method for wafer exposure and device thereof
JPS587824A (en) * 1981-07-06 1983-01-17 Hitachi Ltd Alignment method and device thereof
JPS5828748A (en) * 1981-08-13 1983-02-19 Nippon Kogaku Kk <Nikon> Positioning device for transcribing device
JPS5944841A (en) * 1982-09-07 1984-03-13 Tokyo Seimitsu Co Ltd Method and apparatus for probe alignment of semiconductor element inspecting apparatus
JPS5976425A (en) * 1982-10-25 1984-05-01 Canon Inc Printing apparatus for semiconductor
JPS5989419A (en) * 1982-11-15 1984-05-23 Canon Inc Positioning device
JPS59100528A (en) * 1982-11-30 1984-06-09 Canon Inc Semiconductor manufacturing device
JPS59100531A (en) * 1982-11-30 1984-06-09 Canon Inc Position detector
JPS609126A (en) * 1983-06-29 1985-01-18 Hitachi Ltd Projection type exposing device
JPS6037731A (en) * 1983-08-10 1985-02-27 Nippon Telegr & Teleph Corp <Ntt> Reduced projection type exposure device
JPS60257450A (en) * 1984-05-29 1985-12-19 Philips Nv Mask pattern image forming apparatus
JPS6187327A (en) * 1984-10-01 1986-05-02 Canon Inc Manufacturing device for semiconductor device
JPS61131441A (en) * 1984-11-30 1986-06-19 Canon Inc Device and method for alignment
JPS61151403A (en) * 1984-12-26 1986-07-10 Hitachi Ltd Pattern detector
JPS62248224A (en) * 1986-04-21 1987-10-29 Nikon Corp Projection exposure device
US5050111A (en) * 1984-10-18 1991-09-17 Canon Kabushiki Kaisha Alignment and exposure apparatus and method for manufacture of integrated circuits
US6549269B1 (en) 1996-11-28 2003-04-15 Nikon Corporation Exposure apparatus and an exposure method
US6590636B2 (en) 1997-01-27 2003-07-08 Nikon Corporation Projection exposure method and apparatus

Cited By (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0140492B2 (en) * 1980-11-07 1989-08-29 Nikon Kk
JPS5780724A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Positioning device
JPS57183031A (en) * 1981-05-06 1982-11-11 Toshiba Corp Method for wafer exposure and device thereof
JPS587824A (en) * 1981-07-06 1983-01-17 Hitachi Ltd Alignment method and device thereof
JPS5828748A (en) * 1981-08-13 1983-02-19 Nippon Kogaku Kk <Nikon> Positioning device for transcribing device
JPS5944841A (en) * 1982-09-07 1984-03-13 Tokyo Seimitsu Co Ltd Method and apparatus for probe alignment of semiconductor element inspecting apparatus
JPS5976425A (en) * 1982-10-25 1984-05-01 Canon Inc Printing apparatus for semiconductor
JPS5989419A (en) * 1982-11-15 1984-05-23 Canon Inc Positioning device
JPS59100531A (en) * 1982-11-30 1984-06-09 Canon Inc Position detector
JPS59100528A (en) * 1982-11-30 1984-06-09 Canon Inc Semiconductor manufacturing device
JPS6354213B2 (en) * 1982-11-30 1988-10-27 Canon Kk
JPS609126A (en) * 1983-06-29 1985-01-18 Hitachi Ltd Projection type exposing device
JPH0510814B2 (en) * 1983-06-29 1993-02-10 Hitachi Ltd
JPS6037731A (en) * 1983-08-10 1985-02-27 Nippon Telegr & Teleph Corp <Ntt> Reduced projection type exposure device
JPS60257450A (en) * 1984-05-29 1985-12-19 Philips Nv Mask pattern image forming apparatus
JPH0543169B2 (en) * 1984-10-01 1993-06-30 Canon Kk
JPS6187327A (en) * 1984-10-01 1986-05-02 Canon Inc Manufacturing device for semiconductor device
US5050111A (en) * 1984-10-18 1991-09-17 Canon Kabushiki Kaisha Alignment and exposure apparatus and method for manufacture of integrated circuits
JPH0334846B2 (en) * 1984-11-30 1991-05-24 Canon Kk
JPS61131441A (en) * 1984-11-30 1986-06-19 Canon Inc Device and method for alignment
JPH0615966B2 (en) * 1984-12-26 1994-03-02 株式会社日立製作所 Pattern detection device
JPS61151403A (en) * 1984-12-26 1986-07-10 Hitachi Ltd Pattern detector
JPS62248224A (en) * 1986-04-21 1987-10-29 Nikon Corp Projection exposure device
US6549269B1 (en) 1996-11-28 2003-04-15 Nikon Corporation Exposure apparatus and an exposure method
US6590634B1 (en) 1996-11-28 2003-07-08 Nikon Corporation Exposure apparatus and method
US6798491B2 (en) 1996-11-28 2004-09-28 Nikon Corporation Exposure apparatus and an exposure method
US7177008B2 (en) 1996-11-28 2007-02-13 Nikon Corporation Exposure apparatus and method
US7256869B2 (en) 1996-11-28 2007-08-14 Nikon Corporation Exposure apparatus and an exposure method
US6590636B2 (en) 1997-01-27 2003-07-08 Nikon Corporation Projection exposure method and apparatus

Also Published As

Publication number Publication date
JPS5625775B2 (en) 1981-06-15

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