JPH03123015A - 半導体製造方法及び露光装置 - Google Patents

半導体製造方法及び露光装置

Info

Publication number
JPH03123015A
JPH03123015A JP2206622A JP20662290A JPH03123015A JP H03123015 A JPH03123015 A JP H03123015A JP 2206622 A JP2206622 A JP 2206622A JP 20662290 A JP20662290 A JP 20662290A JP H03123015 A JPH03123015 A JP H03123015A
Authority
JP
Japan
Prior art keywords
projection
optical system
wafer
projection optical
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2206622A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0512849B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Sato
宏 佐藤
Shuichi Yabu
藪　修一
Masao Kosugi
小杉　雅夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2206622A priority Critical patent/JPH03123015A/ja
Publication of JPH03123015A publication Critical patent/JPH03123015A/ja
Publication of JPH0512849B2 publication Critical patent/JPH0512849B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2206622A 1990-08-03 1990-08-03 半導体製造方法及び露光装置 Granted JPH03123015A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2206622A JPH03123015A (ja) 1990-08-03 1990-08-03 半導体製造方法及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2206622A JPH03123015A (ja) 1990-08-03 1990-08-03 半導体製造方法及び露光装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP62271669A Division JPS63132427A (ja) 1987-10-29 1987-10-29 露光装置

Publications (2)

Publication Number Publication Date
JPH03123015A true JPH03123015A (ja) 1991-05-24
JPH0512849B2 JPH0512849B2 (enrdf_load_stackoverflow) 1993-02-19

Family

ID=16526427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2206622A Granted JPH03123015A (ja) 1990-08-03 1990-08-03 半導体製造方法及び露光装置

Country Status (1)

Country Link
JP (1) JPH03123015A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6757050B1 (en) 1992-12-28 2004-06-29 Canon Kabushiki Kaisha Exposure method and apparatus for detecting an exposure amount and for calculating a correction value based on the detected exposure amount

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6757050B1 (en) 1992-12-28 2004-06-29 Canon Kabushiki Kaisha Exposure method and apparatus for detecting an exposure amount and for calculating a correction value based on the detected exposure amount

Also Published As

Publication number Publication date
JPH0512849B2 (enrdf_load_stackoverflow) 1993-02-19

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