JPH0447807B2 - - Google Patents

Info

Publication number
JPH0447807B2
JPH0447807B2 JP62271669A JP27166987A JPH0447807B2 JP H0447807 B2 JPH0447807 B2 JP H0447807B2 JP 62271669 A JP62271669 A JP 62271669A JP 27166987 A JP27166987 A JP 27166987A JP H0447807 B2 JPH0447807 B2 JP H0447807B2
Authority
JP
Japan
Prior art keywords
projection lens
light
lens system
photomask
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62271669A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63132427A (ja
Inventor
Hiroshi Sato
Shuichi Yabu
Masao Kosugi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62271669A priority Critical patent/JPS63132427A/ja
Publication of JPS63132427A publication Critical patent/JPS63132427A/ja
Publication of JPH0447807B2 publication Critical patent/JPH0447807B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Projection-Type Copiers In General (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP62271669A 1987-10-29 1987-10-29 露光装置 Granted JPS63132427A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62271669A JPS63132427A (ja) 1987-10-29 1987-10-29 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62271669A JPS63132427A (ja) 1987-10-29 1987-10-29 露光装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57062874A Division JPS58179834A (ja) 1982-04-14 1982-04-14 投影露光装置及び方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2206622A Division JPH03123015A (ja) 1990-08-03 1990-08-03 半導体製造方法及び露光装置

Publications (2)

Publication Number Publication Date
JPS63132427A JPS63132427A (ja) 1988-06-04
JPH0447807B2 true JPH0447807B2 (enrdf_load_stackoverflow) 1992-08-05

Family

ID=17503231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62271669A Granted JPS63132427A (ja) 1987-10-29 1987-10-29 露光装置

Country Status (1)

Country Link
JP (1) JPS63132427A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2790469B2 (ja) * 1988-11-24 1998-08-27 ウシオ電機株式会社 フィルム露光装置
JPH05312643A (ja) * 1992-05-13 1993-11-22 Orc Mfg Co Ltd 光量計
NO20190876A1 (en) * 2019-07-11 2021-01-12 Visitech As Real time Registration Lithography system

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51126071A (en) * 1975-04-25 1976-11-02 Hitachi Ltd Mask pattern printing method and the equipment
JPS57117238A (en) * 1981-01-14 1982-07-21 Nippon Kogaku Kk <Nikon> Exposing and baking device for manufacturing integrated circuit with illuminometer

Also Published As

Publication number Publication date
JPS63132427A (ja) 1988-06-04

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