JPS635337A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS635337A
JPS635337A JP14809586A JP14809586A JPS635337A JP S635337 A JPS635337 A JP S635337A JP 14809586 A JP14809586 A JP 14809586A JP 14809586 A JP14809586 A JP 14809586A JP S635337 A JPS635337 A JP S635337A
Authority
JP
Japan
Prior art keywords
polymer
formula
alkenyl group
copolymer
fms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14809586A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0453420B2 (member.php
Inventor
Nobufumi Atoda
阿刀田　伸史
Tadashi Niwa
丹羽　正
Masayuki Kato
雅之 加藤
Yoshio Taguchi
田口　芳夫
Chihiro Imai
今井　千裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tonen General Sekiyu KK
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Toa Nenryo Kogyyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Toa Nenryo Kogyyo KK filed Critical Agency of Industrial Science and Technology
Priority to JP14809586A priority Critical patent/JPS635337A/ja
Publication of JPS635337A publication Critical patent/JPS635337A/ja
Publication of JPH0453420B2 publication Critical patent/JPH0453420B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP14809586A 1986-06-26 1986-06-26 感光性樹脂組成物 Granted JPS635337A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14809586A JPS635337A (ja) 1986-06-26 1986-06-26 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14809586A JPS635337A (ja) 1986-06-26 1986-06-26 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS635337A true JPS635337A (ja) 1988-01-11
JPH0453420B2 JPH0453420B2 (member.php) 1992-08-26

Family

ID=15445129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14809586A Granted JPS635337A (ja) 1986-06-26 1986-06-26 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS635337A (member.php)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0299955A (ja) * 1988-10-06 1990-04-11 Fujitsu Ltd 感光性耐熱樹脂組成物と半導体装置の製造方法
JPH10319597A (ja) * 1997-05-23 1998-12-04 Mitsubishi Electric Corp 感光性シリコーンラダー系樹脂組成物、この樹脂組成物にパターンを転写するパターン転写方法および上記樹脂組成物を用いた半導体装置
WO2011142393A1 (ja) * 2010-05-13 2011-11-17 日産化学工業株式会社 熱硬化性樹脂組成物及びディスプレイ装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0299955A (ja) * 1988-10-06 1990-04-11 Fujitsu Ltd 感光性耐熱樹脂組成物と半導体装置の製造方法
JPH10319597A (ja) * 1997-05-23 1998-12-04 Mitsubishi Electric Corp 感光性シリコーンラダー系樹脂組成物、この樹脂組成物にパターンを転写するパターン転写方法および上記樹脂組成物を用いた半導体装置
WO2011142393A1 (ja) * 2010-05-13 2011-11-17 日産化学工業株式会社 熱硬化性樹脂組成物及びディスプレイ装置
JPWO2011142393A1 (ja) * 2010-05-13 2013-07-22 日産化学工業株式会社 熱硬化性樹脂組成物及びディスプレイ装置

Also Published As

Publication number Publication date
JPH0453420B2 (member.php) 1992-08-26

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term