JPH0512849B2 - - Google Patents
Info
- Publication number
- JPH0512849B2 JPH0512849B2 JP2206622A JP20662290A JPH0512849B2 JP H0512849 B2 JPH0512849 B2 JP H0512849B2 JP 2206622 A JP2206622 A JP 2206622A JP 20662290 A JP20662290 A JP 20662290A JP H0512849 B2 JPH0512849 B2 JP H0512849B2
- Authority
- JP
- Japan
- Prior art keywords
- projection lens
- lens system
- light
- photomask
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2206622A JPH03123015A (ja) | 1990-08-03 | 1990-08-03 | 半導体製造方法及び露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2206622A JPH03123015A (ja) | 1990-08-03 | 1990-08-03 | 半導体製造方法及び露光装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62271669A Division JPS63132427A (ja) | 1987-10-29 | 1987-10-29 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03123015A JPH03123015A (ja) | 1991-05-24 |
| JPH0512849B2 true JPH0512849B2 (enrdf_load_stackoverflow) | 1993-02-19 |
Family
ID=16526427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2206622A Granted JPH03123015A (ja) | 1990-08-03 | 1990-08-03 | 半導体製造方法及び露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03123015A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6757050B1 (en) | 1992-12-28 | 2004-06-29 | Canon Kabushiki Kaisha | Exposure method and apparatus for detecting an exposure amount and for calculating a correction value based on the detected exposure amount |
-
1990
- 1990-08-03 JP JP2206622A patent/JPH03123015A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03123015A (ja) | 1991-05-24 |
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