JPS5538505A - Follow-up focusing device - Google Patents

Follow-up focusing device

Info

Publication number
JPS5538505A
JPS5538505A JP11065178A JP11065178A JPS5538505A JP S5538505 A JPS5538505 A JP S5538505A JP 11065178 A JP11065178 A JP 11065178A JP 11065178 A JP11065178 A JP 11065178A JP S5538505 A JPS5538505 A JP S5538505A
Authority
JP
Japan
Prior art keywords
wafer
photo mask
objective lens
follow
positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11065178A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6348042B2 (enrdf_load_stackoverflow
Inventor
Susumu Aiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11065178A priority Critical patent/JPS5538505A/ja
Publication of JPS5538505A publication Critical patent/JPS5538505A/ja
Publication of JPS6348042B2 publication Critical patent/JPS6348042B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11065178A 1978-09-11 1978-09-11 Follow-up focusing device Granted JPS5538505A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11065178A JPS5538505A (en) 1978-09-11 1978-09-11 Follow-up focusing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11065178A JPS5538505A (en) 1978-09-11 1978-09-11 Follow-up focusing device

Publications (2)

Publication Number Publication Date
JPS5538505A true JPS5538505A (en) 1980-03-18
JPS6348042B2 JPS6348042B2 (enrdf_load_stackoverflow) 1988-09-27

Family

ID=14541064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11065178A Granted JPS5538505A (en) 1978-09-11 1978-09-11 Follow-up focusing device

Country Status (1)

Country Link
JP (1) JPS5538505A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005222889A (ja) * 2004-02-09 2005-08-18 Tokyo Seimitsu Co Ltd 対物レンズ駆動装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005222889A (ja) * 2004-02-09 2005-08-18 Tokyo Seimitsu Co Ltd 対物レンズ駆動装置

Also Published As

Publication number Publication date
JPS6348042B2 (enrdf_load_stackoverflow) 1988-09-27

Similar Documents

Publication Publication Date Title
JPS5742039A (en) Method and device for detecting initial positions of easel and lens in photographic device
JPS51147179A (en) Method of munufacturing of semiconductor device
JPS5428133A (en) Optical path extension device with focus detection function
JPS52147430A (en) Focus detection device
JPS53141030A (en) Camera provided with focused point detector
JPS5538505A (en) Follow-up focusing device
JPS5387217A (en) Focusing device
JPS51120725A (en) Automatic forcusing camera
JPS544123A (en) Exposure control device for camera
JPS57212406A (en) Method and device for focusing
JPS5332728A (en) Focus control device for camera
JPS5555529A (en) Method of positioning wafer
JPS533848A (en) Automatic position measurement device
JPS51120247A (en) A range finder
JPS52123249A (en) Automatic focus adjusting device for microscope
JPS5211939A (en) Signal reading device
JPS5210126A (en) Focus adjusting device for camera
JPS5232186A (en) Spherical surface processing device
JPS5375867A (en) Mask aligment apparatus
JPS5397818A (en) Measuring system for projecting magnification
JPS5349957A (en) Focusing method for electronic beam exposure device
JPS5644801A (en) Positioning system
JPS53141031A (en) Camera having focusing-state detecting element
JPS5333624A (en) Camera containing auxiliary lens attachment device
JPS5553436A (en) Wire bonding device