JPS6353701B2 - - Google Patents
Info
- Publication number
- JPS6353701B2 JPS6353701B2 JP54025451A JP2545179A JPS6353701B2 JP S6353701 B2 JPS6353701 B2 JP S6353701B2 JP 54025451 A JP54025451 A JP 54025451A JP 2545179 A JP2545179 A JP 2545179A JP S6353701 B2 JPS6353701 B2 JP S6353701B2
- Authority
- JP
- Japan
- Prior art keywords
- memory cell
- line
- semiconductor device
- potential
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/858—Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
- Static Random-Access Memory (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2545179A JPS55118666A (en) | 1979-03-05 | 1979-03-05 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2545179A JPS55118666A (en) | 1979-03-05 | 1979-03-05 | Semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55118666A JPS55118666A (en) | 1980-09-11 |
| JPS6353701B2 true JPS6353701B2 (enExample) | 1988-10-25 |
Family
ID=12166376
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2545179A Granted JPS55118666A (en) | 1979-03-05 | 1979-03-05 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55118666A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57188863A (en) * | 1981-05-18 | 1982-11-19 | Hitachi Ltd | Field effect type semiconductor device |
| JPS5922359A (ja) * | 1982-07-29 | 1984-02-04 | Nec Corp | 集積化半導体記憶装置 |
| JPS6124090A (ja) * | 1984-07-12 | 1986-02-01 | Nec Corp | スタンバイ機能を有するcmosマイクロコンピュ−タ |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5432082A (en) * | 1977-08-17 | 1979-03-09 | Hitachi Ltd | Semiconductor device |
-
1979
- 1979-03-05 JP JP2545179A patent/JPS55118666A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55118666A (en) | 1980-09-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4864374A (en) | Two-transistor dram cell with high alpha particle immunity | |
| US4669062A (en) | Two-tiered dynamic random access memory (DRAM) cell | |
| US4115795A (en) | Semiconductor memory device | |
| JPS61280651A (ja) | 半導体記憶装置 | |
| US4999811A (en) | Trench DRAM cell with dynamic gain | |
| US4491858A (en) | Dynamic storage device with extended information holding time | |
| JPH0132660B2 (enExample) | ||
| US4151610A (en) | High density semiconductor memory device formed in a well and having more than one capacitor | |
| JPS5718356A (en) | Semiconductor memory storage | |
| KR950008671B1 (ko) | 비트라인 사이에 감소된 기생용량을 갖는 반도체 기억장치 | |
| JPS6034818B2 (ja) | 半導体メモリ | |
| JPS6353701B2 (enExample) | ||
| US4224635A (en) | Dynamic storage element having static storage element behavior | |
| US4214312A (en) | VMOS Field aligned dynamic ram cell | |
| JP2690242B2 (ja) | 半導体固定記憶装置 | |
| JPS6222270B2 (enExample) | ||
| US4872042A (en) | Semiconductor device | |
| US5446689A (en) | Semiconductor memory having a polycrystalline silicon load resistor and CMOS peripheral circuitry | |
| US4115871A (en) | MOS random memory array | |
| JPS6138620B2 (enExample) | ||
| JPS6386559A (ja) | 半導体記憶装置 | |
| JPS5814747B2 (ja) | 半導体記憶装置 | |
| US4247863A (en) | Semiconductor memory device | |
| JPS6362113B2 (enExample) | ||
| JPS60195971A (ja) | Ccd出力アンプ |