JPS5375867A - Mask aligment apparatus - Google Patents
Mask aligment apparatusInfo
- Publication number
- JPS5375867A JPS5375867A JP15091776A JP15091776A JPS5375867A JP S5375867 A JPS5375867 A JP S5375867A JP 15091776 A JP15091776 A JP 15091776A JP 15091776 A JP15091776 A JP 15091776A JP S5375867 A JPS5375867 A JP S5375867A
- Authority
- JP
- Japan
- Prior art keywords
- chuck
- aligment
- mask
- driving
- proportinal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To obtain accurate mask position and accurately control chuck vertical movements based on this by elastically and vertically moveably holding a wafer chuck with plate springs and detecting the change points of a proportinal constant which defines the proportional relation between the movement and driving power of the chuck at the time of driving.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51150917A JPS6013301B2 (en) | 1976-12-17 | 1976-12-17 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51150917A JPS6013301B2 (en) | 1976-12-17 | 1976-12-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5375867A true JPS5375867A (en) | 1978-07-05 |
JPS6013301B2 JPS6013301B2 (en) | 1985-04-06 |
Family
ID=15507213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51150917A Expired JPS6013301B2 (en) | 1976-12-17 | 1976-12-17 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6013301B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5527656A (en) * | 1978-08-21 | 1980-02-27 | Hitachi Ltd | Method and device of sticking photomask and wafer together |
JPS55121639A (en) * | 1979-03-14 | 1980-09-18 | Hitachi Ltd | Control method for push force of mask and wafer |
JPS6063928A (en) * | 1984-07-04 | 1985-04-12 | Hitachi Ltd | Contact exposure device |
-
1976
- 1976-12-17 JP JP51150917A patent/JPS6013301B2/ja not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5527656A (en) * | 1978-08-21 | 1980-02-27 | Hitachi Ltd | Method and device of sticking photomask and wafer together |
JPS6260810B2 (en) * | 1978-08-21 | 1987-12-18 | Hitachi Ltd | |
JPS55121639A (en) * | 1979-03-14 | 1980-09-18 | Hitachi Ltd | Control method for push force of mask and wafer |
JPS6063928A (en) * | 1984-07-04 | 1985-04-12 | Hitachi Ltd | Contact exposure device |
Also Published As
Publication number | Publication date |
---|---|
JPS6013301B2 (en) | 1985-04-06 |
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