JPS6348042B2 - - Google Patents

Info

Publication number
JPS6348042B2
JPS6348042B2 JP53110651A JP11065178A JPS6348042B2 JP S6348042 B2 JPS6348042 B2 JP S6348042B2 JP 53110651 A JP53110651 A JP 53110651A JP 11065178 A JP11065178 A JP 11065178A JP S6348042 B2 JPS6348042 B2 JP S6348042B2
Authority
JP
Japan
Prior art keywords
wafer
objective lens
amount
mask
moving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53110651A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5538505A (en
Inventor
Susumu Aiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11065178A priority Critical patent/JPS5538505A/ja
Publication of JPS5538505A publication Critical patent/JPS5538505A/ja
Publication of JPS6348042B2 publication Critical patent/JPS6348042B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11065178A 1978-09-11 1978-09-11 Follow-up focusing device Granted JPS5538505A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11065178A JPS5538505A (en) 1978-09-11 1978-09-11 Follow-up focusing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11065178A JPS5538505A (en) 1978-09-11 1978-09-11 Follow-up focusing device

Publications (2)

Publication Number Publication Date
JPS5538505A JPS5538505A (en) 1980-03-18
JPS6348042B2 true JPS6348042B2 (enrdf_load_stackoverflow) 1988-09-27

Family

ID=14541064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11065178A Granted JPS5538505A (en) 1978-09-11 1978-09-11 Follow-up focusing device

Country Status (1)

Country Link
JP (1) JPS5538505A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005222889A (ja) * 2004-02-09 2005-08-18 Tokyo Seimitsu Co Ltd 対物レンズ駆動装置

Also Published As

Publication number Publication date
JPS5538505A (en) 1980-03-18

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